Resources Contact Us Home
Processing method using a focused ion beam

Image Number 5 for United States Patent #4457803.

A processing method using a focused ion beam is proposed which uses a focused ion beam radiation apparatus. When a specimen is irradiated with the focused ion beam in order to be etched, the desired etching depth of the specimen is preset as a function of a location. The ion dose of the focused ion beam, the acceleration voltage, or the etching time may be varied in accordance with the preset data.

  Recently Added Patents
Methods and reagents for the detection of Salmonella spp
Method of detecting a functional filamentous fungus, method of evaluating a product containing a functional filamentous fungus, and primer pair
Location analysis using fire retardant-protected nucleic acid-labeled tags
Auto-compensating power converter
Static analysis of VLSI reliability
Therapeutic compounds
Optical rotary encoder and manufacturing method thereof
  Randomly Featured Patents
Seat for a chair for persons having hip and/or leg stiffness
System level simulation models for hardware modules
Tube-end device for fire extinguishment
Organic thin film transistor and flat panel display device including the same
Electronic apparatus with a flexible printed circuit and a transparent conductive layer
Hearing aid dryer
System and method for acquiring images at maximum acquisition rate while asynchronously sequencing microscope devices
Gas and/or vapor discharge lamp
Reliable metal-to-junction contacts in large-scale-integrated devices
Connector for providing electric connection between a portable electronic device and conductors of a fixed progressing system