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Class Information
Number: 700/120
Name: Data processing: generic control systems or specific applications > Specific application, apparatus or process > Product assembly or manufacturing > Particular manufactured product or operation > Three-dimensional product forming > Rapid prototyping (e.g., layer-by-layer, material deposition) > Stereolithography
Description: Subject matter wherein the building material is a confined volume of photocurable material successively exposed to light.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7613538 |
Compensation for distortion in contact lithography |
Nov. 3, 2009 |
| 7603192 |
Method of making orthopedic implants and the orthopedic implants |
Oct. 13, 2009 |
| 7596420 |
Device manufacturing method and computer program product |
Sep. 29, 2009 |
| 7590966 |
Data path for high performance pattern generator |
Sep. 15, 2009 |
| 7589868 |
Method and apparatus for creating 3D-prints and a 3-D printing system |
Sep. 15, 2009 |
| 7568904 |
Stereolithography apparatus |
Aug. 4, 2009 |
| 7565219 |
Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby |
Jul. 21, 2009 |
| 7562337 |
OPC verification using auto-windowed regions |
Jul. 14, 2009 |
| 7551977 |
Method and apparatus associated with anisotropic shrink in sintered ceramic items |
Jun. 23, 2009 |
| 7549143 |
Method and device for checking lithography data |
Jun. 16, 2009 |
| 7549142 |
Method and device for checking lithography data |
Jun. 16, 2009 |
| 7549140 |
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
Jun. 16, 2009 |
| 7539970 |
Method of manufacturing mask |
May. 26, 2009 |
| 7533359 |
Method and system for chip design using physically appropriate component models and extraction |
May. 12, 2009 |
| 7519943 |
Photomask fabrication method |
Apr. 14, 2009 |
| 7509622 |
Dummy filling technique for improved planarization of chip surface topography |
Mar. 24, 2009 |
| 7508389 |
Computer-aided selection method for a portion of a volume |
Mar. 24, 2009 |
| 7493590 |
Process window optical proximity correction |
Feb. 17, 2009 |
| 7483763 |
System and method for the digital specification of head shape data for use in developing custom hair pieces |
Jan. 27, 2009 |
| 7480890 |
Method for correcting and configuring optical mask pattern |
Jan. 20, 2009 |
| 7475383 |
Method of fabricating photo mask |
Jan. 6, 2009 |
| 7458058 |
Verifying a process margin of a mask pattern using intermediate stage models |
Nov. 25, 2008 |
| 7447559 |
Apparatus and method of forming a photoresist pattern, and repair nozzle |
Nov. 4, 2008 |
| 7448018 |
System and method for employing patterning process statistics for ground rules waivers and optimization |
Nov. 4, 2008 |
| 7418694 |
Method for generating test patterns utilized in manufacturing semiconductor device |
Aug. 26, 2008 |
| 7416276 |
Digitally active 3-D object creation system |
Aug. 26, 2008 |
| 7409258 |
Method and system for measuring customer delivery service |
Aug. 5, 2008 |
| 7404167 |
Method for improving design window |
Jul. 22, 2008 |
| 7401319 |
Method and system for reticle-wide hierarchy management for representational and computational reuse in integrated circuit layout design |
Jul. 15, 2008 |
| 7315999 |
Method and apparatus for identifying assist feature placement problems |
Jan. 1, 2008 |
| 7290242 |
Pattern generation on a semiconductor surface |
Oct. 30, 2007 |
| 7287240 |
Designing method and device for phase shift mask |
Oct. 23, 2007 |
| 7275925 |
Apparatus for stereolithographic processing of components and assemblies |
Oct. 2, 2007 |
| 7260803 |
Incremental dummy metal insertions |
Aug. 21, 2007 |
| 7239932 |
Methods and apparatus for calibrating programmable material consolidation apparatus |
Jul. 3, 2007 |
| 7239933 |
Substrate supports for use with programmable material consolidation apparatus and systems |
Jul. 3, 2007 |
| 7203565 |
Temperature abnormality detection method and semiconductor manufacturing apparatus |
Apr. 10, 2007 |
| 7175940 |
Method of two dimensional feature model calibration and optimization |
Feb. 13, 2007 |
| 7174520 |
Characterization and verification for integrated circuit designs |
Feb. 6, 2007 |
| 7158896 |
Real time immersion medium control using scatterometry |
Jan. 2, 2007 |
| 7143390 |
Method for creating alternating phase masks |
Nov. 28, 2006 |
| 7137801 |
Three-dimensional stereolithographic apparatus |
Nov. 21, 2006 |
| 7120895 |
System and method for lithography simulation |
Oct. 10, 2006 |
| 7117477 |
System and method for lithography simulation |
Oct. 3, 2006 |
| 7117478 |
System and method for lithography simulation |
Oct. 3, 2006 |
| 7114145 |
System and method for lithography simulation |
Sep. 26, 2006 |
| 7111277 |
System and method for lithography simulation |
Sep. 19, 2006 |
| 7076320 |
Scatterometry monitor in cluster process tool environment for advanced process control (APC) |
Jul. 11, 2006 |
| 7065427 |
Optical monitoring and control of two layers of liquid immersion media |
Jun. 20, 2006 |
| 7047098 |
Process and device for producing a shaped body by selective laser melting |
May. 16, 2006 |
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