Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Anisotropic plasma etching of tungsten










Image Number 3 for United States Patent #4713141.

An anisotropic plasma etching of a tungsten metal film of a semiconductor device is disclosed. The device is placed in a plasma etcher using SF.sub.6 and Cl.sub.2 gas mixture to anisotropically etch the tungsten metal film layer.








 
 
  Recently Added Patents
Canine iPS cells and method of producing same
System and method for content delivery
Lubricant supplying device, process cartridge, and image forming apparatus
Can seam inspection
Method and apparatus for accessing and downloading information from the internet
Managing imaging of computing devices
Preservation of liquid foods
  Randomly Featured Patents
Process to prevent scale adhesion using condensation product of aromatic amine and a quinone
Optical disk with reinforcing plate
Neolignan derivatives as platelet activating factor receptor antagonists and 5-lipoxygenase inhibitors
Method and system for providing fuel to internal combustion engines
Grilling appliance
Paddle for playing platform tennis, paddle ball and the like
Clamshell packaging machine and method
Optoelectronic and photovoltaic devices with low-reflectance surfaces
Air conditioner
Rail light