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Class Information
Number: 438/8
Name: Semiconductor device manufacturing: process > Including control responsive to sensed condition > Optical characteristic sensed > Chemical etching
Description: Process having a step of chemically etching the semiconductor substrate in conjunction with the sensing of an optical property of the process or of the semiconductor device.


Sub-classes under this class:

Class Number Class Name Patents
438/9 Plasma etching 302


Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
7618831 Method of monitoring the manufacture of interferometric modulators Nov. 17, 2009
7620511 Method for determining plasma characteristics Nov. 17, 2009
7602032 Memory having cap structure for magnetoresistive junction and method for structuring the same Oct. 13, 2009
7582490 Controlled fabrication of gaps in electrically conducting structures Sep. 1, 2009
7579309 Methods for characterizing defects on silicon surfaces and etching composition and treatment process therefor Aug. 25, 2009
7556972 Detection and characterization of SiCOH-based dielectric materials during device fabrication Jul. 7, 2009
7527704 Method for preparing film structure comprising ferroelectric single crystal layer May. 5, 2009
7508531 System and method for measuring germanium concentration for manufacturing control of BiCMOS films Mar. 24, 2009
7497958 Methods of forming capacitors Mar. 3, 2009
7482177 Method for manufacturing optical device, and optical device wafer Jan. 27, 2009
7476556 Systems and methods for plasma processing of microfeature workpieces Jan. 13, 2009
7438392 Microfluidic substrates having improved fluidic channels Oct. 21, 2008
7439068 Plasma monitoring method, plasma processing method, method of manufacturing semiconductor device, and plasma processing system Oct. 21, 2008
7402510 Etchant and method for forming bumps Jul. 22, 2008
7399711 Method for controlling a recess etch process Jul. 15, 2008
7393700 Low temperature methods of etching semiconductor substrates Jul. 1, 2008
7387455 Substrate processing device, substrate processing method, and developing device Jun. 17, 2008
7368397 Method for monitoring edge bead removal process of copper metal interconnection May. 6, 2008
7353379 Methods for configuring a plasma cluster tool Apr. 1, 2008
7319530 System and method for measuring germanium concentration for manufacturing control of BiCMOS films Jan. 15, 2008
7314766 Semiconductor wafer treatment method, semiconductor wafer inspection method, semiconductor device development method and semiconductor wafer treatment apparatus Jan. 1, 2008
7312161 Advanced process control for low variation treatment in immersion processing Dec. 25, 2007
7285781 Characterizing resist line shrinkage due to CD-SEM inspection Oct. 23, 2007
7282448 Substrate and method of forming substrate for fluid ejection device Oct. 16, 2007
7258838 Solid state molecular probe device Aug. 21, 2007
7257502 Determining metrology sampling decisions based on fabrication simulation Aug. 14, 2007
7247507 Method for forming LOCOS layer in semiconductor device Jul. 24, 2007
7229843 Device and method for monitoring process exhaust gas, semiconductor manufacturing device, and system and method for controlling semiconductor manufacturing device Jun. 12, 2007
7214550 Method to produce thin film resistor using dry etch May. 8, 2007
7189332 Apparatus and method for detecting an endpoint in a vapor phase etch Mar. 13, 2007
7183213 Chemical mechanical polishing pad and chemical mechanical polishing method Feb. 27, 2007
7176041 PAA-based etchant, methods of using same, and resultant structures Feb. 13, 2007
7165560 Etching method, etching apparatus, and method for manufacturing semiconductor device Jan. 23, 2007
7153710 Etching method, method of manufacturing semiconductor device, and semiconductor device Dec. 26, 2006
7148073 Methods and systems for preparing a copper containing substrate for analysis Dec. 12, 2006
7125729 Method for opening the plastic housing of an electronic module Oct. 24, 2006
7087440 Monitoring of nitrided oxide gate dielectrics by determination of a wet etch Aug. 8, 2006
7087498 Method for controlling trench depth in shallow trench isolation features Aug. 8, 2006
7077971 Methods for detecting the endpoint of a photoresist stripping process Jul. 18, 2006
7067333 Method and apparatus for implementing competing control models Jun. 27, 2006
7041226 Methods for improving flow through fluidic channels May. 9, 2006
7033904 Semiconductor device, semiconductor substrate and fabrication process of a semiconductor device Apr. 25, 2006
7029593 Method for controlling CD during an etch process Apr. 18, 2006
7030018 Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool Apr. 18, 2006
7026173 Method and apparatus for detecting end point Apr. 11, 2006
7011979 Detecting pinholes in vertical cavity surface-emitting laser passivation Mar. 14, 2006
7001784 Method to control spacer width Feb. 21, 2006
6979577 Method and apparatus for manufacturing semiconductor device Dec. 27, 2005
6958247 Method of electroplating copper over a patterned dielectric layer to enhance process uniformity of a subsequent CMP process Oct. 25, 2005
6955987 Comparison of chemical-mechanical polishing processes Oct. 18, 2005

1 2 3 4 5


 
 
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