Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Browse by Category: Main > Engineering
Class Information
Number: 438/787
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Silicon oxide formation
Description: Processes wherein the deposited insulative material is a compound of silicon and oxygen.










Sub-classes under this class:

Class Number Class Name Patents
438/790 Organic reactant 489
438/788 Using electromagnetic or wave energy (e.g., photo-induced deposition, plasma, etc.) 733


Patents under this class:

Patent Number Title Of Patent Date Issued
8710579 SONOS stack with split nitride memory layer Apr. 29, 2014
8709853 Method of manufacturing crystalline silicon solar cells with improved surface passivation Apr. 29, 2014
8703625 Methods to prepare silicon-containing films Apr. 22, 2014
8703623 Fabrication technique for gallium nitride substrates Apr. 22, 2014
8685867 Premetal dielectric integration process Apr. 1, 2014
8673682 High order silane composition and method of manufacturing a film-coated substrate Mar. 18, 2014
8662886 System for improved pressure control in horizontal diffusion furnace scavenger system for controlling oxide growth Mar. 4, 2014
8647993 Methods for UV-assisted conformal film deposition Feb. 11, 2014
8642486 Thin film forming method, thin film forming apparatus, and program Feb. 4, 2014
8642441 Self-aligned STI with single poly for manufacturing a flash memory device Feb. 4, 2014
8637411 Plasma activated conformal dielectric film deposition Jan. 28, 2014
8623750 Heat treatment method for promoting crystallization of high dielectric constant film Jan. 7, 2014
8609555 Increased stability of a complex material stack in a semiconductor device by providing fluorine enriched interfaces Dec. 17, 2013
8609554 Semiconductor structure and method for manufacturing the same Dec. 17, 2013
8609551 Method for manufacturing semiconductor device and substrate processing apparatus Dec. 17, 2013
8603924 Methods of forming gate dielectric material Dec. 10, 2013
8580699 Embedded catalyst for atomic layer deposition of silicon oxide Nov. 12, 2013
8575041 Repair of damaged surface areas of sensitive low-K dielectrics of microstructure devices after plasma processing by in situ treatment Nov. 5, 2013
8574985 Methods for depositing high-K dielectrics Nov. 5, 2013
8557716 Semiconductor device manufacturing method and substrate processing apparatus Oct. 15, 2013
8546271 Method of improving oxide growth rate of selective oxidation processes Oct. 1, 2013
8536070 Vapor deposition of silicon dioxide nanolaminates Sep. 17, 2013
8524612 Plasma-activated deposition of conformal films Sep. 3, 2013
8524591 Maintaining integrity of a high-K gate stack by passivation using an oxygen plasma Sep. 3, 2013
8513809 Semiconductor device Aug. 20, 2013
8513578 Electromagnetic wave processing apparatus Aug. 20, 2013
8501636 Method for fabricating silicon dioxide layer Aug. 6, 2013
8492290 Fabrication of silicon oxide and oxynitride having sub-nanometer thickness Jul. 23, 2013
8481403 Flowable film dielectric gap fill process Jul. 9, 2013
8476108 Method and apparatus for manufacturing semiconductor device Jul. 2, 2013
8475666 Method for making toughening agent materials Jul. 2, 2013
8470675 Thick gate oxide for LDMOS and DEMOS Jun. 25, 2013
8470187 Method of depositing film with tailored comformality Jun. 25, 2013
8466073 Capping layer for reduced outgassing Jun. 18, 2013
8461015 STI structure and method of forming bottom void in same Jun. 11, 2013
8455374 Radiation heating efficiency by increasing optical absorption of a silicon containing material Jun. 4, 2013
8450813 Fin transistor structure and method of fabricating the same May. 28, 2013
8450218 Methods of forming silicon oxides and methods of forming interlevel dielectrics May. 28, 2013
8445973 Fin transistor structure and method of fabricating the same May. 21, 2013
8435906 Methods for forming conformal oxide layers on semiconductor devices May. 7, 2013
8431494 Film formation method and film formation apparatus Apr. 30, 2013
8420553 Semiconductor device and manufacturing method thereof Apr. 16, 2013
8415258 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Apr. 9, 2013
8404583 Conformality of oxide layers along sidewalls of deep vias Mar. 26, 2013
8399363 Methods of forming oxide-filled trenches in substrates using multiple-temperature oxide deposition techniques Mar. 19, 2013
8394668 Oxide thin film, methods of manufacturing oxide thin film and electronic devices including oxide thin film Mar. 12, 2013
8394656 Method of creating MEMS device cavities by a non-etching process Mar. 12, 2013
8367924 Buried insulator isolation for solar cell contacts Feb. 5, 2013
8367557 Method of forming an insulation film having low impurity concentrations Feb. 5, 2013
8357619 Film formation method for forming silicon-containing insulating film Jan. 22, 2013











 
 
  Recently Added Patents
Hydrogen generation device and fuel cell system
Customizing a range of acceptable tape dimensional stability write conditions
Process for producing .beta.-sialon fluorescent material
Hanger
System and method for computational unification of heterogeneous implicit and explicit processing elements
Server chassis
Method and system for modifying satellite radio program subscriptions in a mobile vehicle
  Randomly Featured Patents
Steam reforming methods and catalysts
System and method for handling IO to drives in a memory constrained environment
Bracelet fastening device
Active noise control system with on-line secondary path modeling
Chemically-impregnated microporous films
Electrostatic attracting sheet
Papermaking process utilizing hydrophilic dispersion polymers of dimethylaminoethyl acrylate methyl chloride quaternary and acrylamide as retention and drainage aids
Stand for cellular phone
Preformed abrasive articles and method for the manufacture of same
Process for producing a transparent polyurethane film with energy-absorbing and antifogging properties