Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of establishing a structure of electrical interconnections on a silicon semiconductor device










Image Number 2 for United States Patent #4851369.

After having formed contact islands (20) comprising at least one layer of silicide (20) of titanium or cobalt, these islands are covered by a complementary metallic layer (30) obtained by selective growth of tungsten or molybdenum, which is localized at the said islands. This complementary metallic layer especially serves as a stopping layer during etching of contact openings (33) into an isolating layer (32) supporting the remaining part of the structure of interconnections.








 
 
  Recently Added Patents
Mobile terminal and method for changing page thereof
Fluid intake and content management system
Method for manufacturing a substrate for a display device
Package for product
Microbial fuel cell and method of use
Method for the treatment, alleviation of symptoms of, relieving, improving and preventing a cognitive disease, disorder or condition
Processing biomass
  Randomly Featured Patents
Hand grip for assisting a beginner rider in rein control
Membrane assembly, electrochemical cell, and electrolysis process using perfluorinated sandwich type membrane
Heater for sliding seal structure
Methods and kits for testing the efficacy of therapeutic compounds and other therapies in a three-dimensional matrix with respect to tumorous cells and tissue
Adjustable drawer guide mounting apparatus
Vehicle airbag inflator and related method
Media edge sensor utilizing a laser beam scanner
Quick-installation structure of a toilet seat cover assembly
Blackberry plant named `HJ-7`
Systems and methods for geophysical imaging using amorphous computational processing