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Class Information
Number: 438/970
Name: Semiconductor device manufacturing: process > Specified etch stop material
Description: Art collection involving the use of a specified material as an etch stop.










Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8557682 Multi-layer mask for substrate dicing by laser and plasma etch Oct. 15, 2013
8507363 Laser and plasma etch wafer dicing using water-soluble die attach film Aug. 13, 2013
8383510 Semiconductor device comprising metallization layers of reduced interlayer capacitance by reducing the amount of etch stop materials Feb. 26, 2013
8378489 Semiconductor device and manufacturing method therefor Feb. 19, 2013
8330257 Thin film transistor substrate, method of manufacturing the same, and display apparatus having the same Dec. 11, 2012
8242028 UV treatment of etch stop and hard mask films for selectivity and hermeticity enhancement Aug. 14, 2012
8125036 Integrated circuit having an edge passivation and oxidation resistant layer and method Feb. 28, 2012
7972892 Light emitting device and method of fabricating the same Jul. 5, 2011
7879717 Polycarbosilane buried etch stops in interconnect structures Feb. 1, 2011
7838354 Method for patterning contact etch stop layers by using a planarization process Nov. 23, 2010
7608501 Technique for creating different mechanical strain by forming a contact etch stop layer stack having differently modified intrinsic stress Oct. 27, 2009
7576011 Method of forming contact plug in semiconductor Aug. 18, 2009
7361587 Semiconductor contact and nitride spacer formation system and method Apr. 22, 2008
7195966 Methods of fabricating semiconductor devices including polysilicon resistors and related devices Mar. 27, 2007
7187081 Polycarbosilane buried etch stops in interconnect structures Mar. 6, 2007
7122467 Method for fabricating semiconductor device Oct. 17, 2006
7022246 Method of fabrication of MIMCAP and resistor at same level Apr. 4, 2006
6875687 Capping layer for extreme low dielectric constant films Apr. 5, 2005
6815332 Method for forming integrated dielectric layers Nov. 9, 2004
6724967 Method of making a functional device with deposited layers subject to high temperature anneal Apr. 20, 2004
6716697 Method of manufacturing semiconductor device having capacitor Apr. 6, 2004
6674111 Semiconductor device having a logic transistor therein Jan. 6, 2004
6617249 Method for making thin film bulk acoustic resonators (FBARS) with different frequencies on a single substrate and apparatus embodying the method Sep. 9, 2003
6589858 Method of making metal gate stack with etch endpoint tracer layer Jul. 8, 2003
6555896 Etch stop for use in etching of silicon oxide Apr. 29, 2003
6548418 Dual layer etch stop barrier Apr. 15, 2003
6498079 Method for selective source diffusion Dec. 24, 2002
6455412 Semiconductor contact via structure and method Sep. 24, 2002
6423645 Method for forming a self-aligned contact Jul. 23, 2002
6417035 Method for manufacturing a field effect transistor Jul. 9, 2002
6413846 Contact each methodology and integration scheme Jul. 2, 2002
6410426 Damascene cap layer process for integrated circuit interconnects Jun. 25, 2002
6406978 Method of removing silicon carbide Jun. 18, 2002
6391710 Methods of forming capacitors May. 21, 2002
6331467 Method of manufacturing a trench gate field effect semiconductor device Dec. 18, 2001
6326301 Method for forming a dual inlaid copper interconnect structure Dec. 4, 2001
6309963 Method for manufacturing semiconductor device Oct. 30, 2001
6287959 Deep submicron metallization using deep UV photoresist Sep. 11, 2001
6281130 Method for developing ultra-thin resist films Aug. 28, 2001
6271133 Optimized Co/Ti-salicide scheme for shallow junction deep sub-micron device fabrication Aug. 7, 2001
6268263 Method of forming a trench type element isolation in semiconductor substrate Jul. 31, 2001
6235608 STI process by method of in-situ multilayer dielectric deposition May. 22, 2001
6232139 Method of making suspended thin-film semiconductor piezoelectric devices May. 15, 2001
6232225 Method of fabricating contact window of semiconductor device May. 15, 2001
6228760 Use of PE-SiON or PE-OXIDE for contact or via photo and for defect reduction with oxide and W chemical-mechanical polish May. 8, 2001
6222257 Etch stop for use in etching of silicon oxide Apr. 24, 2001
6221713 Approach for self-aligned contact and pedestal Apr. 24, 2001
6207556 Method of fabricating metal interconnect Mar. 27, 2001
6204119 Manufacturing method for a capacitor in an integrated memory circuit Mar. 20, 2001
6204116 Method of fabricating a capacitor with a low-resistance electrode structure in integrated circuit Mar. 20, 2001

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