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Class Information
Number: 522/52
Name: Synthetic resins or natural rubbers -- part of the class 520 series > Synthetic resins (class 520, subclass 1) > Compositions to be polymerized by wave energy wherein said composition contains a rate-affecting material; or compositions to be modified by wave energy wherein said composition contains a rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy > Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of at least one specified rate-affecting material; e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc. wave energy in order to prepare a cellular product > Specified rate-affecting material contains chalcogen other than as oxygen > Hetero nitrogen ring > Containing halogen
Description: Subject matter the heterocyclic ring compound contains at least one halogen atom.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6780896 |
Stabilized photoinitiators and applications thereof |
Aug. 24, 2004 |
| 6569603 |
Light-sensitive composition and method for forming relief image using said composition |
May. 27, 2003 |
| 6451869 |
Irradiation-curable silicone compositions, photo-active platinum (IV) compounds, and method |
Sep. 17, 2002 |
| 5716756 |
Sulfonic acid esters, radiation-sensitive mixtures prepared therewith and their use |
Feb. 10, 1998 |
| 5529886 |
Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof |
Jun. 25, 1996 |
| 5489499 |
Photosensitive trihalomethyl-s-triazine compound and photopolymerizable composition |
Feb. 6, 1996 |
| 5449588 |
Photosensitive polyimide precursor composition with photoacid generator |
Sep. 12, 1995 |
| 5298364 |
Radiation-sensitive sulfonic acid esters and their use |
Mar. 29, 1994 |
| 5286601 |
Composition containing a halomethyl-1,3,5-triazine containing an amine-containing moiety |
Feb. 15, 1994 |
| 5262276 |
Light-sensitive compositions |
Nov. 16, 1993 |
| 5258265 |
Aqueous developable deep UV negative resist |
Nov. 2, 1993 |
| 5258260 |
Aqueous developable deep UV negative resist |
Nov. 2, 1993 |
| 5141841 |
Radiation sensitive compound |
Aug. 25, 1992 |
| 5089536 |
Energy polmerizable compositions containing organometallic initiators |
Feb. 18, 1992 |
| 4946960 |
Perester compounds |
Aug. 7, 1990 |
| 4837128 |
Light-sensitive composition |
Jun. 6, 1989 |
| 4772534 |
Light sensitive composition containing a light sensitive s-triazine compound |
Sep. 20, 1988 |
| 4585876 |
Novel xanthones and thioxanthones |
Apr. 29, 1986 |
| 4459414 |
Tetrasubstituted phthalic acid derivatives, and a process for their preparation |
Jul. 10, 1984 |
| 4371605 |
Photopolymerizable compositions containing N-hydroxyamide and N-hydroxyimide sulfonates |
Feb. 1, 1983 |
| 4363917 |
3,5-Disubstituted phthalic acid imides, phthalic acids and phthalic acid anhydrides |
Dec. 14, 1982 |
| 4040922 |
Photopolymerizable polymeric compositions containing halogen containing heterocyclic compound |
Aug. 9, 1977 |
| 4012256 |
Photo-imaging utilizing alkali-activated photopolymerizable compositions |
Mar. 15, 1977 |
| 3962055 |
Photosensitive compositions containing benzothiazole sensitizers |
Jun. 8, 1976 |
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