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Class Information
Number: 438/952
Name: Semiconductor device manufacturing: process > Masking > Radiation resist > Utilizing antireflective layer
Description: Art collection under 948 involving the use of an antireflective layer on the semiconductor substrate.

Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8652762 Organic graded spin on BARC compositions for high NA lithography Feb. 18, 2014
8623589 Bottom antireflective coating compositions and processes thereof Jan. 7, 2014
8592318 Pitch reduction using oxide spacer Nov. 26, 2013
8568958 Underlayer composition and process thereof Oct. 29, 2013
8519403 Angled implantation for deep submicron device optimization Aug. 27, 2013
8507192 Antireflective compositions and methods of using same Aug. 13, 2013
8460855 Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound Jun. 11, 2013
8390015 Organic EL element, organic EL display apparatus, and manufacturing method of organic EL element Mar. 5, 2013
8329387 Antireflective coating compositions Dec. 11, 2012
8318410 Sulfur atom-containing resist underlayer film forming composition and method for forming resist pattern Nov. 27, 2012
8216775 Anti-reflection film forming material, and method for forming resist pattern using the same Jul. 10, 2012
8153353 Ultra dark polymer Apr. 10, 2012
8119533 Pattern formation in semiconductor fabrication Feb. 21, 2012
8084193 Self-segregating multilayer imaging stack with built-in antireflective properties Dec. 27, 2011
8039389 Semiconductor device having an organic anti-reflective coating (ARC) and method therefor Oct. 18, 2011
8026042 Polymer for organic anti-reflective coating layer and composition including the same Sep. 27, 2011
8021826 Copolymer and composition for organic and antireflective layer Sep. 20, 2011
7981594 Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same Jul. 19, 2011
7968270 Process of making a semiconductor device using multiple antireflective materials Jun. 28, 2011
7955782 Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same Jun. 7, 2011
7935636 Method of fabricating semiconductor device May. 3, 2011
7879530 Antireflective coating composition, antireflective coating, and patterning process Feb. 1, 2011
7862990 Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer Jan. 4, 2011
7855142 Methods of forming dual-damascene metal interconnect structures using multi-layer hard masks Dec. 21, 2010
7842606 Method of depositing thin film and method of manufacturing semiconductor using the same Nov. 30, 2010
7829650 Polymer for organic anti-reflective coating layer and composition including the same Nov. 9, 2010
7824837 Positive-working photoimageable bottom antireflective coating Nov. 2, 2010
7816069 Graded spin-on organic antireflective coating for photolithography Oct. 19, 2010
7794919 Composition for forming underlayer coating for lithography containing epoxy compound and carboxylic acid compound Sep. 14, 2010
7790356 Condensation type polymer-containing anti-reflective coating for semiconductor Sep. 7, 2010
7781320 Method for fabricating a semiconductor device by considering the extinction coefficient during etching of an interlayer insulating film Aug. 24, 2010
7759046 Antireflective coating compositions Jul. 20, 2010
7754579 Method of forming a semiconductor device Jul. 13, 2010
7754820 Fluorinated half ester of maleic anhydride polymers for dry 193 nm top antireflective coating application Jul. 13, 2010
7678537 Graded topcoat materials for immersion lithography Mar. 16, 2010
7666575 Antireflective coating compositions Feb. 23, 2010
7648918 Method of pattern formation in semiconductor fabrication Jan. 19, 2010
7638262 Antireflective composition for photoresists Dec. 29, 2009
7632626 Anti-reflective coating forming composition for lithography containing polymer having ethylenedicarbonyl structure Dec. 15, 2009
7629110 Monomer for forming organic anti-reflective coating layer, polymer thereof and composition including the same Dec. 8, 2009
7615497 Forming fine pattern of semiconductor device using three mask layers and CMP of spin-on carbon layer Nov. 10, 2009
7608390 Top antireflective coating composition containing hydrophobic and acidic groups Oct. 27, 2009
7601483 Anti-reflective coatings using vinyl ether crosslinkers Oct. 13, 2009
7598182 Anti-reflective coating forming composition containing polyamic acid Oct. 6, 2009
7595144 Sulfonate-containing anti-reflective coating forming composition for lithography Sep. 29, 2009
7588879 Graded spin-on organic antireflective coating for photolithography Sep. 15, 2009
7582411 Antireflective film and exposure method Sep. 1, 2009
7553905 Anti-reflective coatings Jun. 30, 2009
7544750 Top antireflective coating composition with low refractive index at 193nm radiation wavelength Jun. 9, 2009
7544619 Method of fabricating semiconductor device Jun. 9, 2009

1 2 3 4 5

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