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Class Information
Number: 451/537
Name: Abrading > Flexible-member tool, per se > Laminate > Non-coextensive laminae
Description: Flexible-member tool which comprises a first layer including abrasive particles, at least one edge of which is offset (either laterally or longitudinally) relative to a corresponding edge of a second layer of the tool.










Patents under this class:

Patent Number Title Of Patent Date Issued
8602851 Controlled penetration subpad Dec. 10, 2013
8585470 Wearable backing for an abrasive flap disk Nov. 19, 2013
8439994 Method of fabricating a polishing pad with an end-point detection region for eddy current end-point detection May. 14, 2013
7828634 Interconnected-multi-element-lattice polishing pad Nov. 9, 2010
7744447 Abrasive disc Jun. 29, 2010
7736215 Polishing tool and polishing method and apparatus using same Jun. 15, 2010
7727056 Sanding element Jun. 1, 2010
7628829 Abrasive article and method of making and using the same Dec. 8, 2009
7364501 Sanding block and method of making same Apr. 29, 2008
7264641 Polishing pad comprising biodegradable polymer Sep. 4, 2007
6986706 Polishing pad and method of producing the same Jan. 17, 2006
6949018 Apparatus for finishing surfaces Sep. 27, 2005
6929539 Flexible abrasive product and method of making and using the same Aug. 16, 2005
6843711 Chemical mechanical polishing pad having a process-dependent groove configuration Jan. 18, 2005
6780096 Spiral wound abrasive belt and method Aug. 24, 2004
6719818 Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations Apr. 13, 2004
6699104 Elimination of trapped air under polishing pads Mar. 2, 2004
6676717 Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations Jan. 13, 2004
6666752 Wafer retainer and method for attaching/detaching the wafer retainer to/from polishing machine base plate Dec. 23, 2003
6620036 Stacked polishing pad having sealed edge Sep. 16, 2003
6616520 Polishing cloth and method for attaching/detaching the polishing cloth to/from polishing machine base plate Sep. 9, 2003
6595842 Abrasive pad and method of making same Jul. 22, 2003
6517426 Composite polishing pad for chemical-mechanical polishing Feb. 11, 2003
6506277 Abrasive sheet dispenser and method of use Jan. 14, 2003
6458023 Multi characterized chemical mechanical polishing pad and method for fabricating the same Oct. 1, 2002
6379238 Finishing and abrasive tool Apr. 30, 2002
6354930 Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates Mar. 12, 2002
6315645 Patterned polishing pad for use in chemical mechanical polishing of semiconductor wafers Nov. 13, 2001
6254456 Modifying contact areas of a polishing pad to promote uniform removal rates Jul. 3, 2001
6231427 Linear polisher and method for semiconductor wafer planarization May. 15, 2001
6220942 CMP platen with patterned surface Apr. 24, 2001
6068540 Polishing device and polishing cloth for semiconductor substrates May. 30, 2000
5752876 Flap disc abrasive tool May. 19, 1998
5554068 Abrasive flap brush and method and apparatus for making same Sep. 10, 1996
5489233 Polishing pads and methods for their use Feb. 6, 1996
5369916 Polishing element Dec. 6, 1994
5142829 Abrasive article Sep. 1, 1992
4962618 Lens lapping pad Oct. 16, 1990
4631220 Coated abrasive back-up pad with metal reinforcing plate Dec. 23, 1986
4255164 Fining sheet and method of making and using the same Mar. 10, 1981
4086068 Lens grinding and polishing lap cover and method of making same Apr. 25, 1978
3991527 Coated abrasive disc Nov. 16, 1976











 
 
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