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Class Information
Number: 716/20
Name: Data processing: design and analysis of circuit or semiconductor mask > Design of semiconductor mask > Mesh generation
Description: Subject matter comprising means or steps for determining or approximating the surface contour of the mask by mathematical model or algorithm such as numerical analysis.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7627849 |
System and method for varying the starting conditions for a resolution enhancement program to improve the probability that design goals will be met |
Dec. 1, 2009 |
| 7620930 |
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography |
Nov. 17, 2009 |
| 7620931 |
Method of adding fabrication monitors to integrated circuit chips |
Nov. 17, 2009 |
| 7617478 |
Flash-based anti-aliasing techniques for high-accuracy high efficiency mask synthesis |
Nov. 10, 2009 |
| 7617473 |
Differential alternating phase shift mask optimization |
Nov. 10, 2009 |
| 7617476 |
Method for performing pattern pitch-split decomposition utilizing anchoring features |
Nov. 10, 2009 |
| 7614031 |
Drawing apparatus with drawing data correction function |
Nov. 3, 2009 |
| 7604912 |
Local flare correction |
Oct. 20, 2009 |
| 7603648 |
Mask design using library of corrections |
Oct. 13, 2009 |
| 7598005 |
Photomask and manufacturing method of the same, and pattern forming method |
Oct. 6, 2009 |
| 7600213 |
Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product |
Oct. 6, 2009 |
| 7596776 |
Light intensity distribution simulation method and computer program product |
Sep. 29, 2009 |
| 7596420 |
Device manufacturing method and computer program product |
Sep. 29, 2009 |
| 7589819 |
Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems |
Sep. 15, 2009 |
| 7587700 |
Process monitoring system and method for processing a large number of sub-micron measurement targets |
Sep. 8, 2009 |
| 7584450 |
Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout |
Sep. 1, 2009 |
| 7572557 |
Non-collinear end-to-end structures with sub-resolution assist features |
Aug. 11, 2009 |
| 7571424 |
Diffused aerial image model semiconductor device fabrication |
Aug. 4, 2009 |
| 7571423 |
Optimized photomasks for photolithography |
Aug. 4, 2009 |
| 7571417 |
Method and system for correcting a mask pattern design |
Aug. 4, 2009 |
| 7569310 |
Sub-resolution assist features for photolithography with trim ends |
Aug. 4, 2009 |
| 7565639 |
Integrated assist features for epitaxial growth bulk tiles with compensation |
Jul. 21, 2009 |
| 7562333 |
Method and process for generating an optical proximity correction model based on layout density |
Jul. 14, 2009 |
| 7562336 |
Contrast based resolution enhancement for photolithographic processing |
Jul. 14, 2009 |
| 7550324 |
Interface port for electrically programmed fuses in a programmable logic device |
Jun. 23, 2009 |
| 7549141 |
Photomask, photomask manufacturing method, and photomask processing device |
Jun. 16, 2009 |
| 7543252 |
Migration of integrated circuit layout for alternating phase shift masks |
Jun. 2, 2009 |
| 7537864 |
Hole pattern design method and photomask |
May. 26, 2009 |
| 7533363 |
System for integrated circuit layout partition and extraction for independent layout processing |
May. 12, 2009 |
| 7530049 |
Mask manufacturing system, mask data creating method and manufacturing method of semiconductor device |
May. 5, 2009 |
| 7526749 |
Methods and apparatus for designing and using micro-targets in overlay metrology |
Apr. 28, 2009 |
| 7512928 |
Sub-resolution assist feature to improve symmetry for contact hole lithography |
Mar. 31, 2009 |
| 7512927 |
Printability verification by progressive modeling accuracy |
Mar. 31, 2009 |
| 7509620 |
Dual phase shift photolithography masks for logic patterning |
Mar. 24, 2009 |
| 7509621 |
Method and apparatus for placing assist features by identifying locations of constructive and destructive interference |
Mar. 24, 2009 |
| 7509624 |
Method and apparatus for modifying a layout to improve manufacturing robustness |
Mar. 24, 2009 |
| 7505884 |
Method for automatic generation of finite element mesh from IC layout data |
Mar. 17, 2009 |
| 7500219 |
Exposure data generator and method thereof |
Mar. 3, 2009 |
| 7496883 |
Method and apparatus for identifying and correcting phase conflicts |
Feb. 24, 2009 |
| 7496884 |
Distributed hierarchical partitioning framework for verifying a simulated wafer image |
Feb. 24, 2009 |
| 7496880 |
Method and apparatus for assessing the quality of a process model |
Feb. 24, 2009 |
| 7488937 |
Method and apparatus for the improvement of material/voltage contrast |
Feb. 10, 2009 |
| 7487474 |
Designing an integrated circuit to improve yield using a variant design element |
Feb. 3, 2009 |
| 7480889 |
Optimized photomasks for photolithography |
Jan. 20, 2009 |
| 7473495 |
Method of creating predictive model, method of managing process steps, method of manufacturing semiconductor device, method of manufacturing photo mask, and computer program product |
Jan. 6, 2009 |
| 7475379 |
Methods and systems for layout and routing using alternating aperture phase shift masks |
Jan. 6, 2009 |
| 7475382 |
Method and apparatus for determining an improved assist feature configuration in a mask layout |
Jan. 6, 2009 |
| 7472368 |
Method for implementing vertically coupled noise control through a mesh plane in an electronic package design |
Dec. 30, 2008 |
| 7465525 |
Reticle alignment and overlay for multiple reticle process |
Dec. 16, 2008 |
| 7461367 |
Modifying merged sub-resolution assist features of a photolithographic mask |
Dec. 2, 2008 |
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