Resources Contact Us Home
Processing method using a focused ion beam

Image Number 5 for United States Patent #4457803.

A processing method using a focused ion beam is proposed which uses a focused ion beam radiation apparatus. When a specimen is irradiated with the focused ion beam in order to be etched, the desired etching depth of the specimen is preset as a function of a location. The ion dose of the focused ion beam, the acceleration voltage, or the etching time may be varied in accordance with the preset data.

  Recently Added Patents
Method and system for providing complete internet anywhere with partial server processing
Automated top-down multi-abstraction infrastructure performance analytics -network infrastructure-as-a-service perspective
High gradient lens for charged particle beam
Flexure with insulating layer isolating a portion of a metal substrate
Method of and apparatus for evaluating an optimal irradiation amount of an electron beam for drawing a pattern onto a sample
Method and system for prioritizing points of interest for display in a map using category score
  Randomly Featured Patents
Display packaging
Bath lift
Means for producing artistic borders on photographic prints, with or without appropriate wording
Sport helmet
Methods and systems for displaying graphical markers in a mixed box chart
Conveyor trolley and track
Self-ligating orthodontic bracket
Animal hold down/neck stretcher for kosher slaughter on a double-rail animal support system