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Class Information
Number: 451/287
Name: Abrading > Machine > Rotary tool > Rotary disk > Work rotating > Rotary work holder > Planar surface abrading
Description: Abrading machine wherein the work holder rotates the work about an axis either parallel to or coincident with the axis of the abrading tool.

Sub-classes under this class:

Class Number Class Name Patents
451/288 Having pressure plate 1,025

Patents under this class:

Patent Number Title Of Patent Date Issued
8672730 Method and apparatus for polishing and grinding a radius surface on the axial end of a cylinder Mar. 18, 2014
8668553 Method of manufacturing semiconductor device Mar. 11, 2014
8662961 Polishing pad seasoning method, seasoning plate, and semiconductor polishing device Mar. 4, 2014
8628384 Polishing pad for eddy current end-point detection Jan. 14, 2014
8591286 Apparatus and method for temperature control during polishing Nov. 26, 2013
8562389 Thin polishing pad with window and molding process Oct. 22, 2013
8556684 Retaining ring for chemical mechanical polishing Oct. 15, 2013
8550878 Method of manufacture of constant groove depth pads Oct. 8, 2013
8545290 Wafer polishing apparatus and method Oct. 1, 2013
8535115 Gathering spectra from multiple optical heads Sep. 17, 2013
8517803 Retaining ring for chemical mechanical polishing Aug. 27, 2013
8496512 Polishing pad, polishing method and method of forming polishing pad Jul. 30, 2013
8465342 Method of making and apparatus having windowless polishing pad and protected fiber Jun. 18, 2013
8430717 Dynamic action abrasive lapping workholder Apr. 30, 2013
8414361 Silicon carbide, sapphire, germanium, silicon and pattern wafer polishing templates holder Apr. 9, 2013
8398878 Methods for producing and processing semiconductor wafers Mar. 19, 2013
8398461 Polishing method, polishing pad and polishing system Mar. 19, 2013
8398458 Modular base-plate semiconductor polisher architecture Mar. 19, 2013
8366516 Partial-area polishing device for optical disc Feb. 5, 2013
8366514 Semiconductor substrate planarization apparatus and planarization method Feb. 5, 2013
8360825 Slurry supply system Jan. 29, 2013
8360817 Polishing apparatus and polishing method Jan. 29, 2013
8357029 Polishing apparatus Jan. 22, 2013
8337280 High speed platen abrading wire-driven rotary workholder Dec. 25, 2012
8337278 Wafer edge characterization by successive radius measurements Dec. 25, 2012
8313359 Chemical mechanical polishing apparatus Nov. 20, 2012
8308529 High throughput chemical mechanical polishing system Nov. 13, 2012
8287333 Single type substrate treating apparatus and method Oct. 16, 2012
8277286 Slurry dispenser for chemical mechanical polishing (CMP) apparatus and method Oct. 2, 2012
8192248 Semiconductor wafer polishing apparatus and method of polishing Jun. 5, 2012
8172647 Polish pad conditioning in mechanical polishing systems May. 8, 2012
8152595 System and method for optical endpoint detection during CMP by using an across-substrate signal Apr. 10, 2012
8152594 Polishing apparatus Apr. 10, 2012
8145342 Methods and systems for adjusting operation of a wafer grinder using feedback from warp data Mar. 27, 2012
8128461 Chemical mechanical polishing with multi-zone slurry delivery Mar. 6, 2012
8118646 Carrier for double-side polishing apparatus, double-side polishing apparatus using the same, and double-side polishing method Feb. 21, 2012
8118640 Wafer transferring apparatus, polishing apparatus, and wafer receiving method Feb. 21, 2012
8083571 Polishing apparatus Dec. 27, 2011
8083570 Chemical mechanical polishing pad having sealed window Dec. 27, 2011
8052504 Method, apparatus and system for use in processing wafers Nov. 8, 2011
8033895 Retaining ring with shaped profile Oct. 11, 2011
7976362 Substrate polishing apparatus and method Jul. 12, 2011
7967665 Substrate holding apparatus, polishing apparatus, and polishing method Jun. 28, 2011
7967661 Systems and pads for planarizing microelectronic workpieces and associated methods of use and manufacture Jun. 28, 2011
7955160 Glass mold polishing method and structure Jun. 7, 2011
7922562 Systems and methods for reducing electrostatic charge of semiconductor wafers Apr. 12, 2011
7910157 Substrate processing method and program Mar. 22, 2011
7905764 Polishing head using zone control Mar. 15, 2011
7883393 System and method for removing particles from a polishing pad Feb. 8, 2011
7867059 Semiconductor wafer, apparatus and process for producing the semiconductor wafer Jan. 11, 2011

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