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Class Information
Number: 510/176
Name: Cleaning compositions for solid surfaces, auxiliary compositions therefor, or processes of preparing the compositions > Cleaning compositions or processes of preparing (e.g., sodium bisulfate component, etc.) > For cleaning a specific substrate or removing a specific contaminant (e.g., for smoker`s pipe, etc.) > For printed or integrated electrical circuit, or semiconductor device > For stripping photoresist material
Description: Compositions specialized for stripping photoresist material.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7608540 |
Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition |
Oct. 27, 2009 |
| 7605113 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
Oct. 20, 2009 |
| 7591270 |
Process solutions containing surfactants |
Sep. 22, 2009 |
| 7579309 |
Methods for characterizing defects on silicon surfaces and etching composition and treatment process therefor |
Aug. 25, 2009 |
| 7576046 |
Cleaning liquid for lithography and method of cleaning therewith |
Aug. 18, 2009 |
| 7569336 |
Composition for removing photoresist and method of forming a pattern using the same |
Aug. 4, 2009 |
| 7562662 |
Cleaning solution and cleaning method of a semiconductor device |
Jul. 21, 2009 |
| 7557073 |
Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist |
Jul. 7, 2009 |
| 7553803 |
Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions |
Jun. 30, 2009 |
| 7543592 |
Compositions and processes for photoresist stripping and residue removal in wafer level packaging |
Jun. 9, 2009 |
| 7534752 |
Post plasma ashing wafer cleaning formulation |
May. 19, 2009 |
| 7534753 |
pH buffered aqueous cleaning composition and method for removing photoresist residue |
May. 19, 2009 |
| 7531491 |
Aqueous cleaning solution for integrated circuit device and method of cleaning using the cleaning solution |
May. 12, 2009 |
| 7531492 |
Composition for the removal of sidewall residues |
May. 12, 2009 |
| 7528098 |
Semiconductor process residue removal composition and process |
May. 5, 2009 |
| 7521405 |
Process solutions containing surfactants |
Apr. 21, 2009 |
| 7521407 |
Remover composition |
Apr. 21, 2009 |
| 7498295 |
Alkaline chemistry for post-CMP cleaning comprising tetra alkyl ammonium hydroxide |
Mar. 3, 2009 |
| 7467632 |
Method for forming a photoresist pattern |
Dec. 23, 2008 |
| 7456141 |
Photo resist stripper composition |
Nov. 25, 2008 |
| 7456140 |
Compositions for cleaning organic and plasma etched residues for semiconductor devices |
Nov. 25, 2008 |
| 7452660 |
Method for resist strip in presence of low K dielectric material and apparatus for performing the same |
Nov. 18, 2008 |
| 7435711 |
Cleaning agent for removing solder flux and method for cleaning solder flux |
Oct. 14, 2008 |
| 7435712 |
Alkaline chemistry for post-CMP cleaning |
Oct. 14, 2008 |
| 7419945 |
Microelectronic cleaning compositions containing oxidizers and organic solvents |
Sep. 2, 2008 |
| 7417016 |
Composition for the removing of sidewall residues |
Aug. 26, 2008 |
| 7413848 |
Method of removing photoresist and photoresist rework method |
Aug. 19, 2008 |
| 7402552 |
Non-corrosive cleaning composition for removing plasma etching residues |
Jul. 22, 2008 |
| 7399365 |
Aqueous fluoride compositions for cleaning semiconductor devices |
Jul. 15, 2008 |
| 7387130 |
Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials |
Jun. 17, 2008 |
| 7381694 |
Composition and method for removing photoresist materials from electronic components |
Jun. 3, 2008 |
| 7365045 |
Aqueous cleaner with low metal etch rate comprising alkanolamine and tetraalkylammonium hydroxide |
Apr. 29, 2008 |
| 7361631 |
Compositions for the removal of organic and inorganic residues |
Apr. 22, 2008 |
| 7326673 |
Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates |
Feb. 5, 2008 |
| 7312186 |
Cleaning solution for semiconductor substrate |
Dec. 25, 2007 |
| 7309683 |
Cleaning composition and method of cleaning a semiconductor device using the same |
Dec. 18, 2007 |
| 7294610 |
Fluorinated sulfonamide surfactants for aqueous cleaning solutions |
Nov. 13, 2007 |
| 7273060 |
Methods for chemically treating a substrate using foam technology |
Sep. 25, 2007 |
| 7250391 |
Cleaning composition for removing resists and method of manufacturing semiconductor device |
Jul. 31, 2007 |
| 7241725 |
Barrier polishing fluid |
Jul. 10, 2007 |
| 7238653 |
Cleaning solution for photoresist and method for forming pattern using the same |
Jul. 3, 2007 |
| 7223721 |
Resist and etching by-product removing composition and resist removing method using the same |
May. 29, 2007 |
| 7220714 |
Process and composition for removing residues from the microstructure of an object |
May. 22, 2007 |
| 7216653 |
Cleaning solution and cleaning method of a semiconductor device |
May. 15, 2007 |
| 7211553 |
Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols |
May. 1, 2007 |
| 7208455 |
Method to increase electromigration resistance of copper using self-assembled organic thiolate monolayers |
Apr. 24, 2007 |
| 7208454 |
Cleaning solution for removing anti-reflective coating composition |
Apr. 24, 2007 |
| 7205265 |
Cleaning compositions and methods of use thereof |
Apr. 17, 2007 |
| 7199091 |
Photoresist stripper |
Apr. 3, 2007 |
| 7192910 |
Cleaning solutions and etchants and methods for using same |
Mar. 20, 2007 |
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