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Class Information
Number: 451/60
Name: Abrading > Abrading process > Abradant supplying
Description: Method for supplying abrasive materials to the abrading zone or zones.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7621799 |
Polishing method and polishing device |
Nov. 24, 2009 |
| 7591712 |
Method of producing silicon blocks and silicon wafers |
Sep. 22, 2009 |
| 7592266 |
Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device |
Sep. 22, 2009 |
| 7572172 |
Polishing machine, workpiece supporting table pad, polishing method and manufacturing method of semiconductor device |
Aug. 11, 2009 |
| 7559825 |
Method of polishing a semiconductor wafer |
Jul. 14, 2009 |
| 7540800 |
Rough polishing method of semiconductor wafer and polishing apparatus of semiconductor wafer |
Jun. 2, 2009 |
| 7541287 |
Method for machining a semiconductor wafer on both sides in a carrier, carrier, and a semiconductor wafer produced by the method |
Jun. 2, 2009 |
| 7510974 |
CMP process |
Mar. 31, 2009 |
| 7503830 |
Apparatus for reduction of defects in wet processed layers |
Mar. 17, 2009 |
| 7467988 |
Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
Dec. 23, 2008 |
| 7465216 |
Polishing apparatus |
Dec. 16, 2008 |
| 7465221 |
Polishing apparatus |
Dec. 16, 2008 |
| 7452261 |
Process for monitoring the setting of the coolant nozzle of a grinding machine |
Nov. 18, 2008 |
| 7438630 |
Polishing method, polishing device, glass substrate for magnetic recording medium, and magnetic recording medium |
Oct. 21, 2008 |
| 7419419 |
Slurry supply unit for CMP apparatus |
Sep. 2, 2008 |
| 7413497 |
Chemical mechanical polishing slurry pump monitoring system and method |
Aug. 19, 2008 |
| 7402094 |
Fixed-abrasive chemical-mechanical planarization of titanium nitride |
Jul. 22, 2008 |
| 7390240 |
Method of shaping and forming work materials |
Jun. 24, 2008 |
| 7384329 |
Coolant delivery system for grinding tools |
Jun. 10, 2008 |
| 7367871 |
Semiconductor processing methods of removing conductive material |
May. 6, 2008 |
| 7367867 |
Two-side working machine |
May. 6, 2008 |
| 7357694 |
Jet singulation |
Apr. 15, 2008 |
| 7357700 |
Riding floor polishing and grinding machine for treating concrete, terrazzo, stone and similar surfaces |
Apr. 15, 2008 |
| 7347767 |
Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces |
Mar. 25, 2008 |
| 7338352 |
Slurry delivery system, chemical mechanical polishing apparatus and method for using the same |
Mar. 4, 2008 |
| 7331844 |
Polishing method |
Feb. 19, 2008 |
| 7314402 |
Method and apparatus for controlling slurry distribution |
Jan. 1, 2008 |
| 7312160 |
Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device |
Dec. 25, 2007 |
| 7306508 |
Multi-wire saw |
Dec. 11, 2007 |
| 7294044 |
Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
Nov. 13, 2007 |
| 7291058 |
Method and apparatus for improving media flow |
Nov. 6, 2007 |
| 7291057 |
Apparatus for polishing a substrate |
Nov. 6, 2007 |
| 7288021 |
Chemical-mechanical polishing of metals in an oxidized form |
Oct. 30, 2007 |
| 7258598 |
Polishing solution supply system, method of supplying polishing solution, apparatus for and method of polishing semiconductor substrate and method of manufacturing semiconductor device |
Aug. 21, 2007 |
| 7255631 |
Orbital polishing apparatus and method |
Aug. 14, 2007 |
| 7249995 |
Apparatus and method for feeding slurry |
Jul. 31, 2007 |
| 7246427 |
Method to achieve both narrow track width and effective longitudinal stabilization in a CPP GMR read head |
Jul. 24, 2007 |
| RE39714 |
Hand-holdable gas/abrasion apparatus |
Jul. 3, 2007 |
| 7237321 |
Method for fabricating a CPP magnetic transducer using CMP-assisted lift-off and a CMP-resistant metal layer |
Jul. 3, 2007 |
| 7232363 |
Polishing solution retainer |
Jun. 19, 2007 |
| 7232360 |
Uninterrupted abrasive fluid supply |
Jun. 19, 2007 |
| 7223157 |
Chemical-mechanical polishing apparatus and method of conditioning polishing pad |
May. 29, 2007 |
| 7223344 |
Method for treating an exhausted glycol-based slurry |
May. 29, 2007 |
| 7210989 |
Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces |
May. 1, 2007 |
| 7201636 |
Chemical mechanical polishing a substrate having a filler layer and a stop layer |
Apr. 10, 2007 |
| 7195546 |
Polishing apparatus and method of polishing work piece |
Mar. 27, 2007 |
| 7189146 |
Method for reduction of defects in wet processed layers |
Mar. 13, 2007 |
| 7169235 |
Cleaning method and polishing apparatus employing such cleaning method |
Jan. 30, 2007 |
| 7166018 |
Apparatus and method for feeding slurry |
Jan. 23, 2007 |
| 7166017 |
Slurry for CMP, polishing method and method of manufacturing semiconductor device |
Jan. 23, 2007 |
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