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Class Information
Number: 522
Name: Synthetic resins or natural rubbers -- part of the class 520 series >
Description: GENERAL SUMMARY OF SUBJECT MATTER WITHIN THIS CLASS


Class Number Class Name No. of Patents
522/902

Air inhibition

13
522/901

Dark storage stabilizer

16
522/908

Dental utility

129
522/915

Involving inert gas, steam, nitrogen gas, or carbon dioxide

17
522/907

Involving precursor of an ultraviolet absorber, e.g., monobenzoate, etc.

13
522/904

Monomer or polymer contains initiating group

228
522/905

Benzophenone group

96
522/913

Numerically specified distinct wavelength

38
522/914

Wavelength of 200 nanometers or less

8
522/906

Preparing shrinkable material

4
522/903

Removal of residual monomer

14
522/909

Solventless ink

28
522/911

Specified treatment involving megarad or less

28
522/912

Polymer derived from ethylenic monomers only

33
 

Synthetic resins (class 520, subclass 1)

 
522/1

Compositions to be polymerized by wave energy wherein said composition contains a rate-affecting material; or compositions to be modified by wave energy wherein said composition contains a rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy

105
522/6

Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of at least one specified rate-affecting material; e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc. wave energy in order to prepare a cellular product

139
522/7

Contains two or more rate-affecting materials, at least one of which is specified

66
522/8

At least two specified rate-affecting materials containing keto group not part of a ring; or contains a nonspecified photoinitiator or photosensitizer and specified ketone containing material wherein the keto group is not part of a ring

226
522/9

With a heterocyclic specified rate-affecting material

85
522/10

With a tertiary amine specified rate-affecting material

86
522/12

Contains compound containing keto group not part of a ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer

105
522/13

Specified rate-affecting material is a peroxide or azo compound

149
522/14

Specified rate-affecting material is an amide or tertiary amine

399
522/15

Specified rate-affecting material contains onium group

187
522/16

Specified rate-affecting material is heterocyclic

277
522/17

Specified rate-affecting material contains sulfur

113
522/18

Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen atom

249
522/19

Specified rate-affecting material is an aldehyde or aldehyde derivative

14
522/20

Specified rate-affecting material is a carboxylic acid or derivative

66
522/21

Specified rate-affecting material contains c-oh or c-o-c group

87
522/22

Specified rate-affecting material contains an inorganic compound

33
522/23

Specified rate-affecting material contains only carbon, hydrogen, or halogen and at least one atom of carbon is bonded to hydrogen or a halogen atom

35
522/11

Contains compound containing keto group not part of a ring and nonspecified rate-affecting material other than mere photoinitiator or photosensitizer

45
522/25

Specified rate-affecting material contains onium group

393
522/28

Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen

313
522/27

Specified rate-affecting material contains sulfur

146
522/29

Specified rate-affecting material is a metal-containing organic compound

183
522/24

Specified rate-affecting material is a peroxide

172
522/26

Specified rate-affecting material is heterocyclic

380
522/30

Specified rate-affecting material is organic

83
522/62

Specified rate-affecting material contains a c-n=n-c-group

69
522/33

Specified rate-affecting material contains a ketone group -c-(co)n-c-, the (co)n not being part of a ring

207
522/46

At least two aryl groups connected directly to same carbonyl carbon, e.g., benzophenone, etc.

273
522/35

Contained in polymeric rate-affecting material, e.g., synthetic resin, etc.

164
522/43

Containing c-co-c(h)(or) wherein r is organic, e.g., benzoin methyl ether, etc.

137
522/42

Containing c-co-c(r)(oh) wherein r is organic

207
522/44

Containing c-co-c(r)(or) wherein r is organic, e.g., diethoxyacetophenone, etc.

238
522/40

Containing c-co-choh, e.g., benzoin, etc.

140
522/41

Containing c-co-choh-chor wherein r is organic

48
522/34

Containing ethylenic unsaturation

180
522/45

Containing halogen, e.g., chloroacetone, etc.

74
522/39

Containing nitrogen

231
522/38

Containing phosphorous

54
522/36

Containing two or more ketone groups

138
522/37

Adjacent (c=o)* groups where * is at least two

93
522/49

Specified rate-affecting material contains chalcogen other than as oxygen

88
522/59

(o=s=o), e.g., sulfuryl or sulfonyl containing, etc.

115
522/54

C-(s)*-c wherein * is at least two

25
522/50

Hetero nitrogen ring

107
522/52

Containing halogen

24
522/51

Containing mercapto or mercaptide group, e.g., (thio)mercaptobenzoxazole, etc.

21
522/53

Hetero sulfur ring

134
522/56

Mercapto group attached directly to aromatic ring, e.g., thiophenol, etc.

13
522/57

Nitrogen containing compound

90
522/58

Sulfenate, e.g., r-o-s-r, etc.

4
522/55

Sulfide

40
522/67

Specified rate-affecting material contains halogen

101
522/66

Specified rate-affecting material contains metal atom

258
522/63

Specified rate-affecting material contains nitrogen or oxygen atom in heterocyclic ring

306
522/65

Specified rate-affecting material contains nitrogen

248
522/31

Specified rate-affecting material contains onium group

623
522/32

Diazonium containing material

112
522/70

Specified rate-affecting material contains only carbon and hydrogen

24
522/68

Specified rate-affecting material contains oxygen

166
522/69

Phenolic, e.g., hydroquinone, etc.

27
522/64

Specified rate-affecting material contains phosphorous

245
522/60

Specified rate-affecting material is a peroxide

125
522/61

Hydroperoxide

24
522/47

Specified rate-affecting material is a quinone

62
522/48

Quinone ring is part of polynuclear system, e.g., anthraquinone, etc.

148
522/99

Processes involving a polysiloxane having ethylenic unsaturation as reactant or as solid polymer; or compositions therefore

513
522/90

Processes involving a polyurethane having terminal ethylenic unsaturation as reactant or as solid polymer; or compositions therefore

472
522/97

Polyurethane has an oxygen other than as part of a urethane or carboxylic acid ester group

381
522/98

Polyurethane has at least one non-terminal ethylenic group

57
522/91

With a polysiloxane reactant or polymer

79
522/92

With a reactant containing ethylenic unsaturation derived from poly 1,2 epoxide or polymer

133
522/94

With aldehyde or aldehyde derivative reactant, condensate or solid polymer thereof

31
522/96

With ethylenic reactant

899
522/93

With polycarboxylic acid or derivative and a polyol, a condensate or solid polymer thereof reactant

127
522/95

With solid polymer derived solely from ethylenic monomers

189
522/100

Processes involving an ethylenically unsaturated material derived from poly 1,2-epoxide as reactant or a solid polymer; or compositions thereof

405
522/103

With ethylenic reactant

477
522/101

With polycarboxylic acid or derivative and a polyol, condensate or solid polymer thereof

93
522/102

With solid polymer derived solely from ethylencally unsaturated monomers

152
522/104

Processes involving an ethylenically unsaturated polyester derived from a polycarboxylic acid or derivative and polyol, condensate or solid polymer thereof; or compositions therefore

296
522/108

Condensate or solid polymer contains oxygen other than as part of a carboxylic acid ester moiety

79
522/105

With aldehyde or aldehyde derivative reactant or polymer thereof

27
522/107

With ethylenic reactant

354
522/106

With solid polymer derived from ethylenically unsaturated monomers only

78
522/88

Processes involving carbohydrate as reactant or as solid polymer; or compositions therefore

118
522/89

Preparing a polymer from carbohydrate and ethylenic reactant

114
522/87

Processes involving protein as reactant or as solid polymer; or compositions therefore

81
522/109

Processes of chemically modifying a blend of two or more solid polymers in the presence of a chemical reactant; or compositions therefore

229
522/110

At least one solid polymer derived from ethylenic monomers has at least two ethylenic groups

171
522/113

Processes of chemically modifying a solid polymer derived only from ethylenically unsaturated monomers by treating polymer with a chemical reactant; or compositions therefore

165
522/129

Chemical reacant contains oxygen

126
522/130

Contains c=o moiety

45
522/126

Chemical reactant contains nitrogen

106
522/127

Chemical reactant contains sulfur

44
522/128

Elemental sulfur

7
522/131

Chemical reactant is elemental halogen

16
522/133

Solid polymer derived from single monomer

26
522/132

Solid polymer treated contains halogen

26
522/114

Chemical reactant is ethylenically unsaturated

161
522/125

Carbon and hyrogen only

64
522/124

Carbon, hydrogen and halogen or carbon and halogen only

35
522/116

Nitrogen

187
522/117

Chemical reactant has two or more ethylenic groups

137
522/120

Oxygen

341
522/121

Chemical reactant has two or more ethylenic groups

609
522/123

Contains c-oh group other than as part of a coo-moiety

52
522/122

Hetero oxygen

69
522/115

Phosphorus

37
522/118

Sulfur

28
522/119

Chemical reactant has two or more ethylenic groups

29
522/134

Processes of chemically modifying a solid polymer or sicp derived from at least one saturated monomer by treating solid polymer or sicp with a chemical reactant; or compositions therefor

107
522/146

Chemical reactant contains chalcogen

132
522/147

Chemical reactant contains halogen

20
522/135

Chemical reactant is ethylenically unsaturated

109
522/141

Chalcogen

77
522/144

Carboxylic acid or derivative

133
522/142

Chemical reactant has two or more ethylenic groups

207
522/143

Hetero oxygen

55
522/145

Chemical reactant has two or more ethylenic groups and contains only carbon and hydrogen

17
522/136

Nitrogen

78
522/137

Chemical reactant has two or more ethylenic groups

100
522/138

Hetero nitrogen

33
522/139

N-c=o containing

40
522/140

Two or more n-c=o groups

24
522/2

Processes of forming or modifying a solid polymer by laser; or compositions therefore

145
522/5

Processes of forming or modifying a solid polymer by wave energy wherein a temperature less than 0 degree c (32 degree f) or greater than 250 degree c (482 degree f) is employed; or compositions therefore

53
522/4

Processes of forming or modifying a solid polymer by wave energy wherein at least two distinct external radiant energy sources are utilized; or compositions therefore

101
522/3

Processes of forming or modifying a solid polymer wherein specified mixing, stirring, agitating, movement of material or directional orientation is employed; or compositions therefore

106
522/168

Processes of preparing a solid polymer from a heterocyclic chalogen monomer; or compsitions therefore

223
522/170

1,2 epoxy

659
522/169

Two or more hetero atoms in hetero ring at least one of which is oxygen

70
522/173

Processes of preparing a solid polymer from at least one nitrogen containing monomer; or compositions therefore

404
522/177

Acrylonitrile or methacrylonitrile

31
522/174

Nitrogen containing reactant contains a n-c=o or n-c=o moiety

296
522/175

Acrylamide or methacrylamide

116
522/176

Organic polyamine and polycarboxylic acid or derivative or from an organic amine salt of a polycarboxylic acid

59
522/178

Processes of preparing a solid polymer from at least one oxygen containing monomer; or compositions therefore

238
522/182

Carboxylic acid or derivative

748
522/183

Oxygen other than as part of a coo-group

181
522/181

Ether group

403
522/179

Polycarboxylic acid or derivative and polyol, or condensate thereof, e.g., dimethylterephthalate, etc.

107
522/180

Sulfur containing

137
522/171

Processes of preparing a solid polymer from at least one phosphorous containing monomer; or compositions therefore

80
522/172

Processes of preparing a solid polymer from at least one silicon containing monomer; or compositions therefore

328
522/184

Processes of preparing a solid polymer from ethylenic reactants only; or compositions therefore

111
522/187

At least one reactant contains halogen

42
522/186

At least one reactant contains two or more ethylenic groups

81
522/185

Carbon, hydrogen and halogen only reactant contains at least three carbon atoms

37
522/188

Derived from aromatic hydrocarbon

61
522/189

Derived from ethylene only

33
522/167

Processes of preparing a solid polymer from heterocyclic nitrogen monomers; or compositions therefore, e.g., carbazole, etc.

279
522/71

Processes of preparing or treating a solid polymer by wave energy in the presence of a designated nonreactant material (dnrm); or compositions therefore

291
522/72

Carbohydrate or derivative dnrm

47
522/73

Coal, asphaltic, or bituminous material dnrm

11
522/81

Heavy metal containing dnrm

467
522/74

Organic dnrm

192
522/80

Carbon and hydrogen only containing dnrm

123
522/75

Heterocyclic ring containing dnrm

279
522/78

Nitrogen containing dnrm

164
522/79

Oxygen containing dnrm

425
522/76

Phosphorous containing dnrm

55
522/77

Silicon containing dnrm

211
522/83

Oxygen containing dnrm

457
522/84

Water

347
522/85

Reacting an ethylenic monomer in the presence of a solid polymer

187
522/86

Treating a solid polymer

153
522/82

Phosphorous or sulfur containing dnrm

46
522/111

Processes of treating a blend of two or more solid polymers or reacting one solid polymer with another solid polymer; or compositions therefore

200
522/112

At least two solid polymers derived from ethylenic monomers only

189
522/149

Processes of treating a reaction product of a solid polymer and ethylenic reactant; or compositions therefore e.g., graft- or graft-type polymer, etc.

280
522/150

Processes of treating a solid polymer derived from ethylenic monomers only; or compositions therefore

255
522/153

Solid polymer derived from carboxylic acid or derivative monomer

306
522/154

Oxygen other than as part of carboxylic acid or derivative moiety

173
522/155

Solid polymer derived from halogen containing monomer

74
522/156

Halogen is fluorine

94
522/157

Solid polymer derived from monomer containing only carbon and hydrogen

142
522/158

At least one reactant contains two or more ethylenic groups

107
522/159

Polyisoprene or natural rubber

46
522/160

Carbocyclic ring containing, e.g., styrene, etc.

73
522/161

Derived from ethylene

175
522/151

Solid polymer derived from nitrogen containing monomer

131
522/152

Nitrogen containing monomer contains oxygen

224
522/162

Processes of treating a solid polymer or sicp derived from at least one nonethylenic reactant or compositions therefore

173
522/166

Solid polymer or sicp derived from at least one heterocyclic monomer or aldehyde or aldehyde derivative

170
522/164

Solid polymer or sicp derived from polycarboxylic acid or derivative and organic amine or from organic amine salt of a polycarboxylic acid

165
522/165

Solid polymer or sicp derived from polycarboxylic acid or derivative and polyol

79
522/163

Solid polymer or sicp derived from reactant having halo-c(=o)-halo,halo c(=o)-o, or -o-c(=o)-o-group

58
522/148

Processes of treating a solid polymer or sicp derived from silicon containing reactant; or compositions therefore

303
522/910

Treatment through an external filter or mask (nonphotograghic process)

24
 
 
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