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Class Information
Number: 438/905
Name: Semiconductor device manufacturing: process > Cleaning of reaction chamber
Description: Art collection involving cleaning an etch chamber.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7615163 |
Film formation apparatus and method of using the same |
Nov. 10, 2009 |
| 7588036 |
Chamber clean method using remote and in situ plasma cleaning systems |
Sep. 15, 2009 |
| 7585686 |
Method and apparatus for processing a wafer |
Sep. 8, 2009 |
| 7581550 |
Method of cleaning reaction chamber using substrate having catalyst layer thereon |
Sep. 1, 2009 |
| 7579261 |
Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafers |
Aug. 25, 2009 |
| 7576018 |
Method for flexing a substrate during processing |
Aug. 18, 2009 |
| 7569484 |
Plasma and electron beam etching device and method |
Aug. 4, 2009 |
| 7569256 |
Plasma CVD apparatus and dry cleaning method of the same |
Aug. 4, 2009 |
| 7560369 |
Method of forming metal line in semiconductor device |
Jul. 14, 2009 |
| 7550090 |
Oxygen plasma clean to remove carbon species deposited on a glass dome surface |
Jun. 23, 2009 |
| 7546840 |
Method for cleaning reaction container and film deposition system |
Jun. 16, 2009 |
| 7541094 |
Firepolished quartz parts for use in semiconductor processing |
Jun. 2, 2009 |
| 7530359 |
Plasma treatment system and cleaning method of the same |
May. 12, 2009 |
| 7520937 |
Thin film forming apparatus and method of cleaning the same |
Apr. 21, 2009 |
| 7509962 |
Method and control system for treating a hafnium-based dielectric processing system |
Mar. 31, 2009 |
| 7506654 |
Accelerated plasma clean |
Mar. 24, 2009 |
| 7498267 |
Method for forming semiconductor memory capacitor without cell-to-cell bridges |
Mar. 3, 2009 |
| 7494943 |
Method for using film formation apparatus |
Feb. 24, 2009 |
| 7491652 |
In-line processing for forming a silicon nitride film |
Feb. 17, 2009 |
| 7481230 |
Plasma processing method and apparatus |
Jan. 27, 2009 |
| 7470594 |
System and method for controlling the formation of an interfacial oxide layer in a polysilicon emitter transistor |
Dec. 30, 2008 |
| 7432215 |
Semiconductor device manufacturing method and semiconductor manufacturing apparatus |
Oct. 7, 2008 |
| 7402258 |
Methods of removing metal contaminants from a component for a plasma processing apparatus |
Jul. 22, 2008 |
| 7381344 |
Method to reduce particle level for dry-etch |
Jun. 3, 2008 |
| 7371688 |
Removal of transition metal ternary and/or quaternary barrier materials from a substrate |
May. 13, 2008 |
| 7358196 |
Wet chemical treatment to form a thin oxide for high k gate dielectrics |
Apr. 15, 2008 |
| 7354525 |
Specimen surface processing apparatus and surface processing method |
Apr. 8, 2008 |
| 7332425 |
Simultaneous deposition and etch process for barrier layer formation in microelectronic device interconnects |
Feb. 19, 2008 |
| 7323399 |
Clean process for an electron beam source |
Jan. 29, 2008 |
| 7322368 |
Plasma cleaning gas and plasma cleaning method |
Jan. 29, 2008 |
| 7311109 |
Method for cleaning a processing chamber and method for manufacturing a semiconductor device |
Dec. 25, 2007 |
| 7270761 |
Fluorine free integrated process for etching aluminum including chamber dry clean |
Sep. 18, 2007 |
| 7267132 |
Methods for removing silicon and silicon-nitride contamination layers from deposition tubes |
Sep. 11, 2007 |
| 7268089 |
Method for forming PE-TEOS layer of semiconductor integrated circuit device |
Sep. 11, 2007 |
| 7250114 |
Methods of finishing quartz glass surfaces and components made by the methods |
Jul. 31, 2007 |
| 7234476 |
Method of cleaning CVD equipment processing chamber |
Jun. 26, 2007 |
| 7223446 |
Plasma CVD apparatus and dry cleaning method of the same |
May. 29, 2007 |
| 7211518 |
Waferless automatic cleaning after barrier removal |
May. 1, 2007 |
| 7207339 |
Method for cleaning a plasma enhanced CVD chamber |
Apr. 24, 2007 |
| 7201174 |
Processing apparatus and cleaning method |
Apr. 10, 2007 |
| 7202099 |
Method of fabricating a laser diode that includes thermally cleaning a deposition reactor using a gas mixture of arsine and hydrogen |
Apr. 10, 2007 |
| 7201807 |
Method for cleaning a deposition chamber and deposition apparatus for performing in situ cleaning |
Apr. 10, 2007 |
| 7182819 |
Methods for cleaning a chamber of semiconductor device manufacturing equipment |
Feb. 27, 2007 |
| 7168436 |
Gas for removing deposit and removal method using same |
Jan. 30, 2007 |
| 7163849 |
Fabrication method of semiconductor integrated circuit device |
Jan. 16, 2007 |
| 7159597 |
Multistep remote plasma clean process |
Jan. 9, 2007 |
| 7156923 |
Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method |
Jan. 2, 2007 |
| 7150796 |
Method of removing PECVD residues of fluorinated plasma using in-situ H.sub.2 plasma |
Dec. 19, 2006 |
| 7141512 |
Method of cleaning semiconductor device fabrication apparatus |
Nov. 28, 2006 |
| 7140374 |
System, method and apparatus for self-cleaning dry etch |
Nov. 28, 2006 |
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