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Class Information
Number: 522/903
Name: Synthetic resins or natural rubbers -- part of the class 520 series > Removal of residual monomer
Description: Subject matter wherein polymers contaminated with monomer are treated by a wave energy step so as to remove any residual monomer.


Patents under this class:

Patent Number Title Of Patent Date Issued
7119128 Method for producing acrylate adhesive materials Oct. 10, 2006
7115673 Photosensitive resin composition, porous resin, circuit board, and wireless suspension board Oct. 3, 2006
6861469 Water-in-oil polymer dispersions with improved environmental compatibility Mar. 1, 2005
5216122 Removal of residual ethylene oxide from poly(ethylene oxide) Jun. 1, 1993
4810523 Pressure-sensitive adhesives Mar. 7, 1989
4762862 Process for preparing high molecular weight acrylic polymers Aug. 9, 1988
4704412 Improved high nitrile resins and process of preparing Nov. 3, 1987
4654378 Process for the manufacture of high solids, free-flowing, granular poly(dimethyldiallyl ammonium chloride) Mar. 31, 1987
4585808 Monomer removal from a polymer Apr. 29, 1986
4537734 Method for reducing the monomer content in acrylonitrile containing polymers Aug. 27, 1985
4376800 Optical lenses prepared from crosslinkable acrylic compositions Mar. 15, 1983
4376021 Process for producing a water-soluble vinyl polymer Mar. 8, 1983
4278518 Method for reducing the monomer residue content in polymer plastics Jul. 14, 1981
4252625 Preparation of water soluble polymeric flocculants by photopolymerization of hydrophilic monomers Feb. 24, 1981



 
 
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