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Class Information
Number: 716/19
Name: Data processing: design and analysis of circuit or semiconductor mask > Design of semiconductor mask
Description: Subject matter comprising means or steps for planning or devising a template used for etching circuit pattern on semiconductor wafers.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7620931 |
Method of adding fabrication monitors to integrated circuit chips |
Nov. 17, 2009 |
| 7620930 |
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography |
Nov. 17, 2009 |
| 7617477 |
Method for selecting and optimizing exposure tool using an individual mask error model |
Nov. 10, 2009 |
| 7617475 |
Method of manufacturing photomask and method of repairing optical proximity correction |
Nov. 10, 2009 |
| 7617474 |
System and method for providing defect printability analysis of photolithographic masks with job-based automation |
Nov. 10, 2009 |
| 7617473 |
Differential alternating phase shift mask optimization |
Nov. 10, 2009 |
| 7615319 |
Quick and accurate modeling of transmitted field |
Nov. 10, 2009 |
| 7615318 |
Printing of design features using alternating PSM technology with double mask exposure strategy |
Nov. 10, 2009 |
| 7614033 |
Mask data preparation |
Nov. 3, 2009 |
| 7614032 |
Method for correcting a mask design layout |
Nov. 3, 2009 |
| 7614031 |
Drawing apparatus with drawing data correction function |
Nov. 3, 2009 |
| 7614030 |
Scattering bar OPC application method for mask ESD prevention |
Nov. 3, 2009 |
| 7614026 |
Pattern forming method, computer program thereof, and semiconductor device manufacturing method using the computer program |
Nov. 3, 2009 |
| 7610574 |
Method and apparatus for designing fine pattern |
Oct. 27, 2009 |
| 7607114 |
Designer's intent tolerance bands for proximity correction and checking |
Oct. 20, 2009 |
| 7603648 |
Mask design using library of corrections |
Oct. 13, 2009 |
| 7600213 |
Pattern data verification method, pattern data creation method, exposure mask manufacturing method, semiconductor device manufacturing method, and computer program product |
Oct. 6, 2009 |
| 7600212 |
Method of compensating photomask data for the effects of etch and lithography processes |
Oct. 6, 2009 |
| 7600207 |
Stress-managed revision of integrated circuit layouts |
Oct. 6, 2009 |
| 7598006 |
Method and apparatus for embedded encoding of overlay data ordering in an in-situ interferometer |
Oct. 6, 2009 |
| 7598005 |
Photomask and manufacturing method of the same, and pattern forming method |
Oct. 6, 2009 |
| 7594213 |
Method and apparatus for computing dummy feature density for chemical-mechanical polishing |
Sep. 22, 2009 |
| 7592611 |
Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam |
Sep. 22, 2009 |
| 7590966 |
Data path for high performance pattern generator |
Sep. 15, 2009 |
| 7589819 |
Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems |
Sep. 15, 2009 |
| 7587704 |
System and method for mask verification using an individual mask error model |
Sep. 8, 2009 |
| 7587703 |
Layout determination method, method of manufacturing semiconductor devices, and computer readable program |
Sep. 8, 2009 |
| 7587702 |
Step-walk relaxation method for global optimization of masks |
Sep. 8, 2009 |
| 7587700 |
Process monitoring system and method for processing a large number of sub-micron measurement targets |
Sep. 8, 2009 |
| 7587696 |
Semiconductor device, layout method and apparatus and program |
Sep. 8, 2009 |
| 7585601 |
Method to optimize grating test pattern for lithography monitoring and control |
Sep. 8, 2009 |
| 7585600 |
Method and apparatus for performing target-image-based optical proximity correction |
Sep. 8, 2009 |
| 7584450 |
Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout |
Sep. 1, 2009 |
| 7584077 |
Physical design characterization system |
Sep. 1, 2009 |
| 7579606 |
Method and system for logic design for cell projection particle beam lithography |
Aug. 25, 2009 |
| 7577556 |
Method and equipment for simulation |
Aug. 18, 2009 |
| 7571424 |
Diffused aerial image model semiconductor device fabrication |
Aug. 4, 2009 |
| 7571423 |
Optimized photomasks for photolithography |
Aug. 4, 2009 |
| 7571422 |
Method for generating a design rule map having spatially varying overlay budget |
Aug. 4, 2009 |
| 7571421 |
System, method, and computer-readable medium for performing data preparation for a mask design |
Aug. 4, 2009 |
| 7571420 |
Dynamic sampling with efficient model for overlay |
Aug. 4, 2009 |
| 7571419 |
Methods and systems for performing design checking using a template |
Aug. 4, 2009 |
| 7571418 |
Simulation site placement for lithographic process models |
Aug. 4, 2009 |
| 7571417 |
Method and system for correcting a mask pattern design |
Aug. 4, 2009 |
| 7568180 |
Generalization of the photo process window and its application to OPC test pattern design |
Jul. 28, 2009 |
| 7568179 |
Layout printability optimization method and system |
Jul. 28, 2009 |
| 7568174 |
Method for checking printability of a lithography target |
Jul. 28, 2009 |
| 7565639 |
Integrated assist features for epitaxial growth bulk tiles with compensation |
Jul. 21, 2009 |
| 7565633 |
Verifying mask layout printability using simulation with adjustable accuracy |
Jul. 21, 2009 |
| 7565001 |
System and method of providing mask defect printability analysis |
Jul. 21, 2009 |
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