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Class Information
Number: 451/537
Name: Abrading > Flexible-member tool, per se > Laminate > Non-coextensive laminae
Description: Flexible-member tool which comprises a first layer including abrasive particles, at least one edge of which is offset (either laterally or longitudinally) relative to a corresponding edge of a second layer of the tool.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 8602851 |
Controlled penetration subpad |
Dec. 10, 2013 |
| 8585470 |
Wearable backing for an abrasive flap disk |
Nov. 19, 2013 |
| 8439994 |
Method of fabricating a polishing pad with an end-point detection region for eddy current end-point detection |
May. 14, 2013 |
| 7828634 |
Interconnected-multi-element-lattice polishing pad |
Nov. 9, 2010 |
| 7744447 |
Abrasive disc |
Jun. 29, 2010 |
| 7736215 |
Polishing tool and polishing method and apparatus using same |
Jun. 15, 2010 |
| 7727056 |
Sanding element |
Jun. 1, 2010 |
| 7628829 |
Abrasive article and method of making and using the same |
Dec. 8, 2009 |
| 7364501 |
Sanding block and method of making same |
Apr. 29, 2008 |
| 7264641 |
Polishing pad comprising biodegradable polymer |
Sep. 4, 2007 |
| 6986706 |
Polishing pad and method of producing the same |
Jan. 17, 2006 |
| 6949018 |
Apparatus for finishing surfaces |
Sep. 27, 2005 |
| 6929539 |
Flexible abrasive product and method of making and using the same |
Aug. 16, 2005 |
| 6843711 |
Chemical mechanical polishing pad having a process-dependent groove configuration |
Jan. 18, 2005 |
| 6780096 |
Spiral wound abrasive belt and method |
Aug. 24, 2004 |
| 6719818 |
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations |
Apr. 13, 2004 |
| 6699104 |
Elimination of trapped air under polishing pads |
Mar. 2, 2004 |
| 6676717 |
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations |
Jan. 13, 2004 |
| 6666752 |
Wafer retainer and method for attaching/detaching the wafer retainer to/from polishing machine base plate |
Dec. 23, 2003 |
| 6620036 |
Stacked polishing pad having sealed edge |
Sep. 16, 2003 |
| 6616520 |
Polishing cloth and method for attaching/detaching the polishing cloth to/from polishing machine base plate |
Sep. 9, 2003 |
| 6595842 |
Abrasive pad and method of making same |
Jul. 22, 2003 |
| 6517426 |
Composite polishing pad for chemical-mechanical polishing |
Feb. 11, 2003 |
| 6506277 |
Abrasive sheet dispenser and method of use |
Jan. 14, 2003 |
| 6458023 |
Multi characterized chemical mechanical polishing pad and method for fabricating the same |
Oct. 1, 2002 |
| 6379238 |
Finishing and abrasive tool |
Apr. 30, 2002 |
| 6354930 |
Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates |
Mar. 12, 2002 |
| 6315645 |
Patterned polishing pad for use in chemical mechanical polishing of semiconductor wafers |
Nov. 13, 2001 |
| 6254456 |
Modifying contact areas of a polishing pad to promote uniform removal rates |
Jul. 3, 2001 |
| 6231427 |
Linear polisher and method for semiconductor wafer planarization |
May. 15, 2001 |
| 6220942 |
CMP platen with patterned surface |
Apr. 24, 2001 |
| 6068540 |
Polishing device and polishing cloth for semiconductor substrates |
May. 30, 2000 |
| 5752876 |
Flap disc abrasive tool |
May. 19, 1998 |
| 5554068 |
Abrasive flap brush and method and apparatus for making same |
Sep. 10, 1996 |
| 5489233 |
Polishing pads and methods for their use |
Feb. 6, 1996 |
| 5369916 |
Polishing element |
Dec. 6, 1994 |
| 5142829 |
Abrasive article |
Sep. 1, 1992 |
| 4962618 |
Lens lapping pad |
Oct. 16, 1990 |
| 4631220 |
Coated abrasive back-up pad with metal reinforcing plate |
Dec. 23, 1986 |
| 4255164 |
Fining sheet and method of making and using the same |
Mar. 10, 1981 |
| 4086068 |
Lens grinding and polishing lap cover and method of making same |
Apr. 25, 1978 |
| 3991527 |
Coated abrasive disc |
Nov. 16, 1976 |
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