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Browse by Category: Main > Tools & Hardware
Class Information
Number: 451/289
Name: Abrading > Machine > Rotary tool > Rotary disk > Work rotating > Rotary work holder > Having vacuum or adhesive securing means
Description: Abrading machine wherein the work holder includes suction or adhesive holding means.


Patents under this class:
1 2 3 4 5 6 7

Patent Number Title Of Patent Date Issued
7601051 Grinding machine having grinder head and method of manufacturing semiconductor device by using the grinding machine Oct. 13, 2009
7559825 Method of polishing a semiconductor wafer Jul. 14, 2009
7500902 Thickness-measuring method during grinding process Mar. 10, 2009
7491118 Chemical mechanical polishing apparatus and methods using a polishing surface with non-uniform rigidity Feb. 17, 2009
7459397 Polishing method for semiconductor substrate, and polishing jig used therein Dec. 2, 2008
7445543 Polishing apparatus Nov. 4, 2008
7364497 Polish pad and chemical mechanical polishing apparatus comprising the same Apr. 29, 2008
7364496 Polishing head for polishing semiconductor wafers Apr. 29, 2008
7303467 Chemical mechanical polishing apparatus with rotating belt Dec. 4, 2007
7247083 Polishing apparatus Jul. 24, 2007
7223153 Apparatus and method for polishing semiconductor wafers using one or more polishing surfaces May. 29, 2007
7223158 Method for polishing a semiconductor wafer May. 29, 2007
7207871 Carrier head with multiple chambers Apr. 24, 2007
7201640 Method of sucking water and water sucking device Apr. 10, 2007
7189141 Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus Mar. 13, 2007
7175504 Vacuum suction holding apparatus and holding method, polishing apparatus using this holding apparatus, and device manufacturing method using this polishing apparatus Feb. 13, 2007
7175509 Grinder and method of and apparatus for non-contact conditioning of tool Feb. 13, 2007
7166013 Polishing apparatus and method for producing semiconductors using the apparatus Jan. 23, 2007
RE39471 Apparatus for and method for polishing workpiece Jan. 16, 2007
7140956 Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece Nov. 28, 2006
7137874 Semiconductor wafer, polishing apparatus and method Nov. 21, 2006
7121934 Carrier head for chemical mechanical polishing apparatus Oct. 17, 2006
7112889 Semiconductor device having an alignment mark formed by the same material with a metal post Sep. 26, 2006
7108591 Compliant wafer chuck Sep. 19, 2006
7090570 Chemical mechanical polishing apparatus and methods using a polishing surface with non-uniform rigidity Aug. 15, 2006
7081045 Apparatus for polishing a semiconductor wafer Jul. 25, 2006
7070478 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces Jul. 4, 2006
7070490 Vacuum suction membrane for holding silicon wafer Jul. 4, 2006
7063600 Polishing apparatus Jun. 20, 2006
7052372 Chemical-mechanical polisher hardware design May. 30, 2006
7048619 Rubbing machine with realigning functions of rubbing cloth for use in LCD manufacturing process and rubbing method using the same May. 23, 2006
7044476 Compact pinlifter assembly integrated in wafer chuck May. 16, 2006
7040965 Methods for removing doped silicon material from microfeature workpieces May. 9, 2006
7029383 Polishing head of chemical mechanical polishing apparatus Apr. 18, 2006
7025664 Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece Apr. 11, 2006
7018268 Protection of work piece during surface processing Mar. 28, 2006
7014541 Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece Mar. 21, 2006
7004817 Carrier assemblies, planarizing apparatuses including carrier assemblies, and methods for planarizing micro-device workpieces Feb. 28, 2006
7004824 Method and apparatus for detecting and dispersing agglomerates in CMP slurry Feb. 28, 2006
7001256 Carrier head with a non-stick membrane Feb. 21, 2006
6997791 CMP polishing heads and methods of using the same Feb. 14, 2006
6991520 Abrasive machine and method of abrading work piece Jan. 31, 2006
6988932 Apparatus of sealing wafer backside for full-face processing Jan. 24, 2006
6979250 Carrier head with flexible membrane to provide controllable pressure and loading area Dec. 27, 2005
6966822 System and method for CMP having multi-pressure zone loading for improved edge and annular zone material removal control Nov. 22, 2005
6945861 Polishing head of chemical mechanical polishing apparatus and polishing method using the same Sep. 20, 2005
6934595 Method and system for reducing semiconductor wafer breakage Aug. 23, 2005
6923714 Carrier head with a non-stick membrane Aug. 2, 2005
6923709 Chemical mechanical polishing apparatus having a measuring device for measuring a guide ring Aug. 2, 2005
6921324 Pad backer Jul. 26, 2005

1 2 3 4 5 6 7


 
 
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