Resources Contact Us Home
Apparatus for photoresist stripping

Image Number 2 for United States Patent #4885047.

An apparatus for rapidly stripping a photoresist which utilizes an oxidizing fluid such as ozone. A very thin layer of oxidizing fluid of four millimeters or less is flowed over the photoresist. The fluid flows at high velocity over the resist, while the resist is heated. Additionally, the resist may be irradiated with ultraviolet radiation at an irradiance of at least about 800 milliwatts/cm.sup.2.

  Recently Added Patents
Flexible pouch
Multi charged particle beam writing apparatus and multi charged particle beam writing method
Wireless communication system, associated methods and data structures
Semiconductor device and manufacturing method
Reducing voltage stress in a flyback converter design
RFID device using single antenna for multiple resonant frequency ranges
Data portal for concurrent assessment
  Randomly Featured Patents
Methods and apparatus to enhance paper and board forming qualities
Dynamic positioning system for a vessel containing an ocean thermal energy conversion system
Microphone sound proofing
Method and apparatus for random stimulus generation
Tire condition detecting device
Hydraulic damper
Bis-esters of methanediol with penicillins and penicillanic acid 1,1-dioxide
Coil former with injection-molded encapsulation
Liquefaction of gas
External extension for holding a portable computer and computer system therewith