Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Processing method using a focused ion beam










Image Number 5 for United States Patent #4457803.

A processing method using a focused ion beam is proposed which uses a focused ion beam radiation apparatus. When a specimen is irradiated with the focused ion beam in order to be etched, the desired etching depth of the specimen is preset as a function of a location. The ion dose of the focused ion beam, the acceleration voltage, or the etching time may be varied in accordance with the preset data.








 
 
  Recently Added Patents
Electronic device having a hidden input key and method of manufacturing an electronic device
Cartridge drive shaft gear
Through substrate via including variable sidewall profile
Drug deactivation method
Tool-less blade clamping apparatus for a reciprocating tool
Polypropylene with bio-based and synthetic fillers for light weight material applications
Indanyloxydihydrobenzofuranylacetic acids
  Randomly Featured Patents
Method for producing polyorganosiloxane particles and for producing silica particles
STI liner for SOI structure
Power line communication while avoiding determinable interference harmonics
Flotation apparatus
Polymeric dispersants via novel terpolymers
Flexing-disk coupling
Surgical sagittal saw blade with a static bar and a pivoting blade head, the bar shaped to facilitate holding the blade to a complementary saw
Pressure sealer apparatus
Method for absorbing the vibration of a free-piston engine and vibration-absorbed free-piston engine
Diluent for cryogenic storage of bovine spermatozoa