Air inhibition

Dark storage stabilizer

Dental utility

Involving inert gas, steam, nitrogen gas, or carbon dioxide

Involving precursor of an ultraviolet absorber, e.g., monobenzoate, etc.

Monomer or polymer contains initiating group

Benzophenone group

Numerically specified distinct wavelength

Wavelength of 200 nanometers or less

Preparing shrinkable material

Removal of residual monomer

Solventless ink

Specified treatment involving megarad or less

Polymer derived from ethylenic monomers only

Synthetic resins (class 520, subclass 1)

Compositions to be polymerized by wave energy wherein said composition contains a rate-affecting material; or compositions to be modified by wave energy wherein said composition contains a rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy

Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of at least one specified rate-affecting material; e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc. wave energy in order to prepare a cellular product

Contains two or more rate-affecting materials, at least one of which is specified

At least two specified rate-affecting materials containing keto group not part of a ring; or contains a nonspecified photoinitiator or photosensitizer and specified ketone containing material wherein the keto group is not part of a ring

With a heterocyclic specified rate-affecting material

With a tertiary amine specified rate-affecting material

Contains compound containing keto group not part of a ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer

Specified rate-affecting material is a peroxide or azo compound

Specified rate-affecting material is an amide or tertiary amine

Specified rate-affecting material contains onium group

Specified rate-affecting material is heterocyclic

Specified rate-affecting material contains sulfur

Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen atom

Specified rate-affecting material is an aldehyde or aldehyde derivative

Specified rate-affecting material is a carboxylic acid or derivative

Specified rate-affecting material contains c-oh or c-o-c group

Specified rate-affecting material contains an inorganic compound

Specified rate-affecting material contains only carbon, hydrogen, or halogen and at least one atom of carbon is bonded to hydrogen or a halogen atom

Contains compound containing keto group not part of a ring and nonspecified rate-affecting material other than mere photoinitiator or photosensitizer

Specified rate-affecting material contains onium group

Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen

Specified rate-affecting material contains sulfur

Specified rate-affecting material is a metal-containing organic compound

Specified rate-affecting material is a peroxide

Specified rate-affecting material is heterocyclic

Specified rate-affecting material is organic

Specified rate-affecting material contains a c-n=n-c-group

Specified rate-affecting material contains a ketone group -c-(co)n-c-, the (co)n not being part of a ring

At least two aryl groups connected directly to same carbonyl carbon, e.g., benzophenone, etc.

Contained in polymeric rate-affecting material, e.g., synthetic resin, etc.

Containing c-co-c(h)(or) wherein r is organic, e.g., benzoin methyl ether, etc.

Containing c-co-c(r)(oh) wherein r is organic

Containing c-co-c(r)(or) wherein r is organic, e.g., diethoxyacetophenone, etc.

Containing c-co-choh, e.g., benzoin, etc.

Containing c-co-choh-chor wherein r is organic

Containing ethylenic unsaturation

Containing halogen, e.g., chloroacetone, etc.

Containing nitrogen

Containing phosphorous

Containing two or more ketone groups

Adjacent (c=o)* groups where * is at least two

Specified rate-affecting material contains chalcogen other than as oxygen

(o=s=o), e.g., sulfuryl or sulfonyl containing, etc.

C-(s)*-c wherein * is at least two

Hetero nitrogen ring

Containing halogen

Containing mercapto or mercaptide group, e.g., (thio)mercaptobenzoxazole, etc.

Hetero sulfur ring

Mercapto group attached directly to aromatic ring, e.g., thiophenol, etc.

Nitrogen containing compound

Sulfenate, e.g., r-o-s-r, etc.

Sulfide

Specified rate-affecting material contains halogen

Specified rate-affecting material contains metal atom

Specified rate-affecting material contains nitrogen or oxygen atom in heterocyclic ring

Specified rate-affecting material contains nitrogen

Specified rate-affecting material contains onium group

Diazonium containing material

Specified rate-affecting material contains only carbon and hydrogen

Specified rate-affecting material contains oxygen

Phenolic, e.g., hydroquinone, etc.

Specified rate-affecting material contains phosphorous

Specified rate-affecting material is a peroxide

Hydroperoxide

Specified rate-affecting material is a quinone

Quinone ring is part of polynuclear system, e.g., anthraquinone, etc.

Processes involving a polysiloxane having ethylenic unsaturation as reactant or as solid polymer; or compositions therefore

Processes involving a polyurethane having terminal ethylenic unsaturation as reactant or as solid polymer; or compositions therefore

Polyurethane has an oxygen other than as part of a urethane or carboxylic acid ester group

Polyurethane has at least one non-terminal ethylenic group

With a polysiloxane reactant or polymer

With a reactant containing ethylenic unsaturation derived from poly 1,2 epoxide or polymer

With aldehyde or aldehyde derivative reactant, condensate or solid polymer thereof

With ethylenic reactant

With polycarboxylic acid or derivative and a polyol, a condensate or solid polymer thereof reactant

With solid polymer derived solely from ethylenic monomers

Processes involving an ethylenically unsaturated material derived from poly 1,2-epoxide as reactant or a solid polymer; or compositions thereof

With ethylenic reactant

With polycarboxylic acid or derivative and a polyol, condensate or solid polymer thereof

With solid polymer derived solely from ethylencally unsaturated monomers

Processes involving an ethylenically unsaturated polyester derived from a polycarboxylic acid or derivative and polyol, condensate or solid polymer thereof; or compositions therefore

Condensate or solid polymer contains oxygen other than as part of a carboxylic acid ester moiety

With aldehyde or aldehyde derivative reactant or polymer thereof

With ethylenic reactant

With solid polymer derived from ethylenically unsaturated monomers only

Processes involving carbohydrate as reactant or as solid polymer; or compositions therefore

Preparing a polymer from carbohydrate and ethylenic reactant

Processes involving protein as reactant or as solid polymer; or compositions therefore

Processes of chemically modifying a blend of two or more solid polymers in the presence of a chemical reactant; or compositions therefore

At least one solid polymer derived from ethylenic monomers has at least two ethylenic groups

Processes of chemically modifying a solid polymer derived only from ethylenically unsaturated monomers by treating polymer with a chemical reactant; or compositions therefore

Chemical reacant contains oxygen

Contains c=o moiety

Chemical reactant contains nitrogen

Chemical reactant contains sulfur

Elemental sulfur

Chemical reactant is elemental halogen

Solid polymer derived from single monomer

Solid polymer treated contains halogen

Chemical reactant is ethylenically unsaturated

Carbon and hyrogen only

Carbon, hydrogen and halogen or carbon and halogen only

Nitrogen

Chemical reactant has two or more ethylenic groups

Oxygen

Chemical reactant has two or more ethylenic groups

Contains c-oh group other than as part of a coo-moiety

Hetero oxygen

Phosphorus

Sulfur

Chemical reactant has two or more ethylenic groups

Processes of chemically modifying a solid polymer or sicp derived from at least one saturated monomer by treating solid polymer or sicp with a chemical reactant; or compositions therefor

Chemical reactant contains chalcogen

Chemical reactant contains halogen

Chemical reactant is ethylenically unsaturated

Chalcogen

Carboxylic acid or derivative

Chemical reactant has two or more ethylenic groups

Hetero oxygen

Chemical reactant has two or more ethylenic groups and contains only carbon and hydrogen

Nitrogen

Chemical reactant has two or more ethylenic groups

Hetero nitrogen

N-c=o containing

Two or more n-c=o groups

Processes of forming or modifying a solid polymer by laser; or compositions therefore

Processes of forming or modifying a solid polymer by wave energy wherein a temperature less than 0 degree c (32 degree f) or greater than 250 degree c (482 degree f) is employed; or compositions therefore

Processes of forming or modifying a solid polymer by wave energy wherein at least two distinct external radiant energy sources are utilized; or compositions therefore

Processes of forming or modifying a solid polymer wherein specified mixing, stirring, agitating, movement of material or directional orientation is employed; or compositions therefore

Processes of preparing a solid polymer from a heterocyclic chalogen monomer; or compsitions therefore

1,2 epoxy

Two or more hetero atoms in hetero ring at least one of which is oxygen

Processes of preparing a solid polymer from at least one nitrogen containing monomer; or compositions therefore

Acrylonitrile or methacrylonitrile

Nitrogen containing reactant contains a n-c=o or n-c=o moiety

Acrylamide or methacrylamide

Organic polyamine and polycarboxylic acid or derivative or from an organic amine salt of a polycarboxylic acid

Processes of preparing a solid polymer from at least one oxygen containing monomer; or compositions therefore

Carboxylic acid or derivative

Oxygen other than as part of a coo-group

Ether group

Polycarboxylic acid or derivative and polyol, or condensate thereof, e.g., dimethylterephthalate, etc.

Sulfur containing

Processes of preparing a solid polymer from at least one phosphorous containing monomer; or compositions therefore

Processes of preparing a solid polymer from at least one silicon containing monomer; or compositions therefore

Processes of preparing a solid polymer from ethylenic reactants only; or compositions therefore

At least one reactant contains halogen

At least one reactant contains two or more ethylenic groups

Carbon, hydrogen and halogen only reactant contains at least three carbon atoms

Derived from aromatic hydrocarbon

Derived from ethylene only

Processes of preparing a solid polymer from heterocyclic nitrogen monomers; or compositions therefore, e.g., carbazole, etc.

Processes of preparing or treating a solid polymer by wave energy in the presence of a designated nonreactant material (dnrm); or compositions therefore

Carbohydrate or derivative dnrm

Coal, asphaltic, or bituminous material dnrm

Heavy metal containing dnrm

Organic dnrm

Carbon and hydrogen only containing dnrm

Heterocyclic ring containing dnrm

Nitrogen containing dnrm

Oxygen containing dnrm

Phosphorous containing dnrm

Silicon containing dnrm

Oxygen containing dnrm

Water

Reacting an ethylenic monomer in the presence of a solid polymer

Treating a solid polymer

Phosphorous or sulfur containing dnrm

Processes of treating a blend of two or more solid polymers or reacting one solid polymer with another solid polymer; or compositions therefore

At least two solid polymers derived from ethylenic monomers only

Processes of treating a reaction product of a solid polymer and ethylenic reactant; or compositions therefore e.g., graft- or graft-type polymer, etc.

Processes of treating a solid polymer derived from ethylenic monomers only; or compositions therefore

Solid polymer derived from carboxylic acid or derivative monomer

Oxygen other than as part of carboxylic acid or derivative moiety

Solid polymer derived from halogen containing monomer

Halogen is fluorine

Solid polymer derived from monomer containing only carbon and hydrogen

At least one reactant contains two or more ethylenic groups

Polyisoprene or natural rubber

Carbocyclic ring containing, e.g., styrene, etc.

Derived from ethylene

Solid polymer derived from nitrogen containing monomer

Nitrogen containing monomer contains oxygen

Processes of treating a solid polymer or sicp derived from at least one nonethylenic reactant or compositions therefore

Solid polymer or sicp derived from at least one heterocyclic monomer or aldehyde or aldehyde derivative

Solid polymer or sicp derived from polycarboxylic acid or derivative and organic amine or from organic amine salt of a polycarboxylic acid

Solid polymer or sicp derived from polycarboxylic acid or derivative and polyol

Solid polymer or sicp derived from reactant having halo-c(=o)-halo,halo c(=o)-o, or -o-c(=o)-o-group

Processes of treating a solid polymer or sicp derived from silicon containing reactant; or compositions therefore

Treatment through an external filter or mask (nonphotograghic process)