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Class Information
Number: 438/9
Name: Semiconductor device manufacturing: process > Including control responsive to sensed condition > Optical characteristic sensed > Chemical etching > Plasma etching
Description: Process wherein the chemical etching step utilizes an ionized chemically reactive gas to etch the semiconductor substrate.

Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
8691102 Method of manufacturing plasmon generator Apr. 8, 2014
8685265 Manufacturing method of semiconductor device and semiconductor manufacturing apparatus Apr. 1, 2014
8680881 Test method and interposer used therefor Mar. 25, 2014
8679922 Method of producing semiconductor device and method of producing solid-state image pickup device Mar. 25, 2014
8664040 Exposing connectors in packages through selective treatment Mar. 4, 2014
8664060 Semiconductor structure and method of fabricating the same Mar. 4, 2014
8647892 Inline process control structures Feb. 11, 2014
8633116 Dry etching method Jan. 21, 2014
8628675 Method for reduction of voltage potential spike during dechucking Jan. 14, 2014
8557612 Method for fabricating micro and nanostructures in a material Oct. 15, 2013
8557613 Methods for designing, fabricating, and predicting shape formations in a material Oct. 15, 2013
8546266 Plasma processing method and plasma processing apparatus Oct. 1, 2013
8538572 Methods for constructing an optimal endpoint algorithm Sep. 17, 2013
8518721 Dopant marker for precise recess control Aug. 27, 2013
8513135 Methods of modifying oxide spacers Aug. 20, 2013
8501631 Plasma processing system control based on RF voltage Aug. 6, 2013
8492264 Method for forming interconnection levels of an integrated circuit Jul. 23, 2013
8486290 Etching apparatus, analysis apparatus, etching treatment method, and etching treatment program Jul. 16, 2013
8481381 Superior integrity of high-k metal gate stacks by preserving a resist material above end caps of gate electrode structures Jul. 9, 2013
8476637 Nanostructure optoelectronic device having sidewall electrical contact Jul. 2, 2013
8449174 Method and apparatus for chuck thermal calibration May. 28, 2013
8445296 Apparatus and methods for end point determination in reactive ion etching May. 21, 2013
8440573 Method and apparatus for pattern collapse free wet processing of semiconductor devices May. 14, 2013
8373427 Electron radiation monitoring system to prevent gold spitting and resist cross-linking during evaporation Feb. 12, 2013
8358416 Methods and apparatus for normalizing optical emission spectra Jan. 22, 2013
8343779 Method for forming a pattern on a substrate and electronic device formed thereby Jan. 1, 2013
8323521 Plasma generation controlled by gravity-induced gas-diffusion separation (GIGDS) techniques Dec. 4, 2012
8313665 Showerhead electrode assemblies for plasma processing apparatuses Nov. 20, 2012
8304262 Wiggling control for pseudo-hardmask Nov. 6, 2012
8295966 Methods and apparatus to predict etch rate uniformity for qualification of a plasma chamber Oct. 23, 2012
8282744 Substrate processing apparatus, substrate processing method, substrate processing program, and computer readable recording medium having substrate processing program therein Oct. 9, 2012
8274107 Exposure system, semiconductor device, and method for fabricating the semiconductor device Sep. 25, 2012
RE43652 Substrate processing control method and storage medium Sep. 11, 2012
8257546 Method and system for monitoring an etch process Sep. 4, 2012
8231800 Plasma processing apparatus and method Jul. 31, 2012
8216865 Display device and method of manufacturing the same Jul. 10, 2012
8211809 Method of producing semiconductor device Jul. 3, 2012
8202739 Dopant marker for precise recess control Jun. 19, 2012
8198104 Method of manufacturing a semiconductor device Jun. 12, 2012
8198103 Addition of ballast hydrocarbon gas to doped polysilicon etch masked by resist Jun. 12, 2012
8197705 Method of processing silicon substrate and method of manufacturing liquid discharge head Jun. 12, 2012
8175736 Method and system for performing a chemical oxide removal process May. 8, 2012
8173450 Method of designing an etch stage measurement system May. 8, 2012
8173451 Etch stage measurement system May. 8, 2012
8158017 Detection of arcing events in wafer plasma processing through monitoring of trace gas concentrations Apr. 17, 2012
8158445 Methods of forming pattern structures and methods of manufacturing semiconductor devices using the same Apr. 17, 2012
8158484 Method of forming an inverted T shaped channel structure for an inverted T channel field effect transistor device Apr. 17, 2012
8144328 Methods and apparatus for normalizing optical emission spectra Mar. 27, 2012
8138089 Method and apparatus for measurement and control of photomask to substrate alignment Mar. 20, 2012
8129283 Plasma processing method and plasma processing apparatus Mar. 6, 2012

1 2 3 4 5 6 7 8 9

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