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Class Information
Number: 438/933
Name: Semiconductor device manufacturing: process > Germanium or silicon or ge-si on iii-v
Description: Art collection involving the formation of a hetero-interface between germanium or silicon or an alloy thereof with a III-V compound semiconductor.

Patents under this class:

1 2 3 4 5 6 7

Patent Number	Title Of Patent	Date Issued
8609518	Re-growing source/drain regions from un-relaxed silicon layer	Dec. 17, 2013
8536621	Quantum-well-based semiconductor devices	Sep. 17, 2013
8502284	Semiconductor device and method of manufacturing semiconductor device	Aug. 6, 2013
8399878	Silicon/germanium oxide particle inks and processes for forming solar cell components and for forming optical components	Mar. 19, 2013
8373058	Solar cell and method of adjusting color of the same	Feb. 12, 2013
8278686	Structure and method for forming planar gate field effect transistor with low resistance channel region	Oct. 2, 2012
8263423	Silicon/germanium oxide particle inks and processes for forming solar cell components and for forming optical components	Sep. 11, 2012
8258543	Quantum-well-based semiconductor devices	Sep. 4, 2012
8247284	Manufacture of semiconductor device with stress structure	Aug. 21, 2012
8247283	Manufacture of semiconductor device with stress structure	Aug. 21, 2012
8232581	Method for manufacturing an III-V engineered substrate and the III-V engineered substrate thereof	Jul. 31, 2012
8232191	Semiconductor device manufacturing method	Jul. 31, 2012
8222657	Light emitting apparatus	Jul. 17, 2012
8207523	Metal oxide semiconductor field effect transistor with strained source/drain extension layer	Jun. 26, 2012
8120060	Monolithically integrated silicon and III-V electronics	Feb. 21, 2012
8093143	Method for producing a wafer comprising a silicon single crystal substrate having a front and a back side and a layer of SiGe deposited on the front side	Jan. 10, 2012
8071435	Manufacture of semiconductor device with stress structure	Dec. 6, 2011
8063413	Tensile strained GE for electronic and optoelectronic applications	Nov. 22, 2011
8043980	Methods for making and using halosilylgermanes	Oct. 25, 2011
8039880	High performance microwave switching devices and circuits	Oct. 18, 2011
8034208	Deformation moderation method	Oct. 11, 2011
8017504	Transistor having a high-k metal gate stack and a compressively stressed channel	Sep. 13, 2011
7998835	Strain-direct-on-insulator (SDOI) substrate and method of forming	Aug. 16, 2011
7993947	Silicon/germanium oxide particle inks, inkjet printing and processes for doping semiconductor substrates	Aug. 9, 2011
7989926	Semiconductor device including non-stoichiometric silicon carbide layer and method of fabrication thereof	Aug. 2, 2011
7968909	Reconditioned substrates for fabricating compound material wafers	Jun. 28, 2011
7960794	Non-planar pMOS structure with a strained channel region and an integrated strained CMOS flow	Jun. 14, 2011
7928017	Method of forming nanowire and method of manufacturing semiconductor device comprising the nanowire	Apr. 19, 2011
7927956	Method for making a semiconductor structure using silicon germanium	Apr. 19, 2011
7910468	Methods and compositions for preparing Ge/Si semiconductor substrates	Mar. 22, 2011
7906439	Method of fabricating a MEMS/NEMS electromechanical component	Mar. 15, 2011
7883979	Method for manufacturing a semiconductor device with reduced floating body effect	Feb. 8, 2011
7863650	Multilayer structure and fabrication thereof	Jan. 4, 2011
7825493	Field-effect transistor and method for fabricating the same	Nov. 2, 2010
7811913	Method of fabricating a low, dark-current germanium-on-silicon pin photo detector	Oct. 12, 2010
7790566	Semiconductor surface treatment for epitaxial growth	Sep. 7, 2010
7767541	Methods for forming germanium-on-insulator semiconductor structures using a porous layer and semiconductor structures formed by these methods	Aug. 3, 2010
7749847	CMOS integration scheme employing a silicide electrode and a silicide-germanide alloy electrode	Jul. 6, 2010
7732308	Process for depositing layers containing silicon and germanium	Jun. 8, 2010
7732336	Shallow trench isolation process and structure with minimized strained silicon consumption	Jun. 8, 2010
7700941	Surface-emitting semiconductor laser comprising a structured waveguide	Apr. 20, 2010
7682952	Method for forming low defect density alloy graded layers and structure containing such layers	Mar. 23, 2010
7674669	FIN field effect transistor	Mar. 9, 2010
7642197	Method to improve performance of secondary active components in an esige CMOS technology	Jan. 5, 2010
7611974	Multilayer structure and fabrication thereof	Nov. 3, 2009
7592619	Epitaxy layer and method of forming the same	Sep. 22, 2009
7592213	Tensile strained NMOS transistor using group III-N source/drain regions	Sep. 22, 2009
7553774	Method of fabricating semiconductor optical device	Jun. 30, 2009
7554138	Method of manufacturing a strained semiconductor layer, method of manufacturing a semiconductor device and semiconductor substrate suitable for use in such a method including having a thin del	Jun. 30, 2009
7544585	Structure of strained silicon on insulator and method of manufacturing the same	Jun. 9, 2009