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Class Information
Number: 451/287
Name: Abrading > Machine > Rotary tool > Rotary disk > Work rotating > Rotary work holder > Planar surface abrading
Description: Abrading machine wherein the work holder rotates the work about an axis either parallel to or coincident with the axis of the abrading tool.










Sub-classes under this class:

Class Number Class Name Patents
451/288 Having pressure plate 1,025


Patents under this class:
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Patent Number Title Of Patent Date Issued
5910043 Polishing pad for chemical-mechanical planarization of a semiconductor wafer Jun. 8, 1999
5908347 Polishing system for polishing wafer Jun. 1, 1999
5908530 Apparatus for chemical mechanical polishing Jun. 1, 1999
5906532 Method for polishing semiconductor substrate and apparatus for the same May. 25, 1999
5904608 Polishing apparatus having interlock function May. 18, 1999
5904609 Polishing apparatus and polishing method May. 18, 1999
5902173 Polishing machine with efficient polishing and dressing May. 11, 1999
5899792 Optical polishing apparatus and methods May. 4, 1999
5899799 Method and system to increase delivery of slurry to the surface of large substrates during polishing operations May. 4, 1999
5899800 Chemical mechanical polishing apparatus with orbital polishing May. 4, 1999
5897424 Renewable polishing lap Apr. 27, 1999
5897425 Vertical polishing tool and method Apr. 27, 1999
5895270 Chemical mechanical polishing method and apparatus Apr. 20, 1999
5893796 Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus Apr. 13, 1999
5888120 Method and apparatus for chemical mechanical polishing Mar. 30, 1999
5888126 Polishing apparatus including turntable with polishing surface of different heights Mar. 30, 1999
5888127 Apparatus to hold and remove an integrated circuit chip on a cutting chuck Mar. 30, 1999
5885135 CMP wafer carrier for preferential polishing of a wafer Mar. 23, 1999
5885138 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device Mar. 23, 1999
5882244 Polishing apparatus Mar. 16, 1999
5882248 Apparatus for separating wafers from polishing pads used in chemical-mechanical planarization of semiconductor wafers Mar. 16, 1999
5882251 Chemical mechanical polishing pad slurry distribution grooves Mar. 16, 1999
5879220 Apparatus for mirror-polishing thin plate Mar. 9, 1999
5879225 Polishing machine Mar. 9, 1999
5879226 Method for conditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers Mar. 9, 1999
5873769 Temperature compensated chemical mechanical polishing to achieve uniform removal rates Feb. 23, 1999
5871393 Mounting member for polishing Feb. 16, 1999
5868610 Mehtod and aparatus for polishing semiconductor substrate Feb. 9, 1999
5860847 Polishing apparatus Jan. 19, 1999
5860848 Polishing silicon wafers with improved polishing slurries Jan. 19, 1999
5860851 Polishing apparatus and polishing method using the same Jan. 19, 1999
5860853 Apparatus for polishing wafers Jan. 19, 1999
5857893 Methods and apparatus for measuring and dispensing processing solutions to a CMP machine Jan. 12, 1999
5857898 Method of and apparatus for dressing polishing cloth Jan. 12, 1999
5853317 Polishing pad and polishing apparatus having the same Dec. 29, 1998
5842909 System for real-time control of semiconductor wafer polishing including heater Dec. 1, 1998
5839947 Polishing apparatus Nov. 24, 1998
5836807 Method and structure for polishing a wafer during manufacture of integrated circuits Nov. 17, 1998
5830806 Wafer backing member for mechanical and chemical-mechanical planarization of substrates Nov. 3, 1998
5823855 Polishing pad and a method for making a polishing pad with covalently bonded particles Oct. 20, 1998
5820448 Carrier head with a layer of conformable material for a chemical mechanical polishing system Oct. 13, 1998
5820449 Vertically stacked planarization machine Oct. 13, 1998
5810648 Device for texturing a disc substrate Sep. 22, 1998
5810964 Chemical mechanical polishing device for a semiconductor wafer Sep. 22, 1998
5803799 Wafer polishing head Sep. 8, 1998
5800248 Control of chemical-mechanical polishing rate across a substrate surface Sep. 1, 1998
5800251 Apparatus and method of lapping works Sep. 1, 1998
5800254 Automatic apparatus for grinding and polishing samples Sep. 1, 1998
5800895 Beryllium memory disk substrate for computer hard disk drive and process for making Sep. 1, 1998
5801066 Method and apparatus for measuring a change in the thickness of polishing pads used in chemical-mechanical planarization of semiconductor wafers Sep. 1, 1998

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