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Class Information
Number: 451/287
Name: Abrading > Machine > Rotary tool > Rotary disk > Work rotating > Rotary work holder > Planar surface abrading
Description: Abrading machine wherein the work holder rotates the work about an axis either parallel to or coincident with the axis of the abrading tool.


Sub-classes under this class:

Class Number Class Name Patents
451/288 Having pressure plate 916


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20

Patent Number Title Of Patent Date Issued
7422514 Dental crown polishing apparatus Sep. 9, 2008
7416474 Planarization apparatus Aug. 26, 2008
7410411 Method of determining the number of active diamonds on a conditioning disk Aug. 12, 2008
7381116 Polishing media stabilizer Jun. 3, 2008
7367871 Semiconductor processing methods of removing conductive material May. 6, 2008
7367867 Two-side working machine May. 6, 2008
7364493 Lap grinding and polishing machine Apr. 29, 2008
7364497 Polish pad and chemical mechanical polishing apparatus comprising the same Apr. 29, 2008
7354332 Technique for process-qualifying a semiconductor manufacturing tool using metrology data Apr. 8, 2008
7354334 Reducing polishing pad deformation Apr. 8, 2008
7341502 Methods and systems for planarizing workpieces, e.g., microelectronic workpieces Mar. 11, 2008
7335088 CMP system with temperature-controlled polishing head Feb. 26, 2008
7316600 Metal working method to reduce thermal damage Jan. 8, 2008
7314401 Methods and systems for conditioning planarizing pads used in planarizing substrates Jan. 1, 2008
7311590 Polishing pad with grooves to retain slurry on the pad texture Dec. 25, 2007
7303462 Edge bead removal by an electro polishing process Dec. 4, 2007
7297047 Bubble suppressing flow controller with ultrasonic flow meter Nov. 20, 2007
7278905 Apparatus and method for conditioning polishing surface, and polishing apparatus and method of operation Oct. 9, 2007
7261621 Pad conditioner for chemical mechanical polishing apparatus Aug. 28, 2007
7258598 Polishing solution supply system, method of supplying polishing solution, apparatus for and method of polishing semiconductor substrate and method of manufacturing semiconductor device Aug. 21, 2007
7258595 Polishing apparatus Aug. 21, 2007
7255629 Polishing assembly with a window Aug. 14, 2007
7244168 Methods for reducing delamination during chemical mechanical polishing Jul. 17, 2007
7241202 Substrate polishing apparatus Jul. 10, 2007
7238084 Chemical mechanical polishing apparatus and chemical mechanical polishing method using the same Jul. 3, 2007
7238087 Planarizing device and a planarization method for semiconductor substrates Jul. 3, 2007
7238092 Low-force electrochemical mechanical processing method and apparatus Jul. 3, 2007
7238093 Polishing cloth for chemical mechanical polishing, and chemical mechanical polishing apparatus using said cloth Jul. 3, 2007
7229337 Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting Jun. 12, 2007
7226345 CMP pad with designed surface features Jun. 5, 2007
7223157 Chemical-mechanical polishing apparatus and method of conditioning polishing pad May. 29, 2007
7223153 Apparatus and method for polishing semiconductor wafers using one or more polishing surfaces May. 29, 2007
7220166 Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate May. 22, 2007
7214122 Substrate polishing apparatus May. 8, 2007
7210989 Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces May. 1, 2007
7201635 Methods and systems for conditioning planarizing pads used in planarizing substrates Apr. 10, 2007
7201640 Method of sucking water and water sucking device Apr. 10, 2007
7198560 Wafer planarization composition and method of use Apr. 3, 2007
7196011 Apparatus and method for treating substrates Mar. 27, 2007
7189139 Polishing apparatus Mar. 13, 2007
7186164 Processing pad assembly with zone control Mar. 6, 2007
7186171 Composite retaining ring Mar. 6, 2007
7182677 Chemical mechanical polishing pad for controlling polishing slurry distribution Feb. 27, 2007
7175508 Polishing apparatus, method of manufacturing semiconductor device using the same, and semiconductor device manufactured by this method Feb. 13, 2007
7175510 Method and apparatus for conditioning a polishing pad Feb. 13, 2007
7176676 Apparatuses and methods for monitoring rotation of a conductive microfeature workpiece Feb. 13, 2007
7169235 Cleaning method and polishing apparatus employing such cleaning method Jan. 30, 2007
7169015 Apparatus for optical inspection of wafers during processing Jan. 30, 2007
7166014 Chemical mechanical planarization process control utilizing in-situ conditioning process Jan. 23, 2007
7166015 Apparatus and method for controlling fluid material composition on a polishing pad Jan. 23, 2007

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