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Class Information
Number: 438/789
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Silicon oxide formation > Using electromagnetic or wave energy (e.g., photo-induced deposition, plasma, etc.) > Organic reactant
Description: Processes wherein a reactant compound utilized during the deposition of silicon oxide is an organic material (e.g., organo-siloxane, etc.).










Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
8703624 Dielectric films comprising silicon and methods for making same Apr. 22, 2014
8664127 Two silicon-containing precursors for gapfill enhancing dielectric liner Mar. 4, 2014
8557712 PECVD flowable dielectric gap fill Oct. 15, 2013
8541318 Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same Sep. 24, 2013
8501637 Silicon dioxide thin films by ALD Aug. 6, 2013
8461031 Method for making a thin-film structure and resulting thin-film structure Jun. 11, 2013
8426322 Method for producing semiconductor device and semiconductor device Apr. 23, 2013
8415258 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Apr. 9, 2013
8399358 Establishing a hydrophobic surface of sensitive low-k dielectrics of microstructure devices by in situ plasma treatment Mar. 19, 2013
8357619 Film formation method for forming silicon-containing insulating film Jan. 22, 2013
8338315 Processes for curing silicon based low-k dielectric materials Dec. 25, 2012
8334203 Interconnect structure and method of fabricating Dec. 18, 2012
8329575 Fabrication of through-silicon vias on silicon wafers Dec. 11, 2012
8329518 Methods for manufacturing thin film transistor array substrate and display panel Dec. 11, 2012
8304033 Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles Nov. 6, 2012
8304353 Silicon dioxide deposition methods using at least ozone and TEOS as deposition precursors Nov. 6, 2012
8263502 Forming substrate structure by filling recesses with deposition material Sep. 11, 2012
8236708 Reduced pattern loading using bis(diethylamino)silane (C.sub.8H.sub.22N.sub.2Si) as silicon precursor Aug. 7, 2012
8227358 Silicon precursors and method for low temperature CVD of silicon-containing films Jul. 24, 2012
8178447 Methods of forming hydrophobic silicon dioxide layer and forming organic thin film transistor May. 15, 2012
8163659 Method for oxide film formation and apparatus for the method Apr. 24, 2012
8153538 Process for annealing semiconductor wafers with flat dopant depth profiles Apr. 10, 2012
8119208 Apparatus and method for focused electric field enhanced plasma-based ion implantation Feb. 21, 2012
8101531 Plasma-activated deposition of conformal films Jan. 24, 2012
8097932 Ultra low .kappa. plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality Jan. 17, 2012
8076251 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Dec. 13, 2011
8043975 Silicon dioxide deposition methods using at least ozone and TEOS as deposition precursors Oct. 25, 2011
8030219 Dielectric coatings and use in capacitors Oct. 4, 2011
7985188 Vessel, coating, inspection and processing apparatus Jul. 26, 2011
7943531 Methods for forming a silicon oxide layer over a substrate May. 17, 2011
7939442 Strontium ruthenium oxide interface May. 10, 2011
7923385 Methods for producing low stress porous and CDO low-K dielectric materials using precursors with organic functional groups Apr. 12, 2011
7923386 Method to improve the step coverage and pattern loading for dielectric films Apr. 12, 2011
7923384 Formation method of porous insulating film, manufacturing apparatus of semiconductor device, manufacturing method of semiconductor device, and semiconductor device Apr. 12, 2011
7923380 Substrate processing apparatus and substrate processing method Apr. 12, 2011
7915139 CVD flowable gap fill Mar. 29, 2011
7915180 SiCOH film preparation using precursors with built-in porogen functionality Mar. 29, 2011
7915181 Repair and restoration of damaged dielectric materials and films Mar. 29, 2011
7902084 Silicon dioxide deposition methods using at least ozone and TEOS as deposition precursors Mar. 8, 2011
7897521 Low dielectric constant plasma polymerized thin film and manufacturing method thereof Mar. 1, 2011
7892648 SiCOH dielectric material with improved toughness and improved Si-C bonding Feb. 22, 2011
7888233 Flowable film dielectric gap fill process Feb. 15, 2011
7883986 Methods of forming trench isolation and methods of forming arrays of FLASH memory cells Feb. 8, 2011
7867922 Film forming method for dielectric film Jan. 11, 2011
7863203 Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same Jan. 4, 2011
7855154 Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials Dec. 21, 2010
7851385 Low temperature conformal oxide formation and applications Dec. 14, 2010
7825044 Curing methods for silicon dioxide multi-layers Nov. 2, 2010
7803721 Semiconductor device and method of manufacturing same Sep. 28, 2010
7799705 Methods for producing low stress porous low-k dielectric materials using precursors with organic functional groups Sep. 21, 2010

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