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Class Information
Number: 438/788
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Silicon oxide formation > Using electromagnetic or wave energy (e.g., photo-induced deposition, plasma, etc.)
Description: Processes wherein the silicon oxide is deposited using irradiation of electromagnetic or wave energy.










Sub-classes under this class:

Class Number Class Name Patents
438/789 Organic reactant 441


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15

Patent Number Title Of Patent Date Issued
4987102 Process for forming high purity thin films Jan. 22, 1991
4962063 Multistep planarized chemical vapor deposition process with the use of low melting inorganic material for flowing while depositing Oct. 9, 1990
4891118 Plasma processing apparatus Jan. 2, 1990
4888088 Ignitor for a microwave sustained plasma Dec. 19, 1989
4861622 Method for forming a film coat on the inside of a depression Aug. 29, 1989
4837185 Pulsed dual radio frequency CVD process Jun. 6, 1989
4753818 Process for photochemical vapor deposition of oxide layers at enhanced deposition rates Jun. 28, 1988
4740267 Energy intensive surface reactions using a cluster beam Apr. 26, 1988
4737379 Plasma deposited coatings, and low temperature plasma method of making same Apr. 12, 1988
4728528 Process for forming deposited film Mar. 1, 1988
4631199 Photochemical vapor deposition process for depositing oxide layers Dec. 23, 1986
4624859 Method of producing silicon dioxide films Nov. 25, 1986
4595601 Method of selectively forming an insulation layer Jun. 17, 1986
4569855 Method of forming deposition film Feb. 11, 1986
4564997 Semiconductor device and manufacturing process thereof Jan. 21, 1986
4539068 Vapor phase growth method Sep. 3, 1985
4527007 Process for forming passivation film on photoelectric conversion device and the device produced thereby Jul. 2, 1985
4517223 Method of making amorphous semiconductor alloys and devices using microwave energy May. 14, 1985
4510172 Technique for thin insulator growth Apr. 9, 1985
4500563 Independently variably controlled pulsed R.F. plasma chemical vapor processing Feb. 19, 1985
4495218 Process for forming thin film Jan. 22, 1985
4483725 Reactive vapor deposition of multiconstituent material Nov. 20, 1984
4481229 Method for growing silicon-including film by employing plasma deposition Nov. 6, 1984
4476154 Method of manufacturing a glass passivation semiconductor device Oct. 9, 1984
4419385 Low temperature process for depositing an oxide dielectric layer on a conductive surface and multilayer structures formed thereby Dec. 6, 1983
4406053 Process for manufacturing a semiconductor device having a non-porous passivation layer Sep. 27, 1983
4401507 Method and apparatus for achieving spatially uniform externally excited non-thermal chemical reactions Aug. 30, 1983
4394401 Method of plasma enhanced chemical vapor deposition of phosphosilicate glass film Jul. 19, 1983
4371587 Low temperature process for depositing oxide layers by photochemical vapor deposition Feb. 1, 1983
4263336 Reduced pressure induction heated reactor and method Apr. 21, 1981
4223048 Plasma enhanced chemical vapor processing of semiconductive wafers Sep. 16, 1980
4183780 Photon enhanced reactive ion etching Jan. 15, 1980
4119483 Method of structuring thin layers Oct. 10, 1978

1 2 3 4 5 6 7 8 9 10 11 12 13 14 15










 
 
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