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Class Information
Number: 451/550
Name: Abrading > Rigid tool > Rotary disk > Disk laps
Description: Rotary disk abrading tool specifically disclosed for use in polishing a work surface in the presence of a fluent abradant.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7549914 |
Polishing system |
Jun. 23, 2009 |
| 7544115 |
Chemical mechanical polishing assembly with altered polishing pad topographical components |
Jun. 9, 2009 |
| 7527546 |
Viscoelastic polisher and polishing method using the same |
May. 5, 2009 |
| 7524238 |
Method of processing antifriction bearing unit for wheel |
Apr. 28, 2009 |
| 7470170 |
Polishing pad and method for manufacture of semiconductor device using the same |
Dec. 30, 2008 |
| 7455571 |
Window polishing pad |
Nov. 25, 2008 |
| 7357698 |
Polishing pad and chemical mechanical polishing apparatus using the same |
Apr. 15, 2008 |
| 7354527 |
Chemical mechanical polishing pad and chemical mechanical polishing process |
Apr. 8, 2008 |
| 7331847 |
Vibration damping in chemical mechanical polishing system |
Feb. 19, 2008 |
| 7270595 |
Polishing pad with oscillating path groove network |
Sep. 18, 2007 |
| 7252582 |
Optimized grooving structure for a CMP polishing pad |
Aug. 7, 2007 |
| 7214124 |
Equipment and method for polishing both sides of a rectangular substrate |
May. 8, 2007 |
| 7192336 |
Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates |
Mar. 20, 2007 |
| 7182668 |
Methods for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates |
Feb. 27, 2007 |
| 7112125 |
Polishing cloth, polishing apparatus and method of manufacturing semiconductor devices |
Sep. 26, 2006 |
| 6986706 |
Polishing pad and method of producing the same |
Jan. 17, 2006 |
| 6974364 |
Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates |
Dec. 13, 2005 |
| 6964598 |
Polishing apparatus and method for forming an integrated circuit |
Nov. 15, 2005 |
| 6935929 |
Polishing machines including under-pads and methods for mechanical and/or chemical-mechanical polishing of microfeature workpieces |
Aug. 30, 2005 |
| 6860802 |
Polishing pads for chemical mechanical planarization |
Mar. 1, 2005 |
| 6824459 |
Gold jewelry lapping machine with shroud |
Nov. 30, 2004 |
| 6824455 |
Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus |
Nov. 30, 2004 |
| 6802761 |
Pattern-electroplated lapping plates for reduced loads during single slider lapping and process for their fabrication |
Oct. 12, 2004 |
| 6800019 |
Abrasive cloth and polishing method |
Oct. 5, 2004 |
| 6783436 |
Polishing pad with optimized grooves and method of forming same |
Aug. 31, 2004 |
| 6761746 |
Sanding disc |
Jul. 13, 2004 |
| 6752693 |
Afferent-based polishing media for chemical mechanical planarization |
Jun. 22, 2004 |
| 6739963 |
Disk for grinding concrete |
May. 25, 2004 |
| 6726534 |
Preequilibrium polishing method and system |
Apr. 27, 2004 |
| 6722950 |
Method and apparatus for electrodialytic chemical mechanical polishing and deposition |
Apr. 20, 2004 |
| 6712683 |
Backing plate for abrasive flap wheels |
Mar. 30, 2004 |
| 6705935 |
Abrasive molding and abrasive disc provided with same |
Mar. 16, 2004 |
| 6699115 |
Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus |
Mar. 2, 2004 |
| 6699104 |
Elimination of trapped air under polishing pads |
Mar. 2, 2004 |
| 6692343 |
Superabrasive wheel for mirror finishing |
Feb. 17, 2004 |
| 6685539 |
Processing tool, method of producing tool, processing method and processing apparatus |
Feb. 3, 2004 |
| 6663480 |
Polishing pad for semiconductor and optical parts, and method for manufacturing the same |
Dec. 16, 2003 |
| 6645061 |
Polishing pad having a grooved pattern for use in chemical mechanical polishing |
Nov. 11, 2003 |
| 6632129 |
Fixed abrasive article for use in modifying a semiconductor wafer |
Oct. 14, 2003 |
| 6632131 |
Combination rotary cutting and sanding blade |
Oct. 14, 2003 |
| 6620034 |
Way to remove Cu line damage after Cu CMP |
Sep. 16, 2003 |
| 6612916 |
Article suitable for chemical mechanical planarization processes |
Sep. 2, 2003 |
| 6604990 |
Polishing pad and method of producing the same |
Aug. 12, 2003 |
| 6592443 |
Method and apparatus for forming and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates |
Jul. 15, 2003 |
| 6592438 |
CMP platen with patterned surface |
Jul. 15, 2003 |
| 6551181 |
Abrasive wheel |
Apr. 22, 2003 |
| 6530830 |
Sanding disc |
Mar. 11, 2003 |
| 6520847 |
Polishing pad having a grooved pattern for use in chemical mechanical polishing |
Feb. 18, 2003 |
| RE37997 |
Polishing pad with controlled abrasion rate |
Feb. 18, 2003 |
| 6520834 |
Methods and apparatuses for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates |
Feb. 18, 2003 |
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