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Class Information
Number: 438/906
Name: Semiconductor device manufacturing: process > Cleaning of wafer as interim step
Description: Art collection involving cleaning a semiconductive wafer as a step between other processing steps.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7597816 |
Wafer bevel polymer removal |
Oct. 6, 2009 |
| 7582536 |
Electronic device with reduced interface charge between epitaxially grown layers and a method for making the same |
Sep. 1, 2009 |
| 7578302 |
Megasonic cleaning using supersaturated solution |
Aug. 25, 2009 |
| 7579253 |
Method for cleaning a semiconductor wafer |
Aug. 25, 2009 |
| 7572342 |
Method and apparatus for cleaning semiconductor photolithography tools |
Aug. 11, 2009 |
| 7566662 |
Method of dry cleaning silicon surface prior to forming self-aligned nickel silicide layer |
Jul. 28, 2009 |
| 7560369 |
Method of forming metal line in semiconductor device |
Jul. 14, 2009 |
| 7550090 |
Oxygen plasma clean to remove carbon species deposited on a glass dome surface |
Jun. 23, 2009 |
| 7546840 |
Method for cleaning reaction container and film deposition system |
Jun. 16, 2009 |
| 7531047 |
Method of removing residue from a substrate after a DRIE process |
May. 12, 2009 |
| 7521361 |
Method for manufacturing wiring substrate |
Apr. 21, 2009 |
| 7510970 |
Process for manufacturing semiconductor integrated circuit device |
Mar. 31, 2009 |
| 7504267 |
Apparatus and method for cleaning glass substrates using a cool hydrogen flame |
Mar. 17, 2009 |
| 7479460 |
Silicon surface preparation |
Jan. 20, 2009 |
| 7470631 |
Methods for fabricating residue-free contact openings |
Dec. 30, 2008 |
| 7468325 |
Method of cleaning silicon nitride layer |
Dec. 23, 2008 |
| 7465478 |
Plasma immersion ion implantation process |
Dec. 16, 2008 |
| 7456084 |
Method of using a setter having a recess in manufacturing a net-shape semiconductor wafer |
Nov. 25, 2008 |
| 7452749 |
Method for manufacturing flip-chip type semiconductor device featuring nickel electrode pads, and plating apparatus used in such method |
Nov. 18, 2008 |
| 7432177 |
Post-ion implant cleaning for silicon on insulator substrate preparation |
Oct. 7, 2008 |
| 7432186 |
Method of surface treating substrates and method of manufacturing III-V compound semiconductors |
Oct. 7, 2008 |
| 7431855 |
Apparatus and method for removing photoresist from a substrate |
Oct. 7, 2008 |
| 7412982 |
Cleaning probe and megasonic cleaning apparatus having the same |
Aug. 19, 2008 |
| 7402258 |
Methods of removing metal contaminants from a component for a plasma processing apparatus |
Jul. 22, 2008 |
| 7368383 |
Hillock reduction in copper films |
May. 6, 2008 |
| 7361598 |
Method for fabricating semiconductor device capable of preventing scratch |
Apr. 22, 2008 |
| 7344975 |
Method to reduce charge buildup during high aspect ratio contact etch |
Mar. 18, 2008 |
| 7320942 |
Method for removal of metallic residue after plasma etching of a metal layer |
Jan. 22, 2008 |
| 7306681 |
Method of cleaning a semiconductor substrate |
Dec. 11, 2007 |
| 7303637 |
Method of cleaning semiconductor surfaces |
Dec. 4, 2007 |
| 7284558 |
Enhanced megasonic based clean using an alternative cleaning chemistry |
Oct. 23, 2007 |
| 7282098 |
Processing-subject cleaning method and apparatus, and device manufacturing method and device |
Oct. 16, 2007 |
| 7282099 |
Dense phase processing fluids for microelectronic component manufacture |
Oct. 16, 2007 |
| 7264680 |
Process and apparatus for treating a workpiece using ozone |
Sep. 4, 2007 |
| 7262141 |
Methods for cleaning a semiconductor substrate having a recess channel region |
Aug. 28, 2007 |
| 7259024 |
Method of treating a substrate in manufacturing a magnetoresistive memory cell |
Aug. 21, 2007 |
| 7255749 |
Substrate cleaning method and substrate cleaning apparatus |
Aug. 14, 2007 |
| 7235141 |
Lift-off method and chemical liquid tank |
Jun. 26, 2007 |
| 7229863 |
Method for fabricating thin film transistors |
Jun. 12, 2007 |
| 7226513 |
Silicon wafer cleaning method |
Jun. 5, 2007 |
| 7205231 |
Method for in-situ uniformity optimization in a rapid thermal processing system |
Apr. 17, 2007 |
| 7192489 |
Method for polymer residue removal following metal etching |
Mar. 20, 2007 |
| 7192878 |
Method for removing post-etch residue from wafer surface |
Mar. 20, 2007 |
| 7186657 |
Method for patterning HfO2-containing dielectric |
Mar. 6, 2007 |
| 7182821 |
Substrate processing method and substrate processing apparatus |
Feb. 27, 2007 |
| 7169704 |
Method of cleaning a surface of a water in connection with forming a barrier layer of a semiconductor device |
Jan. 30, 2007 |
| 7166505 |
Method for making a semiconductor device having a high-k gate dielectric |
Jan. 23, 2007 |
| 7160396 |
Washing method |
Jan. 9, 2007 |
| 7156927 |
Transition flow treatment process and apparatus |
Jan. 2, 2007 |
| 7156111 |
Megasonic cleaning using supersaturated cleaning solution |
Jan. 2, 2007 |
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