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Class Information
Number: 438/903
Name: Semiconductor device manufacturing: process > Catalyst aided deposition
Description: Art collection involving the use of a catalyst to facilitate material deposition.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7601639 |
Method for conditioning a microelectronics device deposition chamber |
Oct. 13, 2009 |
| 7582507 |
Catalyst support substrate, method for growing carbon nanotubes using the same, and the transistor using carbon nanotubes |
Sep. 1, 2009 |
| 7521361 |
Method for manufacturing wiring substrate |
Apr. 21, 2009 |
| 7446044 |
Carbon nanotube switches for memory, RF communications and sensing applications, and methods of making the same |
Nov. 4, 2008 |
| 7410911 |
Method for stabilizing high pressure oxidation of a semiconductor device |
Aug. 12, 2008 |
| 7241690 |
Method for conditioning a microelectronics device deposition chamber |
Jul. 10, 2007 |
| 7183131 |
Process for producing a nanoelement arrangement, and nanoelement arrangement |
Feb. 27, 2007 |
| 7044821 |
Method of manufacturing a plasma display panel by decomposing impurities in exhaust gas with a catalyst |
May. 16, 2006 |
| 6992000 |
Method of plating nonconductor product |
Jan. 31, 2006 |
| 6955996 |
Method for stabilizing high pressure oxidation of a semiconductor device |
Oct. 18, 2005 |
| 6949478 |
Oxide film forming method |
Sep. 27, 2005 |
| 6936906 |
Integration of barrier layer and seed layer |
Aug. 30, 2005 |
| 6844260 |
Insitu post atomic layer deposition destruction of active species |
Jan. 18, 2005 |
| 6780664 |
Nanotube tip for atomic force microscope |
Aug. 24, 2004 |
| 6774052 |
Method of making nanotube permeable base transistor |
Aug. 10, 2004 |
| 6653212 |
Method and apparatus for thin-film deposition, and method of manufacturing thin-film semiconductor device |
Nov. 25, 2003 |
| 6596651 |
Method for stabilizing high pressure oxidation of a semiconductor device |
Jul. 22, 2003 |
| 6495458 |
Method for producing low carbon/oxygen conductive layers |
Dec. 17, 2002 |
| 6451694 |
Control of abnormal growth in dichloro silane (DCS) based CVD polycide WSix films |
Sep. 17, 2002 |
| 6423649 |
Method and apparatus for stabilizing high pressure oxidation of a semiconductor device |
Jul. 23, 2002 |
| 6294404 |
Semiconductor integrated circuit having function of reducing a power consumption and semiconductor integrated circuit system comprising this semiconductor integrated circuit |
Sep. 25, 2001 |
| 6291364 |
Method and apparatus for stabilizing high pressure oxidation of a semiconductor device |
Sep. 18, 2001 |
| 6126989 |
Copper electroless deposition on a titanium-containing surface |
Oct. 3, 2000 |
| 5792705 |
Optimized planarization process for SOG filled vias |
Aug. 11, 1998 |
| 5508228 |
Compliant electrically connective bumps for an adhesive flip chip integrated circuit device and methods for forming same |
Apr. 16, 1996 |
| 5470800 |
Method for forming an interlayer film |
Nov. 28, 1995 |
| 5366919 |
Method of making a memory cell of a semiconductor memory device |
Nov. 22, 1994 |
| 5360768 |
Method of forming oxide film |
Nov. 1, 1994 |
| 5290721 |
Method of making a stacked semiconductor nonvolatile memory device |
Mar. 1, 1994 |
| 5231056 |
Tungsten silicide (WSi.sub.x) deposition process for semiconductor manufacture |
Jul. 27, 1993 |
| 5198389 |
Method of metallizing contact holes in a semiconductor device |
Mar. 30, 1993 |
| 5063169 |
Selectively plating conductive pillars in manufacturing a semiconductor device |
Nov. 5, 1991 |
| 4897150 |
Method of direct write desposition of a conductor on a semiconductor |
Jan. 30, 1990 |
| 4873119 |
Catalytic deposition of semiconductors |
Oct. 10, 1989 |
| 4843030 |
Semiconductor processing by a combination of photolytic, pyrolytic and catalytic processes |
Jun. 27, 1989 |
| 4822749 |
Self-aligned metallization for semiconductor device and process using selectively deposited tungsten |
Apr. 18, 1989 |
| 4784963 |
Method for light-induced photolytic deposition simultaneously independently controlling at least two different frequency radiations during the process |
Nov. 15, 1988 |
| 4735921 |
Nitridation of silicon and other semiconductors using alkali metal catalysts |
Apr. 5, 1988 |
| 4701347 |
Method for growing patterned metal layers |
Oct. 20, 1987 |
| 4696834 |
Silicon-containing coatings and a method for their preparation |
Sep. 29, 1987 |
| 4696702 |
Method of depositing wide bandgap amorphous semiconductor materials |
Sep. 29, 1987 |
| 4681640 |
Laser-induced chemical vapor deposition of germanium and doped-germanium films |
Jul. 21, 1987 |
| 4631804 |
Technique for reducing substrate warpage springback using a polysilicon subsurface strained layer |
Dec. 30, 1986 |
| 4420365 |
Formation of patterned film over semiconductor structure |
Dec. 13, 1983 |
| 4348428 |
Method of depositing doped amorphous semiconductor on a substrate |
Sep. 7, 1982 |
| 4268536 |
Method for depositing a metal on a surface |
May. 19, 1981 |
| 4176206 |
Method for manufacturing an oxide of semiconductor |
Nov. 27, 1979 |
| 4139401 |
Method of producing electrically isolated semiconductor devices on common crystalline substrate |
Feb. 13, 1979 |
| 4068020 |
Method of depositing elemental amorphous silicon |
Jan. 10, 1978 |
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