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Class Information
Number: 438/9
Name: Semiconductor device manufacturing: process > Including control responsive to sensed condition > Optical characteristic sensed > Chemical etching > Plasma etching
Description: Process wherein the chemical etching step utilizes an ionized chemically reactive gas to etch the semiconductor substrate.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7620511 |
Method for determining plasma characteristics |
Nov. 17, 2009 |
| 7608546 |
Method for fabricating a semiconductor device |
Oct. 27, 2009 |
| 7604908 |
Fine pattern forming method |
Oct. 20, 2009 |
| 7588946 |
Controlling system for gate formation of semiconductor devices |
Sep. 15, 2009 |
| 7582490 |
Controlled fabrication of gaps in electrically conducting structures |
Sep. 1, 2009 |
| 7579273 |
Method of manufacturing a photodiode array with through-wafer vias |
Aug. 25, 2009 |
| 7566574 |
Method of performing a double-sided process |
Jul. 28, 2009 |
| 7544521 |
Negative bias critical dimension trim |
Jun. 9, 2009 |
| 7504288 |
Method for laser-processing semiconductor device |
Mar. 17, 2009 |
| 7497958 |
Methods of forming capacitors |
Mar. 3, 2009 |
| 7494827 |
Plasma etching method and plasma etching apparatus |
Feb. 24, 2009 |
| 7482177 |
Method for manufacturing optical device, and optical device wafer |
Jan. 27, 2009 |
| 7479395 |
Method of monitoring a production process using a linear combination of measured variables with selected weights |
Jan. 20, 2009 |
| 7476556 |
Systems and methods for plasma processing of microfeature workpieces |
Jan. 13, 2009 |
| 7468790 |
Detecting gaseous species by light-emission spectrometry with spectrum processing |
Dec. 23, 2008 |
| 7455790 |
Emission spectroscopic processing apparatus and plasma processing method using it |
Nov. 25, 2008 |
| 7456109 |
Method for cleaning substrate processing chamber |
Nov. 25, 2008 |
| 7452824 |
Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters |
Nov. 18, 2008 |
| 7439068 |
Plasma monitoring method, plasma processing method, method of manufacturing semiconductor device, and plasma processing system |
Oct. 21, 2008 |
| 7440859 |
Method for determining plasma characteristics |
Oct. 21, 2008 |
| 7427519 |
Method of detecting end point of plasma etching process |
Sep. 23, 2008 |
| 7399711 |
Method for controlling a recess etch process |
Jul. 15, 2008 |
| 7393700 |
Low temperature methods of etching semiconductor substrates |
Jul. 1, 2008 |
| 7377992 |
Method and apparatus for detecting end point |
May. 27, 2008 |
| 7376479 |
Process monitoring device for sample processing apparatus and control method of sample processing apparatus |
May. 20, 2008 |
| 7354778 |
Method for determining the end point for a cleaning etching process |
Apr. 8, 2008 |
| 7329549 |
Monitoring method of processing state and processing unit |
Feb. 12, 2008 |
| 7306955 |
Method of performing a double-sided process |
Dec. 11, 2007 |
| 7297560 |
Method and apparatus for detecting endpoint |
Nov. 20, 2007 |
| 7297287 |
Method and apparatus for endpoint detection using partial least squares |
Nov. 20, 2007 |
| 7286948 |
Method for determining plasma characteristics |
Oct. 23, 2007 |
| 7258838 |
Solid state molecular probe device |
Aug. 21, 2007 |
| 7244369 |
Method for producing active or passive components on a polymer basis for integrated optical devices |
Jul. 17, 2007 |
| 7211196 |
Method and system of discriminating substrate type |
May. 1, 2007 |
| 7208326 |
Edge protection process for semiconductor device fabrication |
Apr. 24, 2007 |
| 7204934 |
Method for planarization etch with in-situ monitoring by interferometry prior to recess etch |
Apr. 17, 2007 |
| 7192505 |
Wafer probe for measuring plasma and surface characteristics in plasma processing environments |
Mar. 20, 2007 |
| 7181306 |
Enhanced plasma etch process |
Feb. 20, 2007 |
| 7169625 |
Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring |
Jan. 30, 2007 |
| 7158848 |
Process monitoring device for sample processing apparatus and control method of sample processing apparatus |
Jan. 2, 2007 |
| 7139632 |
Enhanced process and profile simulator algorithms |
Nov. 21, 2006 |
| 7132302 |
Method of increasing cell retention capacity of silicon nitride read-only-memory cell |
Nov. 7, 2006 |
| 7129104 |
Wavelength-insensitive radiation coupling for multi-quantum well sensor based on intersubband absorption |
Oct. 31, 2006 |
| 7118926 |
Method of optimizing seasoning recipe for etch process |
Oct. 10, 2006 |
| 7094613 |
Method for controlling accuracy and repeatability of an etch process |
Aug. 22, 2006 |
| 7067432 |
Methodology for in-situ and real-time chamber condition monitoring and process recovery during plasma processing |
Jun. 27, 2006 |
| 7067333 |
Method and apparatus for implementing competing control models |
Jun. 27, 2006 |
| 7058467 |
Process monitoring device for sample processing apparatus and control method of sample processing apparatus |
Jun. 6, 2006 |
| 7033904 |
Semiconductor device, semiconductor substrate and fabrication process of a semiconductor device |
Apr. 25, 2006 |
| 7029593 |
Method for controlling CD during an etch process |
Apr. 18, 2006 |
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