| |
 |
|
Class Information
Number: 716/21
Name: Data processing: design and analysis of circuit or semiconductor mask > Design of semiconductor mask > Pattern exposure
Description: Subject matter including means or steps for tracing or drawing an electronic pattern on a semiconductor wafer or mask with particle beam.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7623220 |
Source optimization for image fidelity and throughput |
Nov. 24, 2009 |
| 7620932 |
Simulation of aerial images |
Nov. 17, 2009 |
| 7619230 |
Charged particle beam writing method and apparatus and readable storage medium |
Nov. 17, 2009 |
| 7620930 |
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography |
Nov. 17, 2009 |
| 7620931 |
Method of adding fabrication monitors to integrated circuit chips |
Nov. 17, 2009 |
| 7617477 |
Method for selecting and optimizing exposure tool using an individual mask error model |
Nov. 10, 2009 |
| 7617476 |
Method for performing pattern pitch-split decomposition utilizing anchoring features |
Nov. 10, 2009 |
| 7617474 |
System and method for providing defect printability analysis of photolithographic masks with job-based automation |
Nov. 10, 2009 |
| 7617473 |
Differential alternating phase shift mask optimization |
Nov. 10, 2009 |
| 7617478 |
Flash-based anti-aliasing techniques for high-accuracy high efficiency mask synthesis |
Nov. 10, 2009 |
| 7614033 |
Mask data preparation |
Nov. 3, 2009 |
| 7614034 |
Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technology |
Nov. 3, 2009 |
| 7614032 |
Method for correcting a mask design layout |
Nov. 3, 2009 |
| 7614031 |
Drawing apparatus with drawing data correction function |
Nov. 3, 2009 |
| 7614026 |
Pattern forming method, computer program thereof, and semiconductor device manufacturing method using the computer program |
Nov. 3, 2009 |
| 7610574 |
Method and apparatus for designing fine pattern |
Oct. 27, 2009 |
| 7603648 |
Mask design using library of corrections |
Oct. 13, 2009 |
| 7600213 |
Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product |
Oct. 6, 2009 |
| 7600212 |
Method of compensating photomask data for the effects of etch and lithography processes |
Oct. 6, 2009 |
| 7598006 |
Method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer |
Oct. 6, 2009 |
| 7596776 |
Light intensity distribution simulation method and computer program product |
Sep. 29, 2009 |
| 7594199 |
Method of optical proximity correction design for contact hole mask |
Sep. 22, 2009 |
| 7594206 |
Fault detecting method and layout method for semiconductor integrated circuit |
Sep. 22, 2009 |
| 7594213 |
Method and apparatus for computing dummy feature density for chemical-mechanical polishing |
Sep. 22, 2009 |
| 7594216 |
Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask |
Sep. 22, 2009 |
| 7590968 |
Methods for risk-informed chip layout generation |
Sep. 15, 2009 |
| 7590967 |
Structured ASIC with configurable die size and selectable embedded functions |
Sep. 15, 2009 |
| 7589819 |
Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems |
Sep. 15, 2009 |
| 7587704 |
System and method for mask verification using an individual mask error model |
Sep. 8, 2009 |
| 7587703 |
Layout determination method, method of manufacturing semiconductor devices, and computer readable program |
Sep. 8, 2009 |
| 7587702 |
Step-walk relaxation method for global optimization of masks |
Sep. 8, 2009 |
| 7587700 |
Process monitoring system and method for processing a large number of sub-micron measurement targets |
Sep. 8, 2009 |
| 7585600 |
Method and apparatus for performing target-image-based optical proximity correction |
Sep. 8, 2009 |
| 7584450 |
Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout |
Sep. 1, 2009 |
| 7579606 |
Method and system for logic design for cell projection particle beam lithography |
Aug. 25, 2009 |
| 7581203 |
Method and apparatus for manufacturing multiple circuit patterns using a multiple project mask |
Aug. 25, 2009 |
| 7572557 |
Non-collinear end-to-end structures with sub-resolution assist features |
Aug. 11, 2009 |
| 7571423 |
Optimized photomasks for photolithography |
Aug. 4, 2009 |
| 7571421 |
System, method, and computer-readable medium for performing data preparation for a mask design |
Aug. 4, 2009 |
| 7571417 |
Method and system for correcting a mask pattern design |
Aug. 4, 2009 |
| 7571416 |
Automatic design device, method, and program for semiconductor integrated circuits |
Aug. 4, 2009 |
| 7569842 |
Method for correcting electron beam exposure data |
Aug. 4, 2009 |
| 7569310 |
Sub-resolution assist features for photolithography with trim ends |
Aug. 4, 2009 |
| 7571424 |
Diffused aerial image model semiconductor device fabrication |
Aug. 4, 2009 |
| 7568180 |
Generalization of the photo process window and its application to OPC test pattern design |
Jul. 28, 2009 |
| 7568174 |
Method for checking printability of a lithography target |
Jul. 28, 2009 |
| 7564535 |
Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations |
Jul. 21, 2009 |
| 7565633 |
Verifying mask layout printability using simulation with adjustable accuracy |
Jul. 21, 2009 |
| 7565639 |
Integrated assist features for epitaxial growth bulk tiles with compensation |
Jul. 21, 2009 |
| 7562336 |
Contrast based resolution enhancement for photolithographic processing |
Jul. 14, 2009 |
|
|
|
