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Class Information
Number: 438/951
Name: Semiconductor device manufacturing: process > Masking > Radiation resist > Lift-off
Description: Art collection under 948 involving the selective removal of a deposited layer by striping off the radiation resist and portions of the deposited layer residing thereupon.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7354781 |
Method of manufacturing field emission device |
Apr. 8, 2008 |
| 7316784 |
Method of patterning transparent conductive film, thin film transistor substrate using the same and fabricating method thereof |
Jan. 8, 2008 |
| 7315344 |
Liquid crystal display device and method of fabricating the same |
Jan. 1, 2008 |
| 7220612 |
Liquid crystal display device and fabricating method thereof |
May. 22, 2007 |
| 7132358 |
Method of forming solder bump with reduced surface defects |
Nov. 7, 2006 |
| 7129590 |
Stencil and method for depositing material onto a substrate |
Oct. 31, 2006 |
| 7078279 |
Manufacturing method of a thin film transistor array substrate |
Jul. 18, 2006 |
| 7067398 |
Method of producing electronic circuit and electronic circuit |
Jun. 27, 2006 |
| 7067426 |
Semiconductor processing methods |
Jun. 27, 2006 |
| 7022541 |
Patterned growth of single-walled carbon nanotubes from elevated wafer structures |
Apr. 4, 2006 |
| 7008810 |
Method for fabricating at least one mesa or ridge structure or at least one electrically pumped region in a layer or layer sequence |
Mar. 7, 2006 |
| 6989327 |
Forming a contact in a thin-film device |
Jan. 24, 2006 |
| 6887719 |
Magnetoresistive random access memory (MRAM) cell patterning |
May. 3, 2005 |
| 6884630 |
Two-step magnetic tunnel junction stack deposition |
Apr. 26, 2005 |
| 6881688 |
Method of fabricating a vertically profiled electrode and semiconductor device comprising such an electrode |
Apr. 19, 2005 |
| 6784081 |
Gate structure forming method of field effect transistor |
Aug. 31, 2004 |
| 6750150 |
Method for reducing dimensions between patterns on a photoresist |
Jun. 15, 2004 |
| 6737202 |
Method of fabricating a tiered structure using a multi-layered resist stack and use |
May. 18, 2004 |
| 6670228 |
Method of fabricating a polysilicon capacitor utilizing FET and bipolar base polysilicon layers |
Dec. 30, 2003 |
| 6605519 |
Method for thin film lift-off processes using lateral extended etching masks and device |
Aug. 12, 2003 |
| 6541309 |
Fabricating a molecular electronic device having a protective barrier layer |
Apr. 1, 2003 |
| 6340635 |
Resist pattern, process for the formation of the same, and process for the formation of wiring pattern |
Jan. 22, 2002 |
| 6291296 |
Method for removing anti-reflective coating layer using plasma etch process before contact CMP |
Sep. 18, 2001 |
| 6235587 |
Method of manufacturing a semiconductor device with reduced arc loss in peripheral circuitry region |
May. 22, 2001 |
| 6194272 |
Split gate flash cell with extremely small cell size |
Feb. 27, 2001 |
| 6162725 |
Process of patterning conductive layer into electrode through lift-off using photo-resist mask imperfectly covered with the conductive layer |
Dec. 19, 2000 |
| 6156672 |
Method of forming dielectric thin film pattern and method of forming laminate pattern comprising dielectric thin film and conductive thin film |
Dec. 5, 2000 |
| 6107172 |
Controlled linewidth reduction during gate pattern formation using an SiON BARC |
Aug. 22, 2000 |
| 6077765 |
Structure of bump electrode and method of forming the same |
Jun. 20, 2000 |
| 5994194 |
Self-aligned base ohmic metal for an HBT device cross-reference to related applications |
Nov. 30, 1999 |
| 5981355 |
Method of forming isolating region |
Nov. 9, 1999 |
| 5981309 |
Method for fabricating charge coupled device image sensor |
Nov. 9, 1999 |
| 5940694 |
Field effect transistor process with semiconductor mask, single layer integrated metal, and dual etch stops |
Aug. 17, 1999 |
| 5918130 |
Transistor fabrication employing formation of silicide across source and drain regions prior to formation of the gate conductor |
Jun. 29, 1999 |
| 5888892 |
Metal layer pattern forming method |
Mar. 30, 1999 |
| 5854097 |
Method of manufacturing a semiconductor device |
Dec. 29, 1998 |
| 5804487 |
Method of fabricating high .beta.HBT devices |
Sep. 8, 1998 |
| 5804474 |
Method for forming a V-shaped gate electrode in a semiconductor device, and the structure of the electrode |
Sep. 8, 1998 |
| 5776820 |
Method of forming a high-frequency transistor T gate electrode |
Jul. 7, 1998 |
| 5773198 |
Method of forming high resolution circuitry by depositing a polyvinyl alcohol layer beneath a photosensitive polymer layer |
Jun. 30, 1998 |
| 5766967 |
Method for fabricating a submicron T-shaped gate |
Jun. 16, 1998 |
| 5705432 |
Process for providing clean lift-off of sputtered thin film layers |
Jan. 6, 1998 |
| 5686325 |
Method for forming MESFET having T-shaped gate electrode |
Nov. 11, 1997 |
| 5679608 |
Processing techniques for achieving production-worthy, low dielectric, low dielectric, low interconnect resistance and high performance IC |
Oct. 21, 1997 |
| 5656525 |
Method of manufacturing high aspect-ratio field emitters for flat panel displays |
Aug. 12, 1997 |
| 5633175 |
Process for stripping photoresist while producing liquid crystal display device |
May. 27, 1997 |
| 5620909 |
Method of depositing thin passivating film on microminiature semiconductor devices |
Apr. 15, 1997 |
| 5618383 |
Narrow lateral dimensioned microelectronic structures and method of forming the same |
Apr. 8, 1997 |
| 5605845 |
Manufacture of electronic devices comprising thin-film transistors having self-aligned plural gates |
Feb. 25, 1997 |
| 5587090 |
Multiple level mask for patterning of ceramic materials |
Dec. 24, 1996 |
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