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Class Information
Number: 438/941
Name: Semiconductor device manufacturing: process > Loading effect mitigation
Description: Art collection involving the minimalization of localized variations in the processing behavior of the substrate due to variations in the density of features formed thereupon.










Patents under this class:

Patent Number Title Of Patent Date Issued
7368372 Methods of fabricating multiple sets of field effect transistors May. 6, 2008
7060570 Methods of fabricating multiple sets of field effect transistors Jun. 13, 2006
7060569 Methods of fabricating multiple sets of field effect transistors Jun. 13, 2006
6927135 Methods of fabricating multiple sets of field effect transistors Aug. 9, 2005
6720274 Method for fabricating a semiconductor device and a substrate processing apparatus Apr. 13, 2004
5997588 Semiconductor processing system with gas curtain Dec. 7, 1999
5801104 Uniform dielectric film deposition on textured surfaces Sep. 1, 1998
5744049 Plasma reactor with enhanced plasma uniformity by gas addition, and method of using same Apr. 28, 1998
5681423 Semiconductor wafer for improved chemical-mechanical polishing over large area features Oct. 28, 1997
5639345 Two step etch back process having a convex and concave etch profile for improved etch uniformity across a substrate Jun. 17, 1997
5635421 Method of making a precision capacitor array Jun. 3, 1997
5622899 Method of fabricating semiconductor chips separated by scribe lines used for endpoint detection Apr. 22, 1997
5618757 Method for improving the manufacturability of the spin-on glass etchback process Apr. 8, 1997
5552996 Method and system using the design pattern of IC chips in the processing thereof Sep. 3, 1996
5552017 Method for improving the process uniformity in a reactor by asymmetrically adjusting the reactant gas flow Sep. 3, 1996
5415728 Method of performing plain etching treatment and apparatus therefor May. 16, 1995
5057462 Compensation of lithographic and etch proximity effects Oct. 15, 1991
4980314 Vapor processing of a substrate Dec. 25, 1990
4226665 Device fabrication by plasma etching Oct. 7, 1980











 
 
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