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Class Information
Number: 438/786
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Tertiary silicon containing compound formation (e.g., oxynitride formation, etc.)
Description: Processes for forming an insulative compound of silicon and two other elements is deposited upon the semiconductor substrate.










Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8703624 Dielectric films comprising silicon and methods for making same Apr. 22, 2014
8691659 Method for forming void-free dielectric layer Apr. 8, 2014
8685866 Method of manufacturing semiconductor device and substrate processing apparatus Apr. 1, 2014
8679989 Method of manufacturing semiconductor device including removal of deposits from process chamber and supply portion Mar. 25, 2014
8664127 Two silicon-containing precursors for gapfill enhancing dielectric liner Mar. 4, 2014
8658546 Solution composition for forming oxide thin film and electronic device including the oxide thin film Feb. 25, 2014
8642409 Semiconductor device and method of manufacturing the same Feb. 4, 2014
8614152 Gate structure and a method for forming the same Dec. 24, 2013
8609549 Plasma etching method, plasma etching apparatus, and computer-readable storage medium Dec. 17, 2013
8598000 Two step poly etch LDMOS gate formation Dec. 3, 2013
8592327 Formation of SiOCl-containing layer on exposed low-k surfaces to reduce low-k damage Nov. 26, 2013
8563443 Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen Oct. 22, 2013
8563444 ALD of metal silicate films Oct. 22, 2013
8546276 Deposition of group IV metal-containing films at high temperature Oct. 1, 2013
8546273 Methods and apparatus for forming nitrogen-containing layers Oct. 1, 2013
8501523 Depositing titanium silicon nitride films for forming phase change memories Aug. 6, 2013
8497191 Selective epitaxial growth method using halogen containing gate sidewall mask Jul. 30, 2013
8492290 Fabrication of silicon oxide and oxynitride having sub-nanometer thickness Jul. 23, 2013
8481433 Methods and apparatus for forming nitrogen-containing layers Jul. 9, 2013
8471369 Method and apparatus for reducing plasma process induced damage in integrated circuits Jun. 25, 2013
8455293 Method for processing solar cell substrates Jun. 4, 2013
8450221 Method of forming MOS transistors including SiON gate dielectric with enhanced nitrogen concentration at its sidewalls May. 28, 2013
8415258 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Apr. 9, 2013
8377827 Methods for forming a gate and a shallow trench isolation region and for planarizing an etched surface of silicon substrate Feb. 19, 2013
8372763 Process for wet passivation of bond pads for protection against subsequent TMAH-based processing Feb. 12, 2013
8367554 Methods for forming a gate and a shallow trench isolation region and for planarizing an etched surface of silicon substrate Feb. 5, 2013
8349745 Fabrication of a semiconductor nanoparticle embedded insulating film luminescence device Jan. 8, 2013
8349746 Microelectronic structure including a low k dielectric and a method of controlling carbon distribution in the structure Jan. 8, 2013
8318608 Method of fabricating a nonvolatile charge trap memory device Nov. 27, 2012
8304333 Method of forming a high-k gate dielectric layer Nov. 6, 2012
8304352 Method of manufacturing a semiconductor device Nov. 6, 2012
8298965 Volatile precursors for deposition of C-linked SiCOH dielectrics Oct. 30, 2012
8294224 Devices and methods to improve carrier mobility Oct. 23, 2012
8283261 Radical oxidation process for fabricating a nonvolatile charge trap memory device Oct. 9, 2012
8268654 Method for manufacturing LCD with reduced mask count Sep. 18, 2012
8263501 Silicon dioxide film fabricating process Sep. 11, 2012
8252659 Method for producing interconnect structures for integrated circuits Aug. 28, 2012
8247331 Method for forming insulating film and method for manufacturing semiconductor device Aug. 21, 2012
8227346 Method of producing semiconductor device Jul. 24, 2012
8227358 Silicon precursors and method for low temperature CVD of silicon-containing films Jul. 24, 2012
8198731 Protective layer for bond pads Jun. 12, 2012
8187973 Method for manufacturing semiconductor device and the semiconductor device May. 29, 2012
8163660 SONOS type stacks for nonvolatile change trap memory devices and methods to form the same Apr. 24, 2012
8158535 Method for forming insulating film and method for manufacturing semiconductor device Apr. 17, 2012
8119483 Methods of forming memory cells Feb. 21, 2012
8110469 Graded dielectric layers Feb. 7, 2012
8076251 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Dec. 13, 2011
8043980 Methods for making and using halosilylgermanes Oct. 25, 2011
8039402 Methods for forming a gate and a shallow trench isolation region and for planarizating an etched surface of silicon substrate Oct. 18, 2011
8039404 Production method for semiconductor device Oct. 18, 2011

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