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Class Information
Number: 451/397
Name: Abrading > Work holder > Work rotating
Description: Work holder in which the work is guided in rotation during grinding.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7419420 |
Substrate holding mechanism, substrate polishing apparatus and substrate polishing method |
Sep. 2, 2008 |
| 7347767 |
Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces |
Mar. 25, 2008 |
| 7303466 |
Carrier head of chemical mechanical polishing apparatus having barriers dividing pressure chamber into a plurality of pressure zones |
Dec. 4, 2007 |
| 7258594 |
Method and device for centerless cylindrical grinding |
Aug. 21, 2007 |
| 7220173 |
Wafer holder and wafer conveyor system equipped with the same |
May. 22, 2007 |
| 7189153 |
Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces |
Mar. 13, 2007 |
| 7175514 |
Polishing fixture assembly for a fiber optic cable connector polishing apparatus |
Feb. 13, 2007 |
| 7169022 |
Method and apparatus for creating a groove in a collector ring of an electrical device |
Jan. 30, 2007 |
| 7150674 |
Both-side grinding method and both-side grinding machine for thin disc work |
Dec. 19, 2006 |
| 7144308 |
Apparatus for chemical mechanical polishing |
Dec. 5, 2006 |
| 7140949 |
Tool and process for chrome plating a vehicle wheel surface |
Nov. 28, 2006 |
| 7121927 |
Retaining ring structure for edge control during chemical-mechanical polishing |
Oct. 17, 2006 |
| 7108591 |
Compliant wafer chuck |
Sep. 19, 2006 |
| 7103950 |
Pipe beveling tool and method |
Sep. 12, 2006 |
| 7101271 |
Polishing head and chemical mechanical polishing apparatus |
Sep. 5, 2006 |
| 7101261 |
Fluid-pressure regulated wafer polishing head |
Sep. 5, 2006 |
| 7056196 |
Wafer polisher |
Jun. 6, 2006 |
| 7040971 |
Carrier head with a flexible membrane |
May. 9, 2006 |
| 7029375 |
Retaining ring structure for edge control during chemical-mechanical polishing |
Apr. 18, 2006 |
| 6979256 |
Retaining ring with wear pad for use in chemical mechanical planarization |
Dec. 27, 2005 |
| 6962520 |
Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces |
Nov. 8, 2005 |
| 6938313 |
Portable plastic pipe cutter beveller system |
Sep. 6, 2005 |
| 6913521 |
Methods using active retainer rings for improving edge performance in CMP applications |
Jul. 5, 2005 |
| 6913522 |
Method and device for grinding central bearing positions on crankshafts |
Jul. 5, 2005 |
| 6913669 |
Retaining ring for holding semiconductor wafers in a chemical mechanical polishing apparatus |
Jul. 5, 2005 |
| 6899610 |
Retaining ring with wear pad for use in chemical mechanical planarization |
May. 31, 2005 |
| 6893330 |
Tool and process for chrome plating a vehicle wheel surface |
May. 17, 2005 |
| 6893327 |
Chemical mechanical polishing apparatus and method having a retaining ring with a contoured surface |
May. 17, 2005 |
| 6884154 |
Method for apparatus for polishing outer peripheral chamfered part of wafer |
Apr. 26, 2005 |
| 6869335 |
Retaining rings, planarizing apparatuses including retaining rings, and methods for planarizing micro-device workpieces |
Mar. 22, 2005 |
| 6857931 |
Method of detecting a substrate in a carrier head |
Feb. 22, 2005 |
| 6857946 |
Carrier head with a flexure |
Feb. 22, 2005 |
| 6857950 |
Polishing apparatus, semiconductor device manufacturing method using the polishing apparatus, and semiconductor device manufactured by the manufacturing method |
Feb. 22, 2005 |
| 6843707 |
Methods for aligning a surface of an active retainer ring with a wafer surface for chemical mechanical polishing |
Jan. 18, 2005 |
| 6827638 |
Polishing device and method |
Dec. 7, 2004 |
| 6824458 |
Retaining ring for holding semiconductor wafers in a chemical mechanical polishing apparatus |
Nov. 30, 2004 |
| 6824456 |
Configuration for polishing disk-shaped objects |
Nov. 30, 2004 |
| 6821192 |
Retaining ring for use in chemical mechanical polishing |
Nov. 23, 2004 |
| 6796887 |
Wear ring assembly |
Sep. 28, 2004 |
| 6776695 |
Platen design for improving edge performance in CMP applications |
Aug. 17, 2004 |
| 6776693 |
Method and apparatus for face-up substrate polishing |
Aug. 17, 2004 |
| 6746313 |
Polishing head assembly in an apparatus for chemical mechanical planarization |
Jun. 8, 2004 |
| 6739959 |
Assembly for the manufacture of medical, dental-medical, dental-technical and technical parts from ceramics |
May. 25, 2004 |
| 6733369 |
Method and apparatus for polishing or lapping an aspherical surface of a work piece |
May. 11, 2004 |
| 6726554 |
Guide ring removal device |
Apr. 27, 2004 |
| 6722965 |
Carrier head with flexible membranes to provide controllable pressure and loading area |
Apr. 20, 2004 |
| 6716093 |
Low friction gimbaled substrate holder for CMP apparatus |
Apr. 6, 2004 |
| 6709322 |
Apparatus for aligning a surface of an active retainer ring with a wafer surface for chemical mechanical polishing |
Mar. 23, 2004 |
| 6705932 |
Carrier head for chemical mechanical polishing |
Mar. 16, 2004 |
| 6669540 |
Chuck means for flat workpieces, in particular semi-conductor wafers |
Dec. 30, 2003 |
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