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Class Information
Number: 522
Name: Synthetic resins or natural rubbers -- part of the class 520 series >
Description: GENERAL SUMMARY OF SUBJECT MATTER WITHIN THIS CLASS










Class Number Class Name No. of Patents
522/902

Air inhibition

15
522/901

Dark storage stabilizer

16
522/908

Dental utility

146
522/915

Involving inert gas, steam, nitrogen gas, or carbon dioxide

17
522/907

Involving precursor of an ultraviolet absorber, e.g., monobenzoate, etc.

13
522/904

Monomer or polymer contains initiating group

244
522/905

Benzophenone group

101
522/913

Numerically specified distinct wavelength

41
522/914

Wavelength of 200 nanometers or less

9
522/906

Preparing shrinkable material

4
522/903

Removal of residual monomer

15
522/909

Solventless ink

51
522/911

Specified treatment involving megarad or less

28
522/912

Polymer derived from ethylenic monomers only

36
 

Synthetic resins (class 520, subclass 1)

 
522/1

Compositions to be polymerized by wave energy wherein said composition contains a rate-affecting material; or compositions to be modified by wave energy wherein said composition contains a rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy

191
522/6

Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of at least one specified rate-affecting material; e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc. wave energy in order to prepare a cellular product

201
522/7

Contains two or more rate-affecting materials, at least one of which is specified

92
522/8

At least two specified rate-affecting materials containing keto group not part of a ring; or contains a nonspecified photoinitiator or photosensitizer and specified ketone containing material wherein the keto group is not part of a ring

247
522/9

With a heterocyclic specified rate-affecting material

94
522/10

With a tertiary amine specified rate-affecting material

96
522/12

Contains compound containing keto group not part of a ring and a specified rate-affecting material; or contains a specified rate-affecting material and a nonspecified photoinitiator or photosensitizer

117
522/13

Specified rate-affecting material is a peroxide or azo compound

157
522/14

Specified rate-affecting material is an amide or tertiary amine

418
522/15

Specified rate-affecting material contains onium group

209
522/16

Specified rate-affecting material is heterocyclic

302
522/17

Specified rate-affecting material contains sulfur

118
522/18

Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen atom

263
522/19

Specified rate-affecting material is an aldehyde or aldehyde derivative

15
522/20

Specified rate-affecting material is a carboxylic acid or derivative

67
522/21

Specified rate-affecting material contains c-oh or c-o-c group

92
522/22

Specified rate-affecting material contains an inorganic compound

36
522/23

Specified rate-affecting material contains only carbon, hydrogen, or halogen and at least one atom of carbon is bonded to hydrogen or a halogen atom

36
522/11

Contains compound containing keto group not part of a ring and nonspecified rate-affecting material other than mere photoinitiator or photosensitizer

49
522/25

Specified rate-affecting material contains onium group

435
522/28

Specified rate-affecting material contains phosphorous, arsenic, antimony or nitrogen

345
522/27

Specified rate-affecting material contains sulfur

166
522/29

Specified rate-affecting material is a metal-containing organic compound

192
522/24

Specified rate-affecting material is a peroxide

181
522/26

Specified rate-affecting material is heterocyclic

410
522/30

Specified rate-affecting material is organic

95
522/62

Specified rate-affecting material contains a c-n=n-c-group

80
522/33

Specified rate-affecting material contains a ketone group -c-(co)n-c-, the (co)n not being part of a ring

241
522/46

At least two aryl groups connected directly to same carbonyl carbon, e.g., benzophenone, etc.

310
522/35

Contained in polymeric rate-affecting material, e.g., synthetic resin, etc.

186
522/43

Containing c-co-c(h)(or) wherein r is organic, e.g., benzoin methyl ether, etc.

151
522/42

Containing c-co-c(r)(oh) wherein r is organic

242
522/44

Containing c-co-c(r)(or) wherein r is organic, e.g., diethoxyacetophenone, etc.

259
522/40

Containing c-co-choh, e.g., benzoin, etc.

157
522/41

Containing c-co-choh-chor wherein r is organic

52
522/34

Containing ethylenic unsaturation

192
522/45

Containing halogen, e.g., chloroacetone, etc.

74
522/39

Containing nitrogen

262
522/38

Containing phosphorous

65
522/36

Containing two or more ketone groups

152
522/37

Adjacent (c=o)* groups where * is at least two

98
522/49

Specified rate-affecting material contains chalcogen other than as oxygen

110
522/59

(o=s=o), e.g., sulfuryl or sulfonyl containing, etc.

135
522/54

C-(s)*-c wherein * is at least two

25
522/50

Hetero nitrogen ring

118
522/52

Containing halogen

25
522/51

Containing mercapto or mercaptide group, e.g., (thio)mercaptobenzoxazole, etc.

24
522/53

Hetero sulfur ring

157
522/56

Mercapto group attached directly to aromatic ring, e.g., thiophenol, etc.

17
522/57

Nitrogen containing compound

107
522/58

Sulfenate, e.g., r-o-s-r, etc.

4
522/55

Sulfide

47
522/67

Specified rate-affecting material contains halogen

112
522/66

Specified rate-affecting material contains metal atom

283
522/63

Specified rate-affecting material contains nitrogen or oxygen atom in heterocyclic ring

343
522/65

Specified rate-affecting material contains nitrogen

289
522/31

Specified rate-affecting material contains onium group

691
522/32

Diazonium containing material

119
522/70

Specified rate-affecting material contains only carbon and hydrogen

31
522/68

Specified rate-affecting material contains oxygen

185
522/69

Phenolic, e.g., hydroquinone, etc.

27
522/64

Specified rate-affecting material contains phosphorous

295
522/60

Specified rate-affecting material is a peroxide

137
522/61

Hydroperoxide

27
522/47

Specified rate-affecting material is a quinone

71
522/48

Quinone ring is part of polynuclear system, e.g., anthraquinone, etc.

171
522/99

Processes involving a polysiloxane having ethylenic unsaturation as reactant or as solid polymer; or compositions therefore

574
522/90

Processes involving a polyurethane having terminal ethylenic unsaturation as reactant or as solid polymer; or compositions therefore

577
522/97

Polyurethane has an oxygen other than as part of a urethane or carboxylic acid ester group

423
522/98

Polyurethane has at least one non-terminal ethylenic group

65
522/91

With a polysiloxane reactant or polymer

91
522/92

With a reactant containing ethylenic unsaturation derived from poly 1,2 epoxide or polymer

154
522/94

With aldehyde or aldehyde derivative reactant, condensate or solid polymer thereof

32
522/96

With ethylenic reactant

998
522/93

With polycarboxylic acid or derivative and a polyol, a condensate or solid polymer thereof reactant

140
522/95

With solid polymer derived solely from ethylenic monomers

200
522/100

Processes involving an ethylenically unsaturated material derived from poly 1,2-epoxide as reactant or a solid polymer; or compositions thereof

466
522/103

With ethylenic reactant

517
522/101

With polycarboxylic acid or derivative and a polyol, condensate or solid polymer thereof

113
522/102

With solid polymer derived solely from ethylencally unsaturated monomers

166
522/104

Processes involving an ethylenically unsaturated polyester derived from a polycarboxylic acid or derivative and polyol, condensate or solid polymer thereof; or compositions therefore

368
522/108

Condensate or solid polymer contains oxygen other than as part of a carboxylic acid ester moiety

86
522/105

With aldehyde or aldehyde derivative reactant or polymer thereof

29
522/107

With ethylenic reactant

405
522/106

With solid polymer derived from ethylenically unsaturated monomers only

84
522/88

Processes involving carbohydrate as reactant or as solid polymer; or compositions therefore

134
522/89

Preparing a polymer from carbohydrate and ethylenic reactant

130
522/87

Processes involving protein as reactant or as solid polymer; or compositions therefore

91
522/109

Processes of chemically modifying a blend of two or more solid polymers in the presence of a chemical reactant; or compositions therefore

262
522/110

At least one solid polymer derived from ethylenic monomers has at least two ethylenic groups

190
522/113

Processes of chemically modifying a solid polymer derived only from ethylenically unsaturated monomers by treating polymer with a chemical reactant; or compositions therefore

286
522/129

Chemical reacant contains oxygen

150
522/130

Contains c=o moiety

63
522/126

Chemical reactant contains nitrogen

124
522/127

Chemical reactant contains sulfur

49
522/128

Elemental sulfur

8
522/131

Chemical reactant is elemental halogen

22
522/133

Solid polymer derived from single monomer

29
522/132

Solid polymer treated contains halogen

33
522/114

Chemical reactant is ethylenically unsaturated

270
522/125

Carbon and hyrogen only

73
522/124

Carbon, hydrogen and halogen or carbon and halogen only

39
522/116

Nitrogen

225
522/117

Chemical reactant has two or more ethylenic groups

164
522/120

Oxygen

454
522/121

Chemical reactant has two or more ethylenic groups

716
522/123

Contains c-oh group other than as part of a coo-moiety

60
522/122

Hetero oxygen

82
522/115

Phosphorus

46
522/118

Sulfur

37
522/119

Chemical reactant has two or more ethylenic groups

34
522/134

Processes of chemically modifying a solid polymer or sicp derived from at least one saturated monomer by treating solid polymer or sicp with a chemical reactant; or compositions therefor

155
522/146

Chemical reactant contains chalcogen

142
522/147

Chemical reactant contains halogen

24
522/135

Chemical reactant is ethylenically unsaturated

146
522/141

Chalcogen

91
522/144

Carboxylic acid or derivative

169
522/142

Chemical reactant has two or more ethylenic groups

228
522/143

Hetero oxygen

70
522/145

Chemical reactant has two or more ethylenic groups and contains only carbon and hydrogen

22
522/136

Nitrogen

85
522/137

Chemical reactant has two or more ethylenic groups

109
522/138

Hetero nitrogen

36
522/139

N-c=o containing

44
522/140

Two or more n-c=o groups

26
522/2

Processes of forming or modifying a solid polymer by laser; or compositions therefore

170
522/5

Processes of forming or modifying a solid polymer by wave energy wherein a temperature less than 0 degree c (32 degree f) or greater than 250 degree c (482 degree f) is employed; or compositions therefore

54
522/4

Processes of forming or modifying a solid polymer by wave energy wherein at least two distinct external radiant energy sources are utilized; or compositions therefore

108
522/3

Processes of forming or modifying a solid polymer wherein specified mixing, stirring, agitating, movement of material or directional orientation is employed; or compositions therefore

117
522/168

Processes of preparing a solid polymer from a heterocyclic chalogen monomer; or compsitions therefore

303
522/170

1,2 epoxy

752
522/169

Two or more hetero atoms in hetero ring at least one of which is oxygen

78
522/173

Processes of preparing a solid polymer from at least one nitrogen containing monomer; or compositions therefore

531
522/177

Acrylonitrile or methacrylonitrile

33
522/174

Nitrogen containing reactant contains a n-c=o or n-c=o moiety

373
522/175

Acrylamide or methacrylamide

130
522/176

Organic polyamine and polycarboxylic acid or derivative or from an organic amine salt of a polycarboxylic acid

75
522/178

Processes of preparing a solid polymer from at least one oxygen containing monomer; or compositions therefore

399
522/182

Carboxylic acid or derivative

956
522/183

Oxygen other than as part of a coo-group

225
522/181

Ether group

487
522/179

Polycarboxylic acid or derivative and polyol, or condensate thereof, e.g., dimethylterephthalate, etc.

126
522/180

Sulfur containing

166
522/171

Processes of preparing a solid polymer from at least one phosphorous containing monomer; or compositions therefore

105
522/172

Processes of preparing a solid polymer from at least one silicon containing monomer; or compositions therefore

384
522/184

Processes of preparing a solid polymer from ethylenic reactants only; or compositions therefore

155
522/187

At least one reactant contains halogen

55
522/186

At least one reactant contains two or more ethylenic groups

115
522/185

Carbon, hydrogen and halogen only reactant contains at least three carbon atoms

42
522/188

Derived from aromatic hydrocarbon

68
522/189

Derived from ethylene only

61
522/167

Processes of preparing a solid polymer from heterocyclic nitrogen monomers; or compositions therefore, e.g., carbazole, etc.

324
522/71

Processes of preparing or treating a solid polymer by wave energy in the presence of a designated nonreactant material (dnrm); or compositions therefore

430
522/72

Carbohydrate or derivative dnrm

48
522/73

Coal, asphaltic, or bituminous material dnrm

13
522/81

Heavy metal containing dnrm

549
522/74

Organic dnrm

307
522/80

Carbon and hydrogen only containing dnrm

144
522/75

Heterocyclic ring containing dnrm

355
522/78

Nitrogen containing dnrm

201
522/79

Oxygen containing dnrm

508
522/76

Phosphorous containing dnrm

77
522/77

Silicon containing dnrm

245
522/83

Oxygen containing dnrm

553
522/84

Water

405
522/85

Reacting an ethylenic monomer in the presence of a solid polymer

216
522/86

Treating a solid polymer

177
522/82

Phosphorous or sulfur containing dnrm

62
522/111

Processes of treating a blend of two or more solid polymers or reacting one solid polymer with another solid polymer; or compositions therefore

239
522/112

At least two solid polymers derived from ethylenic monomers only

215
522/149

Processes of treating a reaction product of a solid polymer and ethylenic reactant; or compositions therefore e.g., graft- or graft-type polymer, etc.

311
522/150

Processes of treating a solid polymer derived from ethylenic monomers only; or compositions therefore

374
522/153

Solid polymer derived from carboxylic acid or derivative monomer

433
522/154

Oxygen other than as part of carboxylic acid or derivative moiety

235
522/155

Solid polymer derived from halogen containing monomer

91
522/156

Halogen is fluorine

120
522/157

Solid polymer derived from monomer containing only carbon and hydrogen

186
522/158

At least one reactant contains two or more ethylenic groups

127
522/159

Polyisoprene or natural rubber

61
522/160

Carbocyclic ring containing, e.g., styrene, etc.

89
522/161

Derived from ethylene

226
522/151

Solid polymer derived from nitrogen containing monomer

186
522/152

Nitrogen containing monomer contains oxygen

289
522/162

Processes of treating a solid polymer or sicp derived from at least one nonethylenic reactant or compositions therefore

212
522/166

Solid polymer or sicp derived from at least one heterocyclic monomer or aldehyde or aldehyde derivative

185
522/164

Solid polymer or sicp derived from polycarboxylic acid or derivative and organic amine or from organic amine salt of a polycarboxylic acid

191
522/165

Solid polymer or sicp derived from polycarboxylic acid or derivative and polyol

92
522/163

Solid polymer or sicp derived from reactant having halo-c(=o)-halo,halo c(=o)-o, or -o-c(=o)-o-group

76
522/148

Processes of treating a solid polymer or sicp derived from silicon containing reactant; or compositions therefore

358
522/910

Treatment through an external filter or mask (nonphotograghic process)

26
 
 
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