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Class Information
Number: 451/534
Name: Abrading > Flexible-member tool, per se > Laminate > Discontinuous or differential coating impregnation or bond
Description: Flexible-member tool comprising plastic facing, saturating, or joining material which is present in isolated areas, or as differing compositions, or varying in concentration or in physical characteristics; or comprising plural layers whose juncture (either adhesive or cohesive) is of different character (e.g., strong bond next to weak bond) in different areas of the tool.

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8647179 Polishing pad, and method for manufacturing polishing pad Feb. 11, 2014
8636563 Base for a rotating grinding or cutting tool, and grinding or cutting tool produced therefrom Jan. 28, 2014
8602851 Controlled penetration subpad Dec. 10, 2013
8585470 Wearable backing for an abrasive flap disk Nov. 19, 2013
8475228 Polishing pad with partially recessed window Jul. 2, 2013
8444458 Plasma treated abrasive article and method of making same May. 21, 2013
8337277 Polishing pad and polishing apparatus Dec. 25, 2012
8257152 Silicate composite polishing pad Sep. 4, 2012
8251777 Polishing slurry for aluminum and aluminum alloys Aug. 28, 2012
8096859 Honing tool having enhanced wear resistance properties Jan. 17, 2012
8062096 Use of CMP for aluminum mirror and solar cell fabrication Nov. 22, 2011
7981173 Process of making a laminate and laminate formed thereby Jul. 19, 2011
7922783 Polishing pad and production method thereof Apr. 12, 2011
7815496 Polishing pad of a chemical mechanical polishing apparatus and method of manufacturing the same Oct. 19, 2010
7695347 Method and pad for polishing wafer Apr. 13, 2010
7645186 Chemical mechanical polishing pad manufacturing assembly Jan. 12, 2010
7544114 Abrasive articles with novel structures and methods for grinding Jun. 9, 2009
7520968 Conductive pad design modification for better wafer-pad contact Apr. 21, 2009
7427340 Conductive pad Sep. 23, 2008
7374476 Method and apparatus for forming a planarizing pad having a film and texture elements for planarization of microelectronic substrates May. 20, 2008
7364501 Sanding block and method of making same Apr. 29, 2008
7329171 Fixed abrasive article for use in modifying a semiconductor wafer Feb. 12, 2008
7275980 Abrasive articles with novel structures and methods for grinding Oct. 2, 2007
7163450 Abrasive pad Jan. 16, 2007
7137872 Scratch removal device and method Nov. 21, 2006
7077737 Flexible file and file dispenser system Jul. 18, 2006
6986705 Polishing pad and method of making same Jan. 17, 2006
6935931 Microporous polishing pads Aug. 30, 2005
6929539 Flexible abrasive product and method of making and using the same Aug. 16, 2005
6921566 Cushioned grip tape Jul. 26, 2005
6915796 Superabrasive wire saw and associated methods of manufacture Jul. 12, 2005
6913517 Microporous polishing pads Jul. 5, 2005
6905526 Fabrication of an ion exchange polish pad Jun. 14, 2005
6899598 Microporous polishing pads May. 31, 2005
6896593 Microporous polishing pads May. 24, 2005
6881483 Ceramic aggregate particles Apr. 19, 2005
6875097 Fixed abrasive CMP pad with built-in additives Apr. 5, 2005
6846232 Backing and abrasive product made with the backing and method of making and using the backing and abrasive product Jan. 25, 2005
6840843 Method for manufacturing a polishing pad having a compressed translucent region Jan. 11, 2005
6837781 Polishing pad Jan. 4, 2005
6790126 Agglomerate abrasive grain and a method of making the same Sep. 14, 2004
6786801 Method for gasket removal Sep. 7, 2004
6752708 Pad conditioner for semiconductor substrates Jun. 22, 2004
6716092 Apparatus for making a polishing pad with a partial adhesive coating Apr. 6, 2004
6632129 Fixed abrasive article for use in modifying a semiconductor wafer Oct. 14, 2003
6616520 Polishing cloth and method for attaching/detaching the polishing cloth to/from polishing machine base plate Sep. 9, 2003
6582289 Flap disc Jun. 24, 2003
6537140 Patterned abrasive tools Mar. 25, 2003
6517426 Composite polishing pad for chemical-mechanical polishing Feb. 11, 2003
6514132 Hardened skin care instrument Feb. 4, 2003

1 2 3

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