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Class Information
Number: 438/905
Name: Semiconductor device manufacturing: process > Cleaning of reaction chamber
Description: Art collection involving cleaning an etch chamber.










Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
8657961 Method for UV based silylation chamber clean Feb. 25, 2014
8657942 Trap device Feb. 25, 2014
8647442 Cleaning substrate and cleaning method Feb. 11, 2014
8597401 Exhausting method and gas processing apparatus Dec. 3, 2013
8591809 Substrate transfer container, gas purge monitoring tool, and semiconductor manufacturing equipment with the same Nov. 26, 2013
8591659 Plasma clean method for deposition chamber Nov. 26, 2013
8591752 Plasma processing method Nov. 26, 2013
8562751 Dry cleaning method of substrate processing apparatus Oct. 22, 2013
8541307 Treatment method for reducing particles in dual damascene silicon nitride process Sep. 24, 2013
8536073 Hardmask materials Sep. 17, 2013
8518774 Manufacturing process for zero-capacitor random access memory circuits Aug. 27, 2013
8500912 Plasma processing method and plasma processing apparatus Aug. 6, 2013
8496756 Methods for processing substrates in process systems having shared resources Jul. 30, 2013
8455368 Methods and apparatus for assembling and operating electronic device manufacturing systems Jun. 4, 2013
8448288 Semiconductor equipment May. 28, 2013
8452455 Control device and control method of plasma processing system, and storage medium storing control program May. 28, 2013
8404135 Plasma cleaning for process chamber component refurbishment Mar. 26, 2013
8389389 Semiconductor layer manufacturing method, semiconductor layer manufacturing apparatus, and semiconductor device manufactured using such method and apparatus Mar. 5, 2013
8382910 Cleaning method for substrate processing system, storage medium, and substrate processing system Feb. 26, 2013
8382938 Gate valve cleaning method and substrate processing system Feb. 26, 2013
8364422 Method of presuming interior situation of process chamber and storage medium Jan. 29, 2013
8357615 Method of manufacturing semiconductor device Jan. 22, 2013
8349401 Film formation apparatus and method for using same Jan. 8, 2013
8337623 Methods for plasma cleaning an internal peripheral region of a plasma processing chamber Dec. 25, 2012
8334214 Susceptor treatment method and a method for treating a semiconductor manufacturing apparatus Dec. 18, 2012
8303719 Deposit removing method and substrate processing method Nov. 6, 2012
8278195 Plasma CVD apparatus Oct. 2, 2012
8268081 Platen cleaning method Sep. 18, 2012
8268675 Passivation layer for semiconductor device packaging Sep. 18, 2012
8261762 Processing gas supplying system and processing gas supplying method Sep. 11, 2012
8262922 Plasma confinement rings having reduced polymer deposition characteristics Sep. 11, 2012
8255072 Substrate processing apparatus, program, storage medium and conditioning necessity determining method Aug. 28, 2012
8247332 Hardmask materials Aug. 21, 2012
8236109 Component cleaning method and storage medium Aug. 7, 2012
8236596 Diffusion furnaces employing ultra low mass transport systems and methods of wafer rapid diffusion processing Aug. 7, 2012
8232123 Organic light emitting diode display with improved on-current, and method for manufacturing the same Jul. 31, 2012
8097088 Methods for processing substrates in a dual chamber processing system having shared resources Jan. 17, 2012
8080109 Film formation apparatus and method for using the same Dec. 20, 2011
8071483 Semiconductor device manufacturing method and semiconductor device manufacturing apparatus Dec. 6, 2011
8057603 Method of cleaning substrate processing chamber, storage medium, and substrate processing chamber Nov. 15, 2011
8053338 Plasma CVD apparatus Nov. 8, 2011
8053274 Self cleaning large scale method and furnace system for selenization of thin film photovoltaic materials Nov. 8, 2011
8048327 Plasma processing apparatus and control method thereof Nov. 1, 2011
8039374 Method for low temperature ion implantation Oct. 18, 2011
8034183 Cleaning method and plasma processing method Oct. 11, 2011
8025736 Semiconductor device fabrication equipment for performing PEOX process and method including cleaning the equipment with remotely produced plasma Sep. 27, 2011
8025739 Method of manufacturing semiconductor device Sep. 27, 2011
8021565 Surface treatment method, etching method, and method for manufacturing electronic device Sep. 20, 2011
8002947 Plasma treatment system and cleaning method of the same Aug. 23, 2011
7993938 Highly doped III-nitride semiconductors Aug. 9, 2011

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