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Class Information
Number: 438/788
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Silicon oxide formation > Using electromagnetic or wave energy (e.g., photo-induced deposition, plasma, etc.)
Description: Processes wherein the silicon oxide is deposited using irradiation of electromagnetic or wave energy.

Sub-classes under this class:

Class Number Class Name Patents
438/789 Organic reactant 441

Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15

Patent Number Title Of Patent Date Issued
8709958 Solid-state image pickup element, method of manufacturing the same, and image pickup apparatus including the same Apr. 29, 2014
8664105 Mitigation of silicide formation on wafer bevel Mar. 4, 2014
8647992 Flowable dielectric using oxide liner Feb. 11, 2014
8647993 Methods for UV-assisted conformal film deposition Feb. 11, 2014
8637403 Locally tailoring chemical mechanical polishing (CMP) polish rate for dielectrics Jan. 28, 2014
8603908 Mitigation of silicide formation on wafer bevel Dec. 10, 2013
8598706 Method for forming interlayer dielectric film, interlayer dielectric film, semiconductor device and semiconductor manufacturing apparatus Dec. 3, 2013
8597978 Method for attaching wide bus memory and serial memory to a processor within a chip scale package footprint Dec. 3, 2013
8586486 Method for forming semiconductor device Nov. 19, 2013
8575041 Repair of damaged surface areas of sensitive low-K dielectrics of microstructure devices after plasma processing by in situ treatment Nov. 5, 2013
8569183 Low temperature dielectric flow using microwaves Oct. 29, 2013
8557667 Spacer for a gate electrode having tensile stress and a method of forming the same Oct. 15, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8541317 Deposition method for passivation of silicon wafers Sep. 24, 2013
8513809 Semiconductor device Aug. 20, 2013
8501631 Plasma processing system control based on RF voltage Aug. 6, 2013
8497214 Semiconductor device manufacturing method Jul. 30, 2013
8486792 Film forming method of silicon oxide film, silicon oxide film, semiconductor device, and manufacturing method of semiconductor device Jul. 16, 2013
8486845 Plasma enhanced atomic layer deposition system and method Jul. 16, 2013
8481403 Flowable film dielectric gap fill process Jul. 9, 2013
8476099 Methods for improved adhesion of protective layers of imager microlens structures by forming an interfacial region Jul. 2, 2013
8461031 Method for making a thin-film structure and resulting thin-film structure Jun. 11, 2013
8453318 Method for making a planar coil Jun. 4, 2013
8435906 Methods for forming conformal oxide layers on semiconductor devices May. 7, 2013
8410581 Silicon device structure, and sputtering target used for forming the same Apr. 2, 2013
8404602 Plasma oxidation method and plasma oxidation apparatus Mar. 26, 2013
8389395 Method for manufacturing semiconductor optical device Mar. 5, 2013
8377792 Method of forming high capacitance semiconductor capacitors with a single lithography step Feb. 19, 2013
8368184 Silicon device structure, and sputtering target used for forming the same Feb. 5, 2013
8367559 Method of manufacturing a semiconductor device Feb. 5, 2013
8318584 Oxide-rich liner layer for flowable CVD gapfill Nov. 27, 2012
8312840 Substrate processing apparatus and method Nov. 20, 2012
8314035 Method for the manufacture of an active matrix OLED display Nov. 20, 2012
8304033 Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles Nov. 6, 2012
8304353 Silicon dioxide deposition methods using at least ozone and TEOS as deposition precursors Nov. 6, 2012
8293659 Method for fabricating dielectric layer with improved insulating properties Oct. 23, 2012
8278195 Plasma CVD apparatus Oct. 2, 2012
8272348 Method for plasma deposition and plasma CVD system Sep. 25, 2012
8268411 Materials containing voids with void size controlled on the nanometer scale Sep. 18, 2012
8263502 Forming substrate structure by filling recesses with deposition material Sep. 11, 2012
8242031 High quality silicon oxide films by remote plasma CVD from disilane precursors Aug. 14, 2012
8217479 Solid-state image pickup element, method of manufacturing the same, and image pickup apparatus including the same Jul. 10, 2012
8207067 Method of processing resist, semiconductor device, and method of producing the same Jun. 26, 2012
8202809 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus Jun. 19, 2012
8183136 Method of forming insulating layer and method of manufacturing transistor using the same May. 22, 2012
8177992 Plasma etching apparatus May. 15, 2012
8169577 Thin-film transistor photosensor, liquid crystal display panel and method of forming dielectric layer having F-SiOC: H compound May. 1, 2012
8168548 UV-assisted dielectric formation for devices with strained germanium-containing layers May. 1, 2012
8163660 SONOS type stacks for nonvolatile change trap memory devices and methods to form the same Apr. 24, 2012
8158266 Semiconductor manufacturing method for inter-layer insulating film Apr. 17, 2012

1 2 3 4 5 6 7 8 9 10 11 12 13 14 15

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