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Browse by Category: Main > Tools & Hardware
Class Information
Number: 451/529
Name: Abrading > Flexible-member tool, per se > Interrupted or composite work face (e.g., cracked, nonplanar, etc.) > Sectional
Description: Flexible-member tool wherein the abrasive work face or layer is made up of discrete portions or zones and including such face or layer made up of a plurality of abrasive sheets or components.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8597087 Universal abrasive sheet Dec. 3, 2013
8444457 Universal abrasive sheet May. 21, 2013
8425278 Structured abrasive article and method of using the same Apr. 23, 2013
8398461 Polishing method, polishing pad and polishing system Mar. 19, 2013
8360830 Grinding lamella and grinding wheel holding same Jan. 29, 2013
8303378 Polishing pad, polishing method and method of forming polishing pad Nov. 6, 2012
8192257 Method of manufacture of constant groove depth pads Jun. 5, 2012
8128464 Chemical mechanical polishing pad Mar. 6, 2012
8104464 Brazed diamond tools and methods for making the same Jan. 31, 2012
8075372 Polishing pad with microporous regions Dec. 13, 2011
8066555 Polishing pad Nov. 29, 2011
7901274 Rotary finishing wheel Mar. 8, 2011
7867066 Polishing pad Jan. 11, 2011
7846008 Method and apparatus for improved chemical mechanical planarization and CMP pad Dec. 7, 2010
7815496 Polishing pad of a chemical mechanical polishing apparatus and method of manufacturing the same Oct. 19, 2010
7790788 Method for producing chemical mechanical polishing pad Sep. 7, 2010
7771251 Three-dimensional network for chemical mechanical polishing Aug. 10, 2010
7744447 Abrasive disc Jun. 29, 2010
7716778 Buffing ball May. 18, 2010
7704125 Customized polishing pads for CMP and methods of fabrication and use thereof Apr. 27, 2010
7517277 Layered-filament lattice for chemical mechanical polishing Apr. 14, 2009
7410413 Structured abrasive article and method of making and using the same Aug. 12, 2008
7367872 Conditioner disk for use in chemical mechanical polishing May. 6, 2008
7354337 Pad conditioner, pad conditioning method, and polishing apparatus Apr. 8, 2008
7329171 Fixed abrasive article for use in modifying a semiconductor wafer Feb. 12, 2008
7302946 Industrial scarifier assembly Dec. 4, 2007
7297170 Method of using abrasive product Nov. 20, 2007
7261621 Pad conditioner for chemical mechanical polishing apparatus Aug. 28, 2007
7204745 Device in a circular, disk-shaped element intended for cleaning purposes Apr. 17, 2007
7186164 Processing pad assembly with zone control Mar. 6, 2007
7169029 Resilient structured sanding article Jan. 30, 2007
7140955 Polishing apparatus Nov. 28, 2006
7131900 Grinding wheel in combination with a grinding ring Nov. 7, 2006
7124753 Brazed diamond tools and methods for making the same Oct. 24, 2006
7121938 Polishing pad and method of fabricating semiconductor substrate using the pad Oct. 17, 2006
7118469 Abrasive pad, method and system for making an abrasive pad Oct. 10, 2006
7077737 Flexible file and file dispenser system Jul. 18, 2006
7066800 Conductive polishing article for electrochemical mechanical polishing Jun. 27, 2006
7066801 Method of manufacturing a fixed abrasive material Jun. 27, 2006
7018282 Customized polishing pad for selective process performance during chemical mechanical polishing Mar. 28, 2006
7004823 Multi-zone grinding and/or polishing sheet Feb. 28, 2006
6986705 Polishing pad and method of making same Jan. 17, 2006
6964603 Fiber flocked dental polishing tips Nov. 15, 2005
6964598 Polishing apparatus and method for forming an integrated circuit Nov. 15, 2005
6951506 Polish pad with non-uniform groove depth to improve wafer polish rate uniformity Oct. 4, 2005
6929534 Polisher and polishing method Aug. 16, 2005
6926583 Grinding wheel Aug. 9, 2005
6918824 Uniform fluid distribution and exhaust system for a chemical-mechanical planarization device Jul. 19, 2005
6896606 Drywall sanding implement May. 24, 2005
6855034 Polishing pad for semiconductor wafer and laminated body for polishing of semiconductor wafer equipped with the same as well as method for polishing of semiconductor wafer Feb. 15, 2005

1 2 3










 
 
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