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Class Information
Number: 451/285
Name: Abrading > Machine > Rotary tool > Rotary disk > Work rotating > Rotary work holder
Description: Abrading machine including a member adapted to grip and turn with the work about an axis more than 360°.


Sub-classes under this class:

Class Number Class Name Patents
451/286 By means loosely confining work 271
451/290 Disk or wheel abrader 166
451/289 Having vacuum or adhesive securing means 328
451/287 Planar surface abrading 996
451/291 Planetary 54
451/292 Turret 29


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18

Patent Number Title Of Patent Date Issued
7601051 Grinding machine having grinder head and method of manufacturing semiconductor device by using the grinding machine Oct. 13, 2009
7591711 Apparatus and method for polishing semiconductor wafers using one or more polishing surfaces Sep. 22, 2009
7591714 Wafer grinding and tape attaching apparatus and method Sep. 22, 2009
7589023 Method of manufacturing semiconductor wafer Sep. 15, 2009
7585203 Bowling ball surface treatment machine and bowling ball surface treatment method Sep. 8, 2009
7572173 Polishing apparatus and pad replacing method thereof Aug. 11, 2009
7559825 Method of polishing a semiconductor wafer Jul. 14, 2009
7547242 Substrate polishing apparatus Jun. 16, 2009
7534166 Chemical mechanical polishing apparatus May. 19, 2009
7527544 System of using offset gage for CMP polishing pad alignment and adjustment May. 5, 2009
7524237 Diamond tool blade with circular cutting edge Apr. 28, 2009
7520798 Polishing pad with grooves to reduce slurry consumption Apr. 21, 2009
7520955 Carrier head with a multilayer retaining ring for chemical mechanical polishing Apr. 21, 2009
7520796 Polishing pad with grooves to reduce slurry consumption Apr. 21, 2009
7513818 Polishing endpoint detection system and method using friction sensor Apr. 7, 2009
7510460 Substrate polishing apparatus Mar. 31, 2009
7503837 Composite retaining ring Mar. 17, 2009
7488240 Polishing device Feb. 10, 2009
7481695 Polishing apparatus and methods having high processing workload for controlling polishing pressure applied by polishing head Jan. 27, 2009
7465221 Polishing apparatus Dec. 16, 2008
7459397 Polishing method for semiconductor substrate, and polishing jig used therein Dec. 2, 2008
7438795 Electrochemical-mechanical polishing system Oct. 21, 2008
7438632 Method and apparatus for cleaning a web-based chemical mechanical planarization system Oct. 21, 2008
7435165 Transparent microporous materials for CMP Oct. 14, 2008
7429207 System for endpoint detection with polishing pad Sep. 30, 2008
7419420 Substrate holding mechanism, substrate polishing apparatus and substrate polishing method Sep. 2, 2008
7407433 Pad characterization tool Aug. 5, 2008
7404757 Apparatus and method for breaking in multiple pad conditioning disks for use in a chemical mechanical polishing system Jul. 29, 2008
7390242 Diamond tool blade with circular cutting edge Jun. 24, 2008
7374471 Apparatus and method for polishing semiconductor wafers using one or more pivotable load-and-unload cups May. 20, 2008
7371152 Non-uniform subaperture polishing May. 13, 2008
7367867 Two-side working machine May. 6, 2008
7364497 Polish pad and chemical mechanical polishing apparatus comprising the same Apr. 29, 2008
7364493 Lap grinding and polishing machine Apr. 29, 2008
7357698 Polishing pad and chemical mechanical polishing apparatus using the same Apr. 15, 2008
7354335 CMP apparatus and load cup mechanism Apr. 8, 2008
7344434 Retaining ring with shaped surface Mar. 18, 2008
7338353 Loading device for chemical mechanical polisher of semiconductor wafer Mar. 4, 2008
7331847 Vibration damping in chemical mechanical polishing system Feb. 19, 2008
7326105 Retaining rings, and associated planarizing apparatuses, and related methods for planarizing micro-device workpieces Feb. 5, 2008
7314402 Method and apparatus for controlling slurry distribution Jan. 1, 2008
7306509 Processing device, processing method and method of manufacturing semiconductor device Dec. 11, 2007
7303466 Carrier head of chemical mechanical polishing apparatus having barriers dividing pressure chamber into a plurality of pressure zones Dec. 4, 2007
7300332 Polished state monitoring apparatus and polishing apparatus using the same Nov. 27, 2007
7294038 Process control in electrochemically assisted planarization Nov. 13, 2007
7294040 Method and apparatus for supporting a microelectronic substrate relative to a planarization pad Nov. 13, 2007
7278908 Polishing disk for a tool for the fine machining of optically active surfaces on spectacle lenses in particular Oct. 9, 2007
7273407 Transparent polishing pad Sep. 25, 2007
7267607 Transparent microporous materials for CMP Sep. 11, 2007
7252577 Methods for lapping using pneumatically actuated flexible coupling end effectors Aug. 7, 2007

1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18


 
 
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