Resources Contact Us Home
Apparatus for photoresist stripping

Image Number 5 for United States Patent #4885047.

An apparatus for rapidly stripping a photoresist which utilizes an oxidizing fluid such as ozone. A very thin layer of oxidizing fluid of four millimeters or less is flowed over the photoresist. The fluid flows at high velocity over the resist, while the resist is heated. Additionally, the resist may be irradiated with ultraviolet radiation at an irradiance of at least about 800 milliwatts/cm.sup.2.

  Recently Added Patents
Electronic badge
Method and system of channel detecting and reporting, terminal, and management center
Selective facsimile denial
Method and apparatus for compensating QoS during handover by base station in wireless broadband access system
System and method of detecting and locating intermittent and other faults
Externally gapped line arrester
  Randomly Featured Patents
Devices for dispensing liquid
Process for the production of adsorbent carbon
Substrate processing method
Method and system for protecting integrated circuits against a variety of transients
Grave frame
Static random access memory
Mobile migration communications control device
System and computer program product for secure authentication using digital certificates
Pay at the table system
Hanging multi-storage device