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Class Information
Number: 438/790
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Silicon oxide formation > Organic reactant
Description: Processes wherein a reactant compound utilized during the deposition of silicon oxide is an organic material (e.g., organo-siloxane, etc.).










Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8703624 Dielectric films comprising silicon and methods for making same Apr. 22, 2014
8597429 Manufacturing apparatus and method for semiconductor device Dec. 3, 2013
8501637 Silicon dioxide thin films by ALD Aug. 6, 2013
8491805 Semiconductor device manufacturing method and plasma etching apparatus Jul. 23, 2013
8455374 Radiation heating efficiency by increasing optical absorption of a silicon containing material Jun. 4, 2013
8426905 Profile engineered, electrically active thin film devices Apr. 23, 2013
8357602 Compound semiconductor device and method of manufacturing the same Jan. 22, 2013
8338315 Processes for curing silicon based low-k dielectric materials Dec. 25, 2012
8334203 Interconnect structure and method of fabricating Dec. 18, 2012
8304353 Silicon dioxide deposition methods using at least ozone and TEOS as deposition precursors Nov. 6, 2012
8298965 Volatile precursors for deposition of C-linked SiCOH dielectrics Oct. 30, 2012
8293662 Method of manufacturing semiconductor device, apparatus for manufacturing same, and storage medium Oct. 23, 2012
8268411 Materials containing voids with void size controlled on the nanometer scale Sep. 18, 2012
8263502 Forming substrate structure by filling recesses with deposition material Sep. 11, 2012
8252704 Additives to prevent degradation of cyclic alkene derivatives Aug. 28, 2012
8253255 Electronic device which disconnects first and second terminals upon lapse of a prescribed device lifetime Aug. 28, 2012
8236708 Reduced pattern loading using bis(diethylamino)silane (C.sub.8H.sub.22N.sub.2Si) as silicon precursor Aug. 7, 2012
8202805 Substrate processing method Jun. 19, 2012
8202806 Method to avoid threshold voltage shift in thicker dielectric films Jun. 19, 2012
8188576 Compound for filling small gaps in a semiconductor device, composition including the compound, and method of fabricating a semiconductor capacitor May. 29, 2012
8143174 Post-deposition treatment to enhance properties of Si-O-C low K films Mar. 27, 2012
8124545 Methods of etching oxide, reducing roughness, and forming capacitor constructions Feb. 28, 2012
8097932 Ultra low .kappa. plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality Jan. 17, 2012
8076251 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Dec. 13, 2011
8034723 Film deposition apparatus and film deposition method Oct. 11, 2011
8034727 Method and apparatus for manufacturing semiconductor devices Oct. 11, 2011
8030221 Method for producing low-k l film, semiconductor device, and method for manufacturing the same Oct. 4, 2011
8008146 Different thickness oxide silicon nanowire field effect transistors Aug. 30, 2011
7999356 Composition for film formation, insulating film, semiconductor device, and process for producing the semiconductor device Aug. 16, 2011
7994069 Semiconductor wafer with low-K dielectric layer and process for fabrication thereof Aug. 9, 2011
7972975 Method for forming a dielectric film and novel precursors for implementing said method Jul. 5, 2011
7973390 Modifier for low dielectric constant film, and method for production thereof Jul. 5, 2011
7964442 Methods to obtain low k dielectric barrier with superior etch resistivity Jun. 21, 2011
7951729 Semiconductor device including a coupled dielectric layer and metal layer, method of fabrication thereor, and material for coupling a dielectric layer and a metal layer in a semiconductor devi May. 31, 2011
7943531 Methods for forming a silicon oxide layer over a substrate May. 17, 2011
7923383 Method and apparatus for treating a semi-conductor substrate Apr. 12, 2011
7923385 Methods for producing low stress porous and CDO low-K dielectric materials using precursors with organic functional groups Apr. 12, 2011
7923386 Method to improve the step coverage and pattern loading for dielectric films Apr. 12, 2011
7915126 Methods of forming non-volatile memory cells, and methods of forming NAND cell unit string gates Mar. 29, 2011
7915181 Repair and restoration of damaged dielectric materials and films Mar. 29, 2011
7915180 SiCOH film preparation using precursors with built-in porogen functionality Mar. 29, 2011
7902084 Silicon dioxide deposition methods using at least ozone and TEOS as deposition precursors Mar. 8, 2011
7897519 Composition and organic insulator prepared using the same Mar. 1, 2011
7892648 SiCOH dielectric material with improved toughness and improved Si-C bonding Feb. 22, 2011
7893538 Organic silica film and method for forming same, composition for forming insulating film of semiconductor device and method for producing same, wiring structure and semiconductor device Feb. 22, 2011
7884032 Thin film deposition Feb. 8, 2011
7883986 Methods of forming trench isolation and methods of forming arrays of FLASH memory cells Feb. 8, 2011
7858294 Method to restore hydrophobicity in dielectric films and materials Dec. 28, 2010
7858536 Semiconductor device and method for manufacturing semiconductor device Dec. 28, 2010
7855154 Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials Dec. 21, 2010

1 2 3 4 5 6 7 8 9 10










 
 
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