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Class Information
Number: 438/791
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Silicon nitride formation
Description: Processes wherein the deposited material is a compound of silicon and nitrogen.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7626244 |
Stressed dielectric devices and methods of fabricating same |
Dec. 1, 2009 |
| 7615421 |
Method for fabricating thin film transistor |
Nov. 10, 2009 |
| 7615432 |
HDP/PECVD methods of fabricating stress nitride structures for field effect transistors |
Nov. 10, 2009 |
| 7615454 |
Embedded stressed nitride liners for CMOS performance improvement |
Nov. 10, 2009 |
| 7601652 |
Method for treating substrates and films with photoexcitation |
Oct. 13, 2009 |
| 7592268 |
Method for fabricating semiconductor device |
Sep. 22, 2009 |
| 7585790 |
Method for forming semiconductor device |
Sep. 8, 2009 |
| 7585752 |
Process for deposition of semiconductor films |
Sep. 8, 2009 |
| 7582540 |
Method for manufacturing SOI wafer |
Sep. 1, 2009 |
| 7566668 |
Method of forming contact |
Jul. 28, 2009 |
| 7550356 |
Method of fabricating strained-silicon transistors |
Jun. 23, 2009 |
| 7550398 |
Semiconductor device and method of fabricating the same |
Jun. 23, 2009 |
| 7547646 |
Trench capacitor structure and process for applying a covering layer and a mask for trench etching processes in semiconductor substrates |
Jun. 16, 2009 |
| 7528043 |
Scalable gate and storage dielectric |
May. 5, 2009 |
| 7521324 |
Semiconductor device and method for manufacturing the same |
Apr. 21, 2009 |
| 7514374 |
Method for manufacturing flat substrates |
Apr. 7, 2009 |
| 7514370 |
Compressive nitride film and method of manufacturing thereof |
Apr. 7, 2009 |
| 7510984 |
Method of forming silicon nitride film and method of manufacturing semiconductor device |
Mar. 31, 2009 |
| 7501355 |
Decreasing the etch rate of silicon nitride by carbon addition |
Mar. 10, 2009 |
| 7498232 |
Semiconductor devices and methods of manufacture thereof |
Mar. 3, 2009 |
| 7491660 |
Method of forming nitride films with high compressive stress for improved PFET device performance |
Feb. 17, 2009 |
| 7491652 |
In-line processing for forming a silicon nitride film |
Feb. 17, 2009 |
| 7488694 |
Methods of forming silicon nitride layers using nitrogenous compositions |
Feb. 10, 2009 |
| 7482286 |
Method for forming dielectric or metallic films |
Jan. 27, 2009 |
| 7476594 |
Methods of fabricating silicon nitride regions in silicon carbide and resulting structures |
Jan. 13, 2009 |
| 7473655 |
Method for silicon based dielectric chemical vapor deposition |
Jan. 6, 2009 |
| 7470637 |
Film formation apparatus and method of using the same |
Dec. 30, 2008 |
| 7470612 |
Method of forming metal wiring layer of semiconductor device |
Dec. 30, 2008 |
| 7462571 |
Film formation method and apparatus for semiconductor process for forming a silicon nitride film |
Dec. 9, 2008 |
| 7453090 |
Semiconductor device including a semiconductor substrate formed with a shallow impurity region |
Nov. 18, 2008 |
| 7452830 |
Semiconductor devices and methods for manufacturing the same |
Nov. 18, 2008 |
| 7446394 |
Semiconductor device fabricated by selective epitaxial growth method |
Nov. 4, 2008 |
| 7446062 |
Device having dual etch stop liner and reformed silicide layer and related methods |
Nov. 4, 2008 |
| 7442598 |
Method of forming an interlayer dielectric |
Oct. 28, 2008 |
| 7442653 |
Inter-metal dielectric of semiconductor device and manufacturing method thereof including plasma treating a plasma enhanced fluorosilicate glass |
Oct. 28, 2008 |
| 7435683 |
Apparatus and method for selectively recessing spacers on multi-gate devices |
Oct. 14, 2008 |
| 7429517 |
CMOS transistor using high stress liner layer |
Sep. 30, 2008 |
| 7420202 |
Electronic device including a transistor structure having an active region adjacent to a stressor layer and a process for forming the electronic device |
Sep. 2, 2008 |
| 7416997 |
Method of fabricating semiconductor device including removing impurities from silicon nitride layer |
Aug. 26, 2008 |
| 7402513 |
Method for forming interlayer insulation film |
Jul. 22, 2008 |
| 7402535 |
Method of incorporating stress into a transistor channel by use of a backside layer |
Jul. 22, 2008 |
| 7396776 |
Semiconductor-on-insulator (SOI) structures including gradient nitrided buried oxide (BOX) |
Jul. 8, 2008 |
| 7387972 |
Reducing nitrogen concentration with in-situ steam generation |
Jun. 17, 2008 |
| 7381620 |
Oxygen elimination for device processing |
Jun. 3, 2008 |
| 7381660 |
Dielectric barrier layer for a copper metallization layer having a varying silicon concentration along its thickness |
Jun. 3, 2008 |
| 7371627 |
Memory array with ultra-thin etched pillar surround gate access transistors and buried data/bit lines |
May. 13, 2008 |
| 7371649 |
Method of forming carbon-containing silicon nitride layer |
May. 13, 2008 |
| 7372113 |
Semiconductor device and method of manufacturing the same |
May. 13, 2008 |
| 7361611 |
Doped nitride film, doped oxide film and other doped films |
Apr. 22, 2008 |
| 7358595 |
Method for manufacturing MOS transistor |
Apr. 15, 2008 |
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