Resources Contact Us Home
Processing method using a focused ion beam

Image Number 5 for United States Patent #4457803.

A processing method using a focused ion beam is proposed which uses a focused ion beam radiation apparatus. When a specimen is irradiated with the focused ion beam in order to be etched, the desired etching depth of the specimen is preset as a function of a location. The ion dose of the focused ion beam, the acceleration voltage, or the etching time may be varied in accordance with the preset data.

  Recently Added Patents
Rechargeable battery including a channel member
Image processing apparatus, image forming system, and computer-readable storage medium
Peered proctoring
Phospholipid-based powders for drug delivery
Semiconductor device
Sample chamber for laser ablation inductively coupled plasma mass spectroscopy
Generating agricultural information products using remote sensing
  Randomly Featured Patents
Sealing device
Polymerization catalyst
Methods and systems for routing a call
Ferromagnetic metal particles of iron alloyed with Ti, V, Cr, Mn, Co, Ni, Cu, Zn, Si, P, Mo, Sn, Sb and Ag coated with mono- or dialkoxysilanes
Method and related apparatus for motion estimation
Aminopyridines and methods of using thereof
Screws of cortical bone and method of manufacture thereof
Atmospheric diffuser improved lower screens backflushing
Motorized jack for trailers
Free-space/arrayed-waveguide router