Resources Contact Us Home
Method of forming a thin film pattern with a trapezoidal cross section

Image Number 6 for United States Patent #5127989.

The present invention provides a method of forming a thin film pattern with a trapezoidal cross section. In this method, a resist pattern with an inverted-trapezoidal cross section is formed on a thin film. Using the resist pattern with the inverted-trapezoidal cross section as a mask, the thin film is dry-etched. A resist pattern is left with the resist pattern used as a mask. The resist pattern has a trapezoidal cross section.

  Recently Added Patents
Analysis device and an analysis apparatus using the analysis device
Elastic wave device having a capacitive electrode on the piezoelectric substrate
Acoustic reconfiguration devices and methods
Electronic device
Antimicrobial polysiloxane materials containing metal species
Domestic soda-water preparing device
  Randomly Featured Patents
Cyclic redundancy check for partitioned frames
System for dynamically providing address and indicia information
Coating composition and process for manufacturing the same
Drug dispenser
Stab-type coupling with collet having locking ribs and rotation prevention member
Hepatitis C dsRNA effector molecules, expression constructs, compositions, and methods of use
Auxiliary safety step for round ladder rungs
Process for the manufacture of a mixture of polycarbonates and styrene-containing polymers, use of the mixture and molded parts thereof
Printed wiring board with mounted circuit element using a terminal density conversion board
Distance measurement and photometry device, distance measurement and photometry method, and imaging apparatus