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Class Information
Number: 510/176
Name: Cleaning compositions for solid surfaces, auxiliary compositions therefor, or processes of preparing the compositions > Cleaning compositions or processes of preparing (e.g., sodium bisulfate component, etc.) > For cleaning a specific substrate or removing a specific contaminant (e.g., for smoker`s pipe, etc.) > For printed or integrated electrical circuit, or semiconductor device > For stripping photoresist material
Description: Compositions specialized for stripping photoresist material.










Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12

Patent Number Title Of Patent Date Issued
8685910 Cleaning liquid used in photolithography and a method for treating substrate therewith Apr. 1, 2014
8685909 Antioxidants for post-CMP cleaning formulations Apr. 1, 2014
8679734 Photoresist removal Mar. 25, 2014
8668777 Process for treating a semiconductor wafer Mar. 11, 2014
8669217 Cleaning composition, cleaning process, and process for producing semiconductor device Mar. 11, 2014
8658583 Method for making a photoresist stripping solution comprising an organic sulfonic acid and an organic hydrocarbon solvent Feb. 25, 2014
8642526 Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon Feb. 4, 2014
8618036 Aqueous cerium-containing solution having an extended bath lifetime for removing mask material Dec. 31, 2013
8614053 Processess and compositions for removing substances from substrates Dec. 24, 2013
8563495 Resist remover composition and method for removing resist using same Oct. 22, 2013
8563408 Spin-on formulation and method for stripping an ion implanted photoresist Oct. 22, 2013
8557757 Multipurpose acidic, organic solvent based microelectronic cleaning composition Oct. 15, 2013
8551682 Metal conservation with stripper solutions containing resorcinol Oct. 8, 2013
8551928 Multi-agent type cleaning kit for semiconductor substrates, cleaning method using the same and method of producing semiconductor element Oct. 8, 2013
8518865 Water-rich stripping and cleaning formulation and method for using same Aug. 27, 2013
8497233 Stripping compositions for cleaning ion implanted photoresist from semiconductor device wafers Jul. 30, 2013
8486880 Composition for removing a photoresist and method of manufacturing semiconductor device using the composition Jul. 16, 2013
8481472 Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition Jul. 9, 2013
8455419 Photoresist stripping agent composition Jun. 4, 2013
8455420 Spin-on formulation and method for stripping an ion implanted photoresist Jun. 4, 2013
8449681 Composition and method for removing photoresist and bottom anti-reflective coating for a semiconductor substrate May. 28, 2013
8444768 Compositions and methods for removing organic substances May. 21, 2013
8440389 Stripper solutions effective for back-end-of-line operations May. 14, 2013
8440599 Composition for stripping and cleaning and use thereof May. 14, 2013
8399391 Photoresist residue removal composition Mar. 19, 2013
8372792 Cleaner composition for removing lead-free soldering flux, and method for removing lead-free soldering flux Feb. 12, 2013
8361237 Wet clean compositions for CoWP and porous dielectrics Jan. 29, 2013
8354365 Cleaning liquid for lithography and method for forming wiring Jan. 15, 2013
8338350 Gluconic acid containing photoresist cleaning composition for multi-metal device processing Dec. 25, 2012
8314055 Materials and systems for advanced substrate cleaning Nov. 20, 2012
8309502 Compositions and methods for removing organic substances Nov. 13, 2012
8293021 Instrument for cleaning an aluminum workpiece Oct. 23, 2012
8288330 Composition and method for photoresist removal Oct. 16, 2012
8263539 Dynamic multi-purpose composition for the removal of photoresists and methods for its use Sep. 11, 2012
8252673 Spin-on formulation and method for stripping an ion implanted photoresist Aug. 28, 2012
8236475 Methods for removing a photoresist from a metal-comprising material Aug. 7, 2012
8236485 Photoresist removal Aug. 7, 2012
8227395 Process solutions containing surfactants Jul. 24, 2012
8211846 Materials for particle removal by single-phase and two-phase media Jul. 3, 2012
8206509 Cleaning liquid for lithography and method for forming wiring Jun. 26, 2012
8187389 Method of removing resist and apparatus therefor May. 29, 2012
8183195 Peroxide activated oxometalate based formulations for removal of etch residue May. 22, 2012
8173584 Composition and method for treating semiconductor substrate surface May. 8, 2012
8168577 Post plasma etch/ash residue and silicon-based anti-reflective coating remover compositions containing tetrafluoroborate ion May. 1, 2012
8163095 Composition for stripping and stripping method Apr. 24, 2012
8158568 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith Apr. 17, 2012
8158569 Cleaning solvent and cleaning method for metallic compound Apr. 17, 2012
8137472 Semiconductor process Mar. 20, 2012
8129322 Photosensitive-resin remover composition and method of fabricating semiconductor device using the same Mar. 6, 2012
8114825 Photoresist stripping solution Feb. 14, 2012

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