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Class Information
Number: 438/788
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Silicon oxide formation > Using electromagnetic or wave energy (e.g., photo-induced deposition, plasma, etc.)
Description: Processes wherein the silicon oxide is deposited using irradiation of electromagnetic or wave energy.










Sub-classes under this class:

Class Number Class Name Patents
438/789 Organic reactant 441


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15

Patent Number Title Of Patent Date Issued
6737365 Forming a porous dielectric layer May. 18, 2004
6737319 Method of manufacturing semiconductor device and semiconductor device May. 18, 2004
6737366 Method of forming low dielectric constant insulation film for semiconductor device May. 18, 2004
6734118 Dielectric material treatment May. 11, 2004
6730620 Substrate processing method and substrate processing apparatus May. 4, 2004
6730593 Method of depositing a low K dielectric with organo silane May. 4, 2004
6723660 Thin-film forming apparatus and thin-film forming method Apr. 20, 2004
6723664 Method and apparatus for depositing a thin film, and semiconductor device having a semiconductor-insulator junction Apr. 20, 2004
6723599 Methods of forming capacitors and methods of forming capacitor dielectric layers Apr. 20, 2004
6716725 Plasma processing method and semiconductor device Apr. 6, 2004
6713390 Barrier layer deposition using HDP-CVD Mar. 30, 2004
6709715 Plasma enhanced chemical vapor deposition of copolymer of parylene N and comonomers with various double bonds Mar. 23, 2004
6709968 Microelectronic device with package with conductive elements and associated method of manufacture Mar. 23, 2004
6706596 Method for forming flash memory cell Mar. 16, 2004
6696326 Cleaning method to prevent watermarks Feb. 24, 2004
6689701 Method of forming a spin on glass film of a semiconductor device Feb. 10, 2004
6689690 Semiconductor device manufacturing method of forming an etching stopper film on a diffusion prevention film at a higher temperature Feb. 10, 2004
6680262 Method of making a semiconductor device by converting a hydrophobic surface of a dielectric layer to a hydrophilic surface Jan. 20, 2004
6673725 Semiconductor device and method of manufacturing the same Jan. 6, 2004
6667248 Low-bias-deposited high-density-plasma chemical-vapor-deposition silicate glass layers Dec. 23, 2003
6660662 Method of reducing plasma charge damage for plasma processes Dec. 9, 2003
6653196 Open pattern inductor Nov. 25, 2003
6653212 Method and apparatus for thin-film deposition, and method of manufacturing thin-film semiconductor device Nov. 25, 2003
6653204 Method of forming a shallow trench isolation structure Nov. 25, 2003
6653231 Process for reducing the critical dimensions of integrated circuit device features Nov. 25, 2003
6653719 Silicone polymer insulation film on semiconductor substrate Nov. 25, 2003
6649540 Organosilane CVD precursors and their use for making organosilane polymer low-k dielectric film Nov. 18, 2003
6649538 Method for plasma treating and plasma nitriding gate oxides Nov. 18, 2003
6649076 Method for performing plasma process on particles Nov. 18, 2003
6645883 Film forming method, semiconductor device and manufacturing method of the same Nov. 11, 2003
6642157 Film forming method and semiconductor device Nov. 4, 2003
6642156 Method for forming heavy nitrogen-doped ultra thin oxynitride gate dielectrics Nov. 4, 2003
6638873 Semiconductor device producing method Oct. 28, 2003
6632735 Method of depositing low dielectric constant carbon doped silicon oxide Oct. 14, 2003
6632478 Process for forming a low dielectric constant carbon-containing film Oct. 14, 2003
6632749 Method for manufacturing silicon oxide film, method for manufacturing semiconductor device, semiconductor device, display device and infrared light irradiating device Oct. 14, 2003
6627532 Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition Sep. 30, 2003
6627560 Method of manufacturing semiconductor device Sep. 30, 2003
6624094 Method of manufacturing an interlayer dielectric film using vacuum ultraviolet CVD with Xe2 excimer lamp and silicon atoms Sep. 23, 2003
6617230 Use of selective ozone teos oxide to create variable thickness layers and spacers Sep. 9, 2003
6613665 Process for forming integrated circuit structure comprising layer of low k dielectric material having antireflective properties in an upper surface Sep. 2, 2003
6610609 Compatibilization treatment Aug. 26, 2003
6602558 Non-linear optical silica thin film manufacturing method and non-linear optical silica element Aug. 5, 2003
6599847 Sandwich composite dielectric layer yielding improved integrated circuit device reliability Jul. 29, 2003
6596655 Plasma processes for depositing low dielectric constant films Jul. 22, 2003
6596654 Gap fill for high aspect ratio structures Jul. 22, 2003
6596653 Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD Jul. 22, 2003
6586346 Method of forming an oxide film Jul. 1, 2003
6583070 Semiconductor device having a low dielectric constant material Jun. 24, 2003
6583064 Low contamination high density plasma etch chambers and methods for making the same Jun. 24, 2003

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