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Class Information
Number: 510/176
Name: Cleaning compositions for solid surfaces, auxiliary compositions therefor, or processes of preparing the compositions > Cleaning compositions or processes of preparing (e.g., sodium bisulfate component, etc.) > For cleaning a specific substrate or removing a specific contaminant (e.g., for smoker`s pipe, etc.) > For printed or integrated electrical circuit, or semiconductor device > For stripping photoresist material
Description: Compositions specialized for stripping photoresist material.










Patents under this class:
1 2 3 4 5 6 7 8 9 10 11

Patent Number Title Of Patent Date Issued
4822723 Developer compositions for heavy-duty lithographic printing plates Apr. 18, 1989
4801519 Process for producing a pattern with negative-type photosensitive composition Jan. 31, 1989
4791043 Positive photoresist stripping composition Dec. 13, 1988
4776892 Process for stripping light-hardened photoresist layers Oct. 11, 1988
4765844 Solvents for photoresist removal Aug. 23, 1988
4744834 Photoresist stripper comprising a pyrrolidinone, a diethylene glycol ether, a polyglycol and a quaternary ammonium hydroxide May. 17, 1988
4741989 Positive photoresist aqueous developer solution containing quaternary ammonium hydroxide with aliphatic ketone or cyclic ether alone or with amine as development modifier May. 3, 1988
4734300 Methods for removing parylene coatings from predetermined, desired areas of a substrate Mar. 29, 1988
4729941 Photoresist processing solution with quaternary ammonium hydroxide Mar. 8, 1988
4716098 Developer for preparing printing forms and process therefor Dec. 29, 1987
4686002 Stabilized choline base solutions Aug. 11, 1987
4617251 Stripping composition and method of using the same Oct. 14, 1986
4610953 Aqueous developer solution for positive type photoresists with tetramethyl ammonium hydroxide and trimethyl hydroxyethyl ammonium hydroxide Sep. 9, 1986
4592787 Composition useful for stripping photoresist polymers and method Jun. 3, 1986
4578209 Composition for cleaning surface of substrate Mar. 25, 1986
4556629 Developer composition for positive photoresists using solution with cyclic quaternary ammonium hydroxides Dec. 3, 1985
4518675 Stripper for radiosensitive resist May. 21, 1985
4514232 Process for stripping silicon oil base thermal grease Apr. 30, 1985
4491530 Brown stain suppressing phenol free and chlorinated hydrocarbons free photoresist stripper Jan. 1, 1985
4483917 Photoresist stripper composition and method of use Nov. 20, 1984
4439338 Solution for stripping a layer of tin or tin-lead alloy from a substrate by means of a spraying operation Mar. 27, 1984
4438192 Photoresist stripper composition and method of use Mar. 20, 1984
4428871 Stripping compositions and methods of stripping resists Jan. 31, 1984
4426311 Methylene chloride-methane sulfonic acid stripping compositions and methods for using same Jan. 17, 1984
4403029 Stripping compositions and methods of stripping resists Sep. 6, 1983
4401747 Stripping compositions and methods of stripping resists Aug. 30, 1983
4401748 Stripping compositions and methods of stripping resists Aug. 30, 1983
4395479 Stripping compositions and methods of stripping resists Jul. 26, 1983
4395348 Photoresist stripping composition and method Jul. 26, 1983
4374744 Stripping solution for tin or tin alloys Feb. 22, 1983
4309300 Cleaning solvent and method of cleaning a metal surface Jan. 5, 1982
4304681 Novel stripping composition for positive photoresists and method of using same Dec. 8, 1981
4242218 Phenol-free photoresist stripper Dec. 30, 1980
4221674 Organic sulfonic acid stripping composition and method with nitrile and fluoride metal corrosion inhibitor system Sep. 9, 1980
4215005 Organic stripping compositions and method for using same Jul. 29, 1980
4187191 Photoresist stripper with dodecylsulfonic acid and chlorinated solvents Feb. 5, 1980
4169068 Stripping liquor composition for removing photoresists comprising hydrogen peroxide Sep. 25, 1979
4165295 Organic stripping compositions and method for using same Aug. 21, 1979
4165294 Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids Aug. 21, 1979
4101440 Chemically digestive agents Jul. 18, 1978
4087370 Photoresist stripper systems May. 2, 1978
4070203 Method for stripping photolacquers Jan. 24, 1978
4055515 Developer for printing plates Oct. 25, 1977
3988256 Photoresist stripper rinse Oct. 26, 1976
3980587 Stripper composition Sep. 14, 1976
3962108 Chemical stripping solution Jun. 8, 1976
3951843 Fluorocarbon composition for use in plasma removal of photoresist material from semiconductor devices Apr. 20, 1976

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