Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of establishing a structure of electrical interconnections on a silicon semiconductor device










Image Number 2 for United States Patent #4851369.

After having formed contact islands (20) comprising at least one layer of silicide (20) of titanium or cobalt, these islands are covered by a complementary metallic layer (30) obtained by selective growth of tungsten or molybdenum, which is localized at the said islands. This complementary metallic layer especially serves as a stopping layer during etching of contact openings (33) into an isolating layer (32) supporting the remaining part of the structure of interconnections.








 
 
  Recently Added Patents
Systems and methods for sorting particles
Carrier for developing electrostatic charge image, developer for developing electrostatic charge image, image forming apparatus, and image forming method
Monitoring of undesirable fluid ingress into subsea control modules
Taxi cab key chain
Nanocatalysts structure, process for the preparation and use thereof
Methods for non-linear image blending, adjustment and display
Strategic planning management
  Randomly Featured Patents
Secret speech equipment
Audio-visual teaching apparatus
Hinged cigarette extinguisher and saver
Flame-resistant polycarbonate molding compositions
Methods of forming memory arrays and semiconductor constructions
Intraocular lens assembly
Method and apparatus for recognizing handwritten inputs in a computerized teaching system
Grating lens and focusing grating coupler
Configured and sized cannula
Method and apparatus for processing image signal