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Class Information
Number: 451/287
Name: Abrading > Machine > Rotary tool > Rotary disk > Work rotating > Rotary work holder > Planar surface abrading
Description: Abrading machine wherein the work holder rotates the work about an axis either parallel to or coincident with the axis of the abrading tool.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5893796 |
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
Apr. 13, 1999 |
| 5888120 |
Method and apparatus for chemical mechanical polishing |
Mar. 30, 1999 |
| 5888126 |
Polishing apparatus including turntable with polishing surface of different heights |
Mar. 30, 1999 |
| 5888127 |
Apparatus to hold and remove an integrated circuit chip on a cutting chuck |
Mar. 30, 1999 |
| 5885135 |
CMP wafer carrier for preferential polishing of a wafer |
Mar. 23, 1999 |
| 5885138 |
Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device |
Mar. 23, 1999 |
| 5882244 |
Polishing apparatus |
Mar. 16, 1999 |
| 5882248 |
Apparatus for separating wafers from polishing pads used in chemical-mechanical planarization of semiconductor wafers |
Mar. 16, 1999 |
| 5882251 |
Chemical mechanical polishing pad slurry distribution grooves |
Mar. 16, 1999 |
| 5879220 |
Apparatus for mirror-polishing thin plate |
Mar. 9, 1999 |
| 5879225 |
Polishing machine |
Mar. 9, 1999 |
| 5879226 |
Method for conditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers |
Mar. 9, 1999 |
| 5873769 |
Temperature compensated chemical mechanical polishing to achieve uniform removal rates |
Feb. 23, 1999 |
| 5871393 |
Mounting member for polishing |
Feb. 16, 1999 |
| 5868610 |
Mehtod and aparatus for polishing semiconductor substrate |
Feb. 9, 1999 |
| 5860847 |
Polishing apparatus |
Jan. 19, 1999 |
| 5860848 |
Polishing silicon wafers with improved polishing slurries |
Jan. 19, 1999 |
| 5860851 |
Polishing apparatus and polishing method using the same |
Jan. 19, 1999 |
| 5860853 |
Apparatus for polishing wafers |
Jan. 19, 1999 |
| 5857893 |
Methods and apparatus for measuring and dispensing processing solutions to a CMP machine |
Jan. 12, 1999 |
| 5857898 |
Method of and apparatus for dressing polishing cloth |
Jan. 12, 1999 |
| 5853317 |
Polishing pad and polishing apparatus having the same |
Dec. 29, 1998 |
| 5842909 |
System for real-time control of semiconductor wafer polishing including heater |
Dec. 1, 1998 |
| 5839947 |
Polishing apparatus |
Nov. 24, 1998 |
| 5836807 |
Method and structure for polishing a wafer during manufacture of integrated circuits |
Nov. 17, 1998 |
| 5830806 |
Wafer backing member for mechanical and chemical-mechanical planarization of substrates |
Nov. 3, 1998 |
| 5823855 |
Polishing pad and a method for making a polishing pad with covalently bonded particles |
Oct. 20, 1998 |
| 5820448 |
Carrier head with a layer of conformable material for a chemical mechanical polishing system |
Oct. 13, 1998 |
| 5820449 |
Vertically stacked planarization machine |
Oct. 13, 1998 |
| 5810648 |
Device for texturing a disc substrate |
Sep. 22, 1998 |
| 5810964 |
Chemical mechanical polishing device for a semiconductor wafer |
Sep. 22, 1998 |
| 5803799 |
Wafer polishing head |
Sep. 8, 1998 |
| 5800248 |
Control of chemical-mechanical polishing rate across a substrate surface |
Sep. 1, 1998 |
| 5800251 |
Apparatus and method of lapping works |
Sep. 1, 1998 |
| 5800254 |
Automatic apparatus for grinding and polishing samples |
Sep. 1, 1998 |
| 5800895 |
Beryllium memory disk substrate for computer hard disk drive and process for making |
Sep. 1, 1998 |
| 5801066 |
Method and apparatus for measuring a change in the thickness of polishing pads used in chemical-mechanical planarization of semiconductor wafers |
Sep. 1, 1998 |
| 5797789 |
Polishing system |
Aug. 25, 1998 |
| 5795215 |
Method and apparatus for using a retaining ring to control the edge effect |
Aug. 18, 1998 |
| 5791975 |
Backing pad |
Aug. 11, 1998 |
| 5792709 |
High-speed planarizing apparatus and method for chemical mechanical planarization of semiconductor wafers |
Aug. 11, 1998 |
| 5785584 |
Planarizing apparatus with deflectable polishing pad |
Jul. 28, 1998 |
| 5785585 |
Polish pad conditioner with radial compensation |
Jul. 28, 1998 |
| 5782675 |
Apparatus and method for refurbishing fixed-abrasive polishing pads used in chemical-mechanical planarization of semiconductor wafers |
Jul. 21, 1998 |
| 5779520 |
Method and apparatus of polishing wafer |
Jul. 14, 1998 |
| 5779521 |
Method and apparatus for chemical/mechanical polishing |
Jul. 14, 1998 |
| 5779522 |
Directional spray pad scrubber |
Jul. 14, 1998 |
| 5775980 |
Polishing method and polishing apparatus |
Jul. 7, 1998 |
| 5775983 |
Apparatus and method for conditioning a chemical mechanical polishing pad |
Jul. 7, 1998 |
| 5773364 |
Method for using ammonium salt slurries for chemical mechanical polishing (CMP) |
Jun. 30, 1998 |
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