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Class Information
Number: 438/798
Name: Semiconductor device manufacturing: process > Radiation or energy treatment modifying properties of semiconductor region of substrate (e.g., thermal, corpuscular, electromagnetic, etc.) > Ionized irradiation (e.g., corpuscular or plasma treatment, etc.)
Description: Process wherein ionized radiation is applied to the semiconductor to modify the properties thereof.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618880 |
Apparatus and method for transformation of substrate |
Nov. 17, 2009 |
| 7605084 |
Method of gap-filling using amplitude modulation radio frequency power |
Oct. 20, 2009 |
| 7588803 |
Multi step ebeam process for modifying dielectric materials |
Sep. 15, 2009 |
| 7585704 |
Method of producing highly strained PECVD silicon nitride thin films at low temperature |
Sep. 8, 2009 |
| 7582492 |
Method of doping impurities, and electronic element using the same |
Sep. 1, 2009 |
| 7579287 |
Surface treatment method, manufacturing method of semiconductor device, and manufacturing method of capacitive element |
Aug. 25, 2009 |
| 7576341 |
Lithography systems and methods for operating the same |
Aug. 18, 2009 |
| 7566482 |
SOI by oxidation of porous silicon |
Jul. 28, 2009 |
| 7563718 |
Method for forming tungsten layer of semiconductor device and method for forming tungsten wiring layer using the same |
Jul. 21, 2009 |
| 7560366 |
Nanowire horizontal growth and substrate removal |
Jul. 14, 2009 |
| 7557050 |
Method of manufacturing polysilicon thin film and method of manufacturing thin film transistor having the same |
Jul. 7, 2009 |
| 7553772 |
Process and apparatus for simultaneous light and radical surface treatment of integrated circuit structure |
Jun. 30, 2009 |
| 7524776 |
Surface-activation of semiconductor nanostructures for biological applications |
Apr. 28, 2009 |
| 7524777 |
Method for manufacturing an isolation structure using an energy beam treatment |
Apr. 28, 2009 |
| 7521382 |
High resistivity silicon structure and a process for the preparation thereof |
Apr. 21, 2009 |
| 7521312 |
Method and system for creating self-aligned twin wells with co-planar surfaces in a semiconductor device |
Apr. 21, 2009 |
| 7517776 |
Method for controlling dislocation positions in silicon germanium buffer layers |
Apr. 14, 2009 |
| 7514377 |
Plasma generator, ozone generator, substrate processing apparatus and manufacturing method of semiconductor device |
Apr. 7, 2009 |
| 7498242 |
Plasma pre-treating surfaces for atomic layer deposition |
Mar. 3, 2009 |
| 7485473 |
Methods for forming semiconducting device with titanium nitride orientation layer |
Feb. 3, 2009 |
| 7482289 |
Methods and apparatus for depositing tantalum metal films to surfaces and substrates |
Jan. 27, 2009 |
| 7482288 |
Method for producing a grid cap with a locally increased dielectric constant |
Jan. 27, 2009 |
| 7479466 |
Method of heating semiconductor wafer to improve wafer flatness |
Jan. 20, 2009 |
| 7466907 |
Annealing process and device of semiconductor wafer |
Dec. 16, 2008 |
| 7465680 |
Post deposition plasma treatment to increase tensile stress of HDP-CVD SIO.sub.2 |
Dec. 16, 2008 |
| 7459403 |
Method for reducing device and circuit sensitivity to electrical stress and radiation induced aging |
Dec. 2, 2008 |
| 7456032 |
Method and system for measuring laser induced phenomena changes in a semiconductor device |
Nov. 25, 2008 |
| 7446023 |
High-density plasma hydrogenation |
Nov. 4, 2008 |
| 7439197 |
Method of fabricating a capacitor |
Oct. 21, 2008 |
| 7410839 |
Thin film transistor and manufacturing method thereof |
Aug. 12, 2008 |
| 7396745 |
Formation of ultra-shallow junctions by gas-cluster ion irradiation |
Jul. 8, 2008 |
| 7387946 |
Method of fabricating a substrate for a planar, double-gated, transistor process |
Jun. 17, 2008 |
| 7381943 |
Neutral particle beam processing apparatus |
Jun. 3, 2008 |
| 7372049 |
Lithographic apparatus including a cleaning device and method for cleaning an optical element |
May. 13, 2008 |
| 7357963 |
Apparatus and method of crystallizing amorphous silicon |
Apr. 15, 2008 |
| 7358200 |
Gas-assisted rapid thermal processing |
Apr. 15, 2008 |
| 7351669 |
Method of forming a substantially closed void |
Apr. 1, 2008 |
| 7314838 |
Method for forming a high density dielectric film by chemical vapor deposition |
Jan. 1, 2008 |
| 7294590 |
System and method for removing charges with enhanced efficiency |
Nov. 13, 2007 |
| 7288294 |
Method of crystallizing amorphous silicon using nanoparticles |
Oct. 30, 2007 |
| 7268087 |
Manufacturing method of semiconductor device |
Sep. 11, 2007 |
| 7265038 |
Method for forming a multi-layer seed layer for improved Cu ECP |
Sep. 4, 2007 |
| 7262142 |
Semiconductor device fabrication method |
Aug. 28, 2007 |
| 7256148 |
Method for treating a wafer edge |
Aug. 14, 2007 |
| 7235427 |
Method for treating substrates for microelectronics and substrates obtained by said method |
Jun. 26, 2007 |
| 7232773 |
Liquid drop jetting apparatus using charged beam and method for manufacturing a pattern using the apparatus |
Jun. 19, 2007 |
| 7229911 |
Adhesion improvement for low k dielectrics to conductive materials |
Jun. 12, 2007 |
| 7220497 |
Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components |
May. 22, 2007 |
| 7208396 |
Permanent adherence of the back end of a wafer to an electrical component or sub-assembly |
Apr. 24, 2007 |
| 7203565 |
Temperature abnormality detection method and semiconductor manufacturing apparatus |
Apr. 10, 2007 |
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