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Class Information
Number: 522/914
Name: Synthetic resins or natural rubbers -- part of the class 520 series > Numerically specified distinct wavelength > Wavelength of 200 nanometers or less
Description: Subject matter wherein the exemplified treatment involves wave energy having a wavelength of 200 nanometers or less.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7166413 |
Enabling chain scission of branched photoresist |
Jan. 23, 2007 |
| 6746722 |
Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition |
Jun. 8, 2004 |
| 5288376 |
Preparation of perfluorooligoether iodides |
Feb. 22, 1994 |
| 4933398 |
Photosensitive epoxy resins and use thereof |
Jun. 12, 1990 |
| 4923780 |
Process for making a reverse image using a pigmented peel-apart photosensitive element containing a photoinhibitor |
May. 8, 1990 |
| 4781942 |
Process for the photochemical vapor deposition of siloxane polymers |
Nov. 1, 1988 |
| 4593050 |
Ultraviolet light assisted fluorination of polymer surfaces |
Jun. 3, 1986 |
| 4307045 |
Method for the improvement of a gramophone record |
Dec. 22, 1981 |
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