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Class Information
Number: 510/175
Name: Cleaning compositions for solid surfaces, auxiliary compositions therefor, or processes of preparing the compositions > Cleaning compositions or processes of preparing (e.g., sodium bisulfate component, etc.) > For cleaning a specific substrate or removing a specific contaminant (e.g., for smoker`s pipe, etc.) > For printed or integrated electrical circuit, or semiconductor device
Description: Compositions specialized for cleaning printed or integrated electrical circuits or semiconductor devices, such as computer chips.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7621281 |
Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same |
Nov. 24, 2009 |
| 7612028 |
Thinner composition, method of preparing the same and method of recovering the same |
Nov. 3, 2009 |
| 7608540 |
Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition |
Oct. 27, 2009 |
| 7605113 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
Oct. 20, 2009 |
| 7595289 |
Compositions based on fluorinated hydrocarbons and secondary butanol for defluxing electronic boards |
Sep. 29, 2009 |
| 7591270 |
Process solutions containing surfactants |
Sep. 22, 2009 |
| 7589052 |
Slurry composition and method for chemical mechanical polishing of copper integrated with tungsten based barrier metals |
Sep. 15, 2009 |
| 7579308 |
Compositions and processes for photoresist stripping and residue removal in wafer level packaging |
Aug. 25, 2009 |
| 7579309 |
Methods for characterizing defects on silicon surfaces and etching composition and treatment process therefor |
Aug. 25, 2009 |
| 7579307 |
Cleaner for semiconductor devices |
Aug. 25, 2009 |
| 7576046 |
Cleaning liquid for lithography and method of cleaning therewith |
Aug. 18, 2009 |
| 7572758 |
Cleaning liquid and cleaning method |
Aug. 11, 2009 |
| 7569336 |
Composition for removing photoresist and method of forming a pattern using the same |
Aug. 4, 2009 |
| 7562662 |
Cleaning solution and cleaning method of a semiconductor device |
Jul. 21, 2009 |
| 7563753 |
Cleaning solution for removing photoresist |
Jul. 21, 2009 |
| 7563754 |
Composition for removing photoresist residue and polymer residue |
Jul. 21, 2009 |
| 7557073 |
Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist |
Jul. 7, 2009 |
| 7553803 |
Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions |
Jun. 30, 2009 |
| 7547669 |
Remover compositions for dual damascene system |
Jun. 16, 2009 |
| 7543592 |
Compositions and processes for photoresist stripping and residue removal in wafer level packaging |
Jun. 9, 2009 |
| 7541322 |
Cleaning solution for substrate for semiconductor device and cleaning method |
Jun. 2, 2009 |
| 7534752 |
Post plasma ashing wafer cleaning formulation |
May. 19, 2009 |
| 7534753 |
pH buffered aqueous cleaning composition and method for removing photoresist residue |
May. 19, 2009 |
| 7531491 |
Aqueous cleaning solution for integrated circuit device and method of cleaning using the cleaning solution |
May. 12, 2009 |
| 7528098 |
Semiconductor process residue removal composition and process |
May. 5, 2009 |
| 7524801 |
Process for removing contaminant from a surface and composition useful therefor |
Apr. 28, 2009 |
| 7521406 |
Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof |
Apr. 21, 2009 |
| 7521405 |
Process solutions containing surfactants |
Apr. 21, 2009 |
| 7521407 |
Remover composition |
Apr. 21, 2009 |
| 7521408 |
Semiconductor cleaning solution |
Apr. 21, 2009 |
| 7498294 |
Cleaning composition, method for cleaning semiconductor substrate, and process for manufacturing semiconductor device |
Mar. 3, 2009 |
| 7498295 |
Alkaline chemistry for post-CMP cleaning comprising tetra alkyl ammonium hydroxide |
Mar. 3, 2009 |
| 7494962 |
Solvents containing cycloakyl alkyl ethers and process for production of the ethers |
Feb. 24, 2009 |
| 7491252 |
Tantalum barrier removal solution |
Feb. 17, 2009 |
| 7485612 |
Electronic parts cleaning solution |
Feb. 3, 2009 |
| 7485611 |
Supercritical fluid-based cleaning compositions and methods |
Feb. 3, 2009 |
| 7479474 |
Reducing oxide loss when using fluoride chemistries to remove post-etch residues in semiconductor processing |
Jan. 20, 2009 |
| 7470767 |
Preparation of ultrapure polymeric articles |
Dec. 30, 2008 |
| 7459398 |
Slurry for CMP, polishing method and method of manufacturing semiconductor device |
Dec. 2, 2008 |
| 7456140 |
Compositions for cleaning organic and plasma etched residues for semiconductor devices |
Nov. 25, 2008 |
| 7456141 |
Photo resist stripper composition |
Nov. 25, 2008 |
| 7449126 |
Heat transfer and refrigerant compositions comprising 3,3,4,4,5,5,6,6,6-nonafluoro-1-hexene and a hydrocarbon |
Nov. 11, 2008 |
| 7442675 |
Cleaning composition and method of cleaning semiconductor substrate |
Oct. 28, 2008 |
| 7435712 |
Alkaline chemistry for post-CMP cleaning |
Oct. 14, 2008 |
| 7435711 |
Cleaning agent for removing solder flux and method for cleaning solder flux |
Oct. 14, 2008 |
| 7435301 |
Cleaning solution of silicon germanium layer and cleaning method using the same |
Oct. 14, 2008 |
| 7432233 |
Composition and method for treating a semiconductor substrate |
Oct. 7, 2008 |
| 7427586 |
Degreasing agent |
Sep. 23, 2008 |
| 7422019 |
Composition and method for treating a semiconductor substrate |
Sep. 9, 2008 |
| 7419911 |
Compositions and methods for rapidly removing overfilled substrates |
Sep. 2, 2008 |
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