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Class Information
Number: 438/910
Name: Semiconductor device manufacturing: process > Controlling charging state at semiconductor-insulator interface
Description: Art collection involving adjusting the charge state where the semiconductor and insulator surfaces meet.

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8643110 Localized biasing for silicon on insulator structures Feb. 4, 2014
8377806 Method for controlled growth of silicon carbide and structures produced by same Feb. 19, 2013
8183135 Method for manufacturing thin film transistor having hydrogen feeding layer formed between a metal gate and a gate insulating film May. 22, 2012
7998772 Method to reduce leakage in a protection diode structure Aug. 16, 2011
7169671 Method of recording information in nonvolatile semiconductor memory Jan. 30, 2007
7148109 Method for manufacturing flash memory device Dec. 12, 2006
7067434 Hydrogen free integration of high-k gate dielectrics Jun. 27, 2006
7005362 Method of fabricating a thin film transistor Feb. 28, 2006
6943116 Method for fabricating a p-channel field-effect transistor on a semiconductor substrate Sep. 13, 2005
6927137 Forming a retrograde well in a transistor to enhance performance of the transistor Aug. 9, 2005
6917077 Protection diode for improved ruggedness of a radio frequency power transistor and self-defining method to manufacture such protection diode Jul. 12, 2005
6893936 Method of Forming strained SI/SIGE on insulator with silicon germanium buffer May. 17, 2005
6818570 Method of forming silicon-containing insulation film having low dielectric constant and high mechanical strength Nov. 16, 2004
6784114 Monatomic layer passivation of semiconductor surfaces Aug. 31, 2004
6770517 Semiconductor device and method for fabricating the same Aug. 3, 2004
6709906 Method for producing semiconductor device Mar. 23, 2004
6686230 Semiconducting devices and method of making thereof Feb. 3, 2004
6635589 Methods of heat treatment and heat treatment apparatus for silicon oxide films Oct. 21, 2003
6603181 MOS device having a passivated semiconductor-dielectric interface Aug. 5, 2003
6444533 Semiconductor devices and methods for same Sep. 3, 2002
6364731 Circuit device manufacturing equipment Apr. 2, 2002
6337514 Semiconductor integrated circuit device effectively decreased in surface state regardless of non-permeable layer for chemical species against surface state and process for fabricating thereof Jan. 8, 2002
6294404 Semiconductor integrated circuit having function of reducing a power consumption and semiconductor integrated circuit system comprising this semiconductor integrated circuit Sep. 25, 2001
6281550 Transistor and logic circuit of thin silicon-on-insulator wafers based on gate induced drain leakage currents Aug. 28, 2001
6277718 Semiconductor device and method for fabricating the same Aug. 21, 2001
6255221 Methods for running a high density plasma etcher to achieve reduced transistor device damage Jul. 3, 2001
6218218 Method for reducing gate oxide damage caused by charging Apr. 17, 2001
6218245 Method for fabricating a high-density and high-reliability EEPROM device Apr. 17, 2001
6159778 Methods of forming semiconductor-on-insulator field effect transistors with reduced floating body parasitics Dec. 12, 2000
6130460 Interconnect track connecting, on several metallization levels, an insulated gate of a transistor to a discharge diode within an integrated circuit, and process for producing such a track Oct. 10, 2000
6121099 Selective spacer formation for optimized silicon area reduction Sep. 19, 2000
6090671 Reduction of gate-induced drain leakage in semiconductor devices Jul. 18, 2000
6069041 Process for manufacturing non-volatile semiconductor memory device by introducing nitrogen atoms May. 30, 2000
6063698 Method for manufacturing a high dielectric constant gate oxide for use in semiconductor integrated circuits May. 16, 2000
5970384 Methods of heat treating silicon oxide films by irradiating ultra-violet light Oct. 19, 1999
5937303 High dielectric constant gate dielectric integrated with nitrogenated gate electrode Aug. 10, 1999
5897346 Method for producing a thin film transistor Apr. 27, 1999
5851893 Method of making transistor having a gate dielectric which is substantially resistant to drain-side hot carrier injection Dec. 22, 1998
5843835 Damage free gate dielectric process during gate electrode plasma etching Dec. 1, 1998
5837585 Method of fabricating flash memory cell Nov. 17, 1998
5801076 Method of making non-volatile memory device having a floating gate with enhanced charge retention Sep. 1, 1998
5753543 Method of forming a thin film transistor May. 19, 1998
5707895 Thin film transistor performance enhancement by water plasma treatment Jan. 13, 1998
5683946 Method for manufacturing fluorinated gate oxide layer Nov. 4, 1997
5681759 Method of fabricating semiconductor device Oct. 28, 1997
5674788 Method of forming high pressure silicon oxynitride gate dielectrics Oct. 7, 1997
5646057 Method for a MOS device manufacturing Jul. 8, 1997
5633178 Method of making volatile memory cell with interface charge traps May. 27, 1997
5629246 Method for forming fluorine-doped glass having low concentrations of free fluorine May. 13, 1997
5620906 Method for producing semiconductor device by introducing hydrogen ions Apr. 15, 1997

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