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Class Information
Number: 438/788
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Silicon oxide formation > Using electromagnetic or wave energy (e.g., photo-induced deposition, plasma, etc.)
Description: Processes wherein the silicon oxide is deposited using irradiation of electromagnetic or wave energy.










Sub-classes under this class:

Class Number Class Name Patents
438/789 Organic reactant 441


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15

Patent Number Title Of Patent Date Issued
8153537 Method for fabricating semiconductor devices using stress engineering Apr. 10, 2012
8148274 Semiconductor device having oxidized metal film and manufacture method of the same Apr. 3, 2012
8133822 Method of forming silicon nanocrystal embedded silicon oxide electroluminescence device with a mid-bandgap transition layer Mar. 13, 2012
8124484 Forming a MOS memory device having a dielectric film laminate as a charge accumulation region Feb. 28, 2012
8119541 Modulation of stress in stress film through ion implantation and its application in stress memorization technique Feb. 21, 2012
8105958 Semiconductor device manufacturing method and plasma oxidation treatment method Jan. 31, 2012
8101531 Plasma-activated deposition of conformal films Jan. 24, 2012
8093142 Plasma processing apparatus and plasma processing method Jan. 10, 2012
8053338 Plasma CVD apparatus Nov. 8, 2011
8043975 Silicon dioxide deposition methods using at least ozone and TEOS as deposition precursors Oct. 25, 2011
8043981 Dual frequency low temperature oxidation of a semiconductor device Oct. 25, 2011
8039333 Semiconductor device and method of fabricating the same Oct. 18, 2011
8030206 Coplanar solar cell metal contact annealing in plasma enhanced chemical vapor deposition Oct. 4, 2011
8030220 Plasma treatment of a semiconductor surface for enhanced nucleation of a metal-containing layer Oct. 4, 2011
8021992 High aspect ratio gap fill application using high density plasma chemical vapor deposition Sep. 20, 2011
8003551 Surface-activation of semiconductor nanostructures for biological applications Aug. 23, 2011
7998884 Method of forming a light emitting device with a nanocrystalline silicon embedded insulator film Aug. 16, 2011
7994070 Low-temperature dielectric film formation by chemical vapor deposition Aug. 9, 2011
7989363 Method for rapid thermal treatment using high energy electromagnetic radiation of a semiconductor substrate for formation of dielectric films Aug. 2, 2011
7989364 Plasma oxidation processing method Aug. 2, 2011
7989365 Remote plasma source seasoning Aug. 2, 2011
7985700 Composition for forming insulating film and method for fabricating semiconductor device Jul. 26, 2011
7985188 Vessel, coating, inspection and processing apparatus Jul. 26, 2011
7981814 Replication and transfer of microstructures and nanostructures Jul. 19, 2011
7981815 Semiconductor device producing method and substrate processing apparatus Jul. 19, 2011
7972946 Plasma treatment method and plasma treatment device Jul. 5, 2011
7972885 Broadband imaging device and manufacturing thereof Jul. 5, 2011
7972968 High density plasma gapfill deposition-etch-deposition process etchant Jul. 5, 2011
7964517 Use of a biased precoat for reduced first wafer defects in high-density plasma process Jun. 21, 2011
7960294 Method of modifying interlayer adhesion Jun. 14, 2011
7955948 Manufacturing method of semiconductor device Jun. 7, 2011
7951683 In-situ process layer using silicon-rich-oxide for etch selectivity in high AR gapfill May. 31, 2011
7943531 Methods for forming a silicon oxide layer over a substrate May. 17, 2011
7935592 Method of manufacturing semiconductor device having of spacer gate structure May. 3, 2011
7927982 Apparatus for mass-producing silicon-based thin film and method for mass-producing silicon-based thin film Apr. 19, 2011
7928020 Method of fabricating a nitrogenated silicon oxide layer and MOS device having same Apr. 19, 2011
7927981 Apparatus for depositing silicon-based thin film and method for depositing silicon-based thin film Apr. 19, 2011
7923384 Formation method of porous insulating film, manufacturing apparatus of semiconductor device, manufacturing method of semiconductor device, and semiconductor device Apr. 12, 2011
7915177 Method of forming gate insulation film, semiconductor device, and computer recording medium Mar. 29, 2011
7902084 Silicon dioxide deposition methods using at least ozone and TEOS as deposition precursors Mar. 8, 2011
7897521 Low dielectric constant plasma polymerized thin film and manufacturing method thereof Mar. 1, 2011
7892920 Method for manufacturing semiconductor device including implanting through a hole patterned from a first photoresist an oxide and a second photoresist Feb. 22, 2011
7892648 SiCOH dielectric material with improved toughness and improved Si-C bonding Feb. 22, 2011
7867922 Film forming method for dielectric film Jan. 11, 2011
7867920 Method for modifying high-k dielectric thin film and semiconductor device Jan. 11, 2011
7867923 High quality silicon oxide films by remote plasma CVD from disilane precursors Jan. 11, 2011
7855154 Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials Dec. 21, 2010
7851385 Low temperature conformal oxide formation and applications Dec. 14, 2010
7838443 Method for minimizing the corner effect by densifying the insulating layer Nov. 23, 2010
7833882 Method of producing a semiconductor device by forming an oxide film on a resin layer Nov. 16, 2010

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