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Class Information
Number: 438/794
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Silicon nitride formation > Organic reactant
Description: Processes wherein a reactant compound utilized during the deposition of silicon nitride is an organic material (e.g., organo-siloxane, etc.).










Patents under this class:
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Patent Number Title Of Patent Date Issued
8563443 Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen Oct. 22, 2013
8530361 Process for producing silicon and oxide films from organoaminosilane precursors Sep. 10, 2013
8394724 Processing with reduced line end shortening ratio Mar. 12, 2013
8329599 Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen Dec. 11, 2012
8212286 Semiconductor light receiving element Jul. 3, 2012
8187973 Method for manufacturing semiconductor device and the semiconductor device May. 29, 2012
8178439 Surface cleaning and selective deposition of metal-containing cap layers for semiconductor devices May. 15, 2012
8119483 Methods of forming memory cells Feb. 21, 2012
7951730 Decreasing the etch rate of silicon nitride by carbon addition May. 31, 2011
7915126 Methods of forming non-volatile memory cells, and methods of forming NAND cell unit string gates Mar. 29, 2011
7910475 Method for forming low dielectric constant fluorine-doped layers Mar. 22, 2011
7875556 Precursors for CVD silicon carbo-nitride and silicon nitride films Jan. 25, 2011
7807586 Method of forming a stressed passivation film using a non-ionizing electromagnetic radiation-assisted oxidation process Oct. 5, 2010
7799703 Processing method and storage medium Sep. 21, 2010
7790634 Method for depositing and curing low-k films for gapfill and conformal film applications Sep. 7, 2010
7763501 Forming interconnects Jul. 27, 2010
7662730 Method for fabricating ultra-high tensile-stressed film and strained-silicon transistors thereof Feb. 16, 2010
7541234 Methods of fabricating integrated circuit transistors by simultaneously removing a photoresist layer and a carbon-containing layer on different active areas Jun. 2, 2009
7521377 SiCOH film preparation using precursors with built-in porogen functionality Apr. 21, 2009
7473637 ALD formed titanium nitride films Jan. 6, 2009
7473655 Method for silicon based dielectric chemical vapor deposition Jan. 6, 2009
7446063 Silicon nitride films Nov. 4, 2008
7432215 Semiconductor device manufacturing method and semiconductor manufacturing apparatus Oct. 7, 2008
7416997 Method of fabricating semiconductor device including removing impurities from silicon nitride layer Aug. 26, 2008
7402533 Masking without photolithography during the formation of a semiconductor device Jul. 22, 2008
7387943 Method for forming layer for trench isolation structure Jun. 17, 2008
7387971 Fabricating method for flat panel display device Jun. 17, 2008
7365029 Method for silicon nitride chemical vapor deposition Apr. 29, 2008
7238629 Deposition method, method of manufacturing semiconductor device, and semiconductor device Jul. 3, 2007
7208427 Precursor compositions and processes for MOCVD of barrier materials in semiconductor manufacturing Apr. 24, 2007
7138068 Printed circuit patterned embedded capacitance layer Nov. 21, 2006
7129187 Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films Oct. 31, 2006
7101814 Masking without photolithography during the formation of a semiconductor device Sep. 5, 2006
7098061 Forming interconnects using locally deposited solvents Aug. 29, 2006
7094709 Method of synthesizing hybrid metal oxide materials and applications thereof Aug. 22, 2006
7084080 Silicon source reagent compositions, and method of making and using same for microelectronic device structure Aug. 1, 2006
7067415 Low k interlevel dielectric layer fabrication methods Jun. 27, 2006
7067414 Low k interlevel dielectric layer fabrication methods Jun. 27, 2006
7001844 Material for contact etch layer to enhance device performance Feb. 21, 2006
6974781 Reactor precoating for reduced stress and uniform CVD Dec. 13, 2005
6955974 Method for forming isolation layer of semiconductor device Oct. 18, 2005
6890869 Low-dielectric silicon nitride film and method of forming the same, semiconductor device and fabrication process thereof May. 10, 2005
6849562 Method of depositing a low k dielectric barrier film for copper damascene application Feb. 1, 2005
6828683 Semiconductor devices, and semiconductor processing methods Dec. 7, 2004
6828256 Methods for forming metal-containing films using metal complexes with chelating O- and/or N-donor ligands Dec. 7, 2004
6777351 Masking without photolithography during the formation of a semiconductor device Aug. 17, 2004
6716772 Semiconductor device manufacturing method and semiconductor manufacturing apparatus Apr. 6, 2004
6716773 Process for producing semiconductor substrates Apr. 6, 2004
6673709 Formation of an aluminide coating, incorporating a reactive element, on a metal substrate Jan. 6, 2004
6673725 Semiconductor device and method of manufacturing the same Jan. 6, 2004

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