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Class Information
Number: 716/21
Name: Data processing: design and analysis of circuit or semiconductor mask > Design of semiconductor mask > Pattern exposure
Description: Subject matter including means or steps for tracing or drawing an electronic pattern on a semiconductor wafer or mask with particle beam.










Patents under this class:

Patent Number Title Of Patent Date Issued
7805701 Universal two-input logic gate that is configurable and connectable in an integrated circuit by a single mask layer adjustment Sep. 28, 2010
7805700 Physical-resist model using fast sweeping Sep. 28, 2010
7805699 Shape-based photolithographic model calibration Sep. 28, 2010
7802226 Data preparation for multiple mask printing Sep. 21, 2010
7802225 Optical proximity correction method, optical proximity correction apparatus, and optical proximity correction program, method of manufacturing semiconductor device, design rule formulating met Sep. 21, 2010
7802218 Layout analysis method and apparatus for semiconductor integrated circuit Sep. 21, 2010
7801636 Method and system for managing wafer processing Sep. 21, 2010
7797668 Method for optimally converting a circuit design into a semiconductor device Sep. 14, 2010
7797656 Method of checking and correcting mask pattern Sep. 14, 2010
7793253 Mask-patterns including intentional breaks Sep. 7, 2010
7788630 Method and apparatus for determining an optical model that models the effect of optical proximity correction Aug. 31, 2010
7788629 Systems configured to perform a non-contact method for determining a property of a specimen Aug. 31, 2010
7788628 Computational efficiency in photolithographic process simulation Aug. 31, 2010
7788627 Lithography verification using guard bands Aug. 31, 2010
7788626 Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method Aug. 31, 2010
7788612 System, method, and computer program product for matching cell layout of an integrated circuit design Aug. 31, 2010
7785946 Integrated circuits and methods of design and manufacture thereof Aug. 31, 2010
7784020 Semiconductor circuit pattern design method for manufacturing semiconductor device or liquid crystal display device Aug. 24, 2010
7784019 Yield based retargeting for semiconductor design flow Aug. 24, 2010
7784018 Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model Aug. 24, 2010
7784017 Lithography simulation method, photomask manufacturing method, semiconductor device manufacturing method, and recording medium Aug. 24, 2010
7784015 Method for generating a mask layout and constructing an integrated circuit Aug. 24, 2010
7778805 Regression system and methods for optical proximity correction modeling Aug. 17, 2010
7777204 System and method of electron beam writing Aug. 17, 2010
7774739 Methods for adjusting shifter width of an alternating phase shifter having variable width Aug. 10, 2010
7774738 Lithography method for forming a circuit pattern Aug. 10, 2010
7774737 Performance in model-based OPC engine utilizing efficient polygon pinning method Aug. 10, 2010
7774736 Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography Aug. 10, 2010
7774726 Dummy fill for integrated circuits Aug. 10, 2010
7770145 Semiconductor device pattern creation method, pattern data processing program, and semiconductor device manufacturing method Aug. 3, 2010
7770144 Modular array defined by standard cell logic Aug. 3, 2010
7767363 Methods for photo-processing photo-imageable material Aug. 3, 2010
7765518 System and method for implementing optical rule checking to identify and quantify corner rounding errors Jul. 27, 2010
7765517 Method and apparatus for removing dummy features from a data structure Jul. 27, 2010
7765516 System and method for making photomasks Jul. 27, 2010
7761840 Mask data generation including a main pattern and an auxiliary pattern Jul. 20, 2010
7761839 Performance in model-based OPC engine utilizing efficient polygon pinning method Jul. 20, 2010
7761838 Method for fabricating a semiconductor device having an extended stress liner Jul. 20, 2010
7761837 Method of making alternating phase shift masks Jul. 20, 2010
7761835 Semiconductor device design method, semiconductor device design system, and computer program for extracting parasitic parameters Jul. 20, 2010
7757201 Method for time-evolving rectilinear contours representing photo masks Jul. 13, 2010
7752595 Method for verifying and correcting post-OPC pattern layout Jul. 6, 2010
7752594 Semiconductor failure analysis apparatus, failure analysis method, failure analysis program, and failure analysis system Jul. 6, 2010
7752584 Method for verifying mask pattern of semiconductor device Jul. 6, 2010
7752579 Film thickness predicting program, recording medium, film thickness predicting apparatus, and film thickness predicting method Jul. 6, 2010
7752577 Constraint plus pattern Jul. 6, 2010
7749662 Process margin using discrete assist features Jul. 6, 2010
7747978 System and method for creating a focus-exposure model of a lithography process Jun. 29, 2010
7747977 Method and system for stencil design for particle beam writing Jun. 29, 2010
7745067 Method for performing place-and-route of contacts and vias in technologies with forbidden pitch requirements Jun. 29, 2010











 
 
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