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Class Information
Number: 451/287
Name: Abrading > Machine > Rotary tool > Rotary disk > Work rotating > Rotary work holder > Planar surface abrading
Description: Abrading machine wherein the work holder rotates the work about an axis either parallel to or coincident with the axis of the abrading tool.










Sub-classes under this class:

Class Number Class Name Patents
451/288 Having pressure plate 1,025


Patents under this class:
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Patent Number Title Of Patent Date Issued
6024630 Fluid-pressure regulated wafer polishing head Feb. 15, 2000
6019868 Polishing apparatus Feb. 1, 2000
6015337 Polishing apparatus Jan. 18, 2000
6012964 Carrier and CMP apparatus Jan. 11, 2000
6012966 Precision polishing apparatus with detecting means Jan. 11, 2000
6010395 Chemical-mechanical polishing apparatus Jan. 4, 2000
6007411 Wafer carrier for chemical mechanical polishing Dec. 28, 1999
6004187 Method and apparatus for measuring film thickness and film thickness distribution during polishing Dec. 21, 1999
6004196 Polishing pad refurbisher for in situ, real-time conditioning and cleaning of a polishing pad used in chemical-mechanical polishing of microelectronic substrates Dec. 21, 1999
6000996 Grinding process monitoring system and grinding process monitoring method Dec. 14, 1999
6001001 Apparatus and method for chemical mechanical polishing of a wafer Dec. 14, 1999
5997384 Method and apparatus for controlling planarizing characteristics in mechanical and chemical-mechanical planarization of microelectronic substrates Dec. 7, 1999
5997392 Slurry injection technique for chemical-mechanical polishing Dec. 7, 1999
5989104 Workpiece carrier with monopiece pressure plate and low gimbal point Nov. 23, 1999
5989107 Method for polishing workpieces and apparatus therefor Nov. 23, 1999
5985094 Semiconductor wafer carrier Nov. 16, 1999
5980363 Under-pad for chemical-mechanical planarization of semiconductor wafers Nov. 9, 1999
5975991 Method and apparatus for processing workpieces with multiple polishing elements Nov. 2, 1999
5975994 Method and apparatus for selectively conditioning a polished pad used in planarizng substrates Nov. 2, 1999
5975997 Method of double-side lapping a wafer and an apparatus therefor Nov. 2, 1999
5961375 Shimming substrate holder assemblies to produce more uniformly polished substrate surfaces Oct. 5, 1999
5957749 Apparatus for optical inspection of wafers during polishing Sep. 28, 1999
5957750 Method and apparatus for controlling a temperature of a polishing pad used in planarizing substrates Sep. 28, 1999
5957764 Modular wafer polishing apparatus and method Sep. 28, 1999
5954566 Method and apparatus for reconditioning digital recording discs Sep. 21, 1999
5951373 Circumferentially oscillating carousel apparatus for sequentially processing substrates for polishing and cleaning Sep. 14, 1999
5951382 Chemical mechanical polishing carrier fixture and system Sep. 14, 1999
5948203 Optical dielectric thickness monitor for chemical-mechanical polishing process monitoring Sep. 7, 1999
5948205 Polishing apparatus and method for planarizing layer on a semiconductor wafer Sep. 7, 1999
5944582 Chemical mechanical polishing with a small polishing pad Aug. 31, 1999
5944583 Composite polish pad for CMP Aug. 31, 1999
5944591 Sure-seal rolling pin assembly Aug. 31, 1999
5941758 Method and apparatus for chemical-mechanical polishing Aug. 24, 1999
5938506 Methods and apparatus for conditioning grinding stones Aug. 17, 1999
5938507 Linear conditioner apparatus for a chemical mechanical polishing system Aug. 17, 1999
5938510 Disk cleaner device Aug. 17, 1999
5934980 Method of chemical mechanical polishing Aug. 10, 1999
5934984 Polishing apparatus Aug. 10, 1999
5931719 Method and apparatus for using pressure differentials through a polishing pad to improve performance in chemical mechanical polishing Aug. 3, 1999
5931722 Chemical mechanical polishing apparatus Aug. 3, 1999
5931723 Polishing apparatus Aug. 3, 1999
5928062 Vertical polishing device and method Jul. 27, 1999
5921849 Method and apparatus for distributing a polishing agent onto a polishing element Jul. 13, 1999
5919082 Fixed abrasive polishing pad Jul. 6, 1999
5916010 CMP pad maintenance apparatus and method Jun. 29, 1999
5916011 Process for polishing a semiconductor device substrate Jun. 29, 1999
5916012 Control of chemical-mechanical polishing rate across a substrate surface for a linear polisher Jun. 29, 1999
5913713 CMP polishing pad backside modifications for advantageous polishing results Jun. 22, 1999
5913719 Workpiece holding mechanism Jun. 22, 1999
5911619 Apparatus for electrochemical mechanical planarization Jun. 15, 1999

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