Resources Contact Us Home
Processing method using a focused ion beam

Image Number 5 for United States Patent #4457803.

A processing method using a focused ion beam is proposed which uses a focused ion beam radiation apparatus. When a specimen is irradiated with the focused ion beam in order to be etched, the desired etching depth of the specimen is preset as a function of a location. The ion dose of the focused ion beam, the acceleration voltage, or the etching time may be varied in accordance with the preset data.

  Recently Added Patents
Projection illumination system for EUV microlithography
Method and apparatus for sharing virtual workspaces
Information retrieval system, information retrieval method, and information retrieval program
Computer system for routing package deliveries
Canine iPS cells and method of producing same
Communication system including a switching section for switching a network route, controlling method and storage medium
Method for designing sunlight-reflection and heat-radiation multilayer film
  Randomly Featured Patents
Sealed access for hinge pin lubrication
Finger ring
Process for enhancing refresh in dynamic random access memory device
Reader card for densitometric test analysis
Method and apparatus for recognizing a skew angle of at least one optical fiber
Recess filling apparatus
Virtual network interface
LCDs with wide viewing angle
Integrated circuit arrangement and method
Method for producing light-emitting diode device