Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Processing method using a focused ion beam










Image Number 5 for United States Patent #4457803.

A processing method using a focused ion beam is proposed which uses a focused ion beam radiation apparatus. When a specimen is irradiated with the focused ion beam in order to be etched, the desired etching depth of the specimen is preset as a function of a location. The ion dose of the focused ion beam, the acceleration voltage, or the etching time may be varied in accordance with the preset data.








 
 
  Recently Added Patents
Deadline-driven parallel execution of queries
Watch dial
Nucleotide sequence coding for variable regions of .beta. chains of human T lymphocyte receptors, corresponding peptide segments and the diagnostic and therapeutic uses
Verification of computer-executable code generated from a model
Fuel cell stack including ejector and blower for anode recirculation and method for controlling the same
Apparatus and method of managing radio bearer in wireless communication system
Lithographic apparatus and device manufacturing method
  Randomly Featured Patents
Method and apparatus for optical performance monitoring
Gas-phase polymerization of C.sub.2 -C.sub.8 -alk-l-enes by means of Ziegler-Natta or metallocene catalyst systems
Adjustable hinge assembly
Peptide sequences and antipeptide antisera for detecting human cyclooxygenase-1 and cyclooxygenase-2 proteins
Modifying relevance ranking of search result items
Rechargeable battery vending machine
Hall effect power generator
Servo track writing apparatus with a head assembly shroud
Device for glass melt delivery and method for using them
Abrasive coated fluted bit with recesses