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Class Information
Number: 438/933
Name: Semiconductor device manufacturing: process > Germanium or silicon or ge-si on iii-v
Description: Art collection involving the formation of a hetero-interface between germanium or silicon or an alloy thereof with a III-V compound semiconductor.

Patents under this class:
1 2 3 4 5 6 7

Patent Number Title Of Patent Date Issued
8609518 Re-growing source/drain regions from un-relaxed silicon layer Dec. 17, 2013
8536621 Quantum-well-based semiconductor devices Sep. 17, 2013
8502284 Semiconductor device and method of manufacturing semiconductor device Aug. 6, 2013
8399878 Silicon/germanium oxide particle inks and processes for forming solar cell components and for forming optical components Mar. 19, 2013
8373058 Solar cell and method of adjusting color of the same Feb. 12, 2013
8278686 Structure and method for forming planar gate field effect transistor with low resistance channel region Oct. 2, 2012
8263423 Silicon/germanium oxide particle inks and processes for forming solar cell components and for forming optical components Sep. 11, 2012
8258543 Quantum-well-based semiconductor devices Sep. 4, 2012
8247284 Manufacture of semiconductor device with stress structure Aug. 21, 2012
8247283 Manufacture of semiconductor device with stress structure Aug. 21, 2012
8232581 Method for manufacturing an III-V engineered substrate and the III-V engineered substrate thereof Jul. 31, 2012
8232191 Semiconductor device manufacturing method Jul. 31, 2012
8222657 Light emitting apparatus Jul. 17, 2012
8207523 Metal oxide semiconductor field effect transistor with strained source/drain extension layer Jun. 26, 2012
8120060 Monolithically integrated silicon and III-V electronics Feb. 21, 2012
8093143 Method for producing a wafer comprising a silicon single crystal substrate having a front and a back side and a layer of SiGe deposited on the front side Jan. 10, 2012
8071435 Manufacture of semiconductor device with stress structure Dec. 6, 2011
8063413 Tensile strained GE for electronic and optoelectronic applications Nov. 22, 2011
8043980 Methods for making and using halosilylgermanes Oct. 25, 2011
8039880 High performance microwave switching devices and circuits Oct. 18, 2011
8034208 Deformation moderation method Oct. 11, 2011
8017504 Transistor having a high-k metal gate stack and a compressively stressed channel Sep. 13, 2011
7998835 Strain-direct-on-insulator (SDOI) substrate and method of forming Aug. 16, 2011
7993947 Silicon/germanium oxide particle inks, inkjet printing and processes for doping semiconductor substrates Aug. 9, 2011
7989926 Semiconductor device including non-stoichiometric silicon carbide layer and method of fabrication thereof Aug. 2, 2011
7968909 Reconditioned substrates for fabricating compound material wafers Jun. 28, 2011
7960794 Non-planar pMOS structure with a strained channel region and an integrated strained CMOS flow Jun. 14, 2011
7928017 Method of forming nanowire and method of manufacturing semiconductor device comprising the nanowire Apr. 19, 2011
7927956 Method for making a semiconductor structure using silicon germanium Apr. 19, 2011
7910468 Methods and compositions for preparing Ge/Si semiconductor substrates Mar. 22, 2011
7906439 Method of fabricating a MEMS/NEMS electromechanical component Mar. 15, 2011
7883979 Method for manufacturing a semiconductor device with reduced floating body effect Feb. 8, 2011
7863650 Multilayer structure and fabrication thereof Jan. 4, 2011
7825493 Field-effect transistor and method for fabricating the same Nov. 2, 2010
7811913 Method of fabricating a low, dark-current germanium-on-silicon pin photo detector Oct. 12, 2010
7790566 Semiconductor surface treatment for epitaxial growth Sep. 7, 2010
7767541 Methods for forming germanium-on-insulator semiconductor structures using a porous layer and semiconductor structures formed by these methods Aug. 3, 2010
7749847 CMOS integration scheme employing a silicide electrode and a silicide-germanide alloy electrode Jul. 6, 2010
7732308 Process for depositing layers containing silicon and germanium Jun. 8, 2010
7732336 Shallow trench isolation process and structure with minimized strained silicon consumption Jun. 8, 2010
7700941 Surface-emitting semiconductor laser comprising a structured waveguide Apr. 20, 2010
7682952 Method for forming low defect density alloy graded layers and structure containing such layers Mar. 23, 2010
7674669 FIN field effect transistor Mar. 9, 2010
7642197 Method to improve performance of secondary active components in an esige CMOS technology Jan. 5, 2010
7611974 Multilayer structure and fabrication thereof Nov. 3, 2009
7592619 Epitaxy layer and method of forming the same Sep. 22, 2009
7592213 Tensile strained NMOS transistor using group III-N source/drain regions Sep. 22, 2009
7553774 Method of fabricating semiconductor optical device Jun. 30, 2009
7554138 Method of manufacturing a strained semiconductor layer, method of manufacturing a semiconductor device and semiconductor substrate suitable for use in such a method including having a thin del Jun. 30, 2009
7544585 Structure of strained silicon on insulator and method of manufacturing the same Jun. 9, 2009

1 2 3 4 5 6 7

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